JPH0419712B2 - - Google Patents
Info
- Publication number
- JPH0419712B2 JPH0419712B2 JP56134118A JP13411881A JPH0419712B2 JP H0419712 B2 JPH0419712 B2 JP H0419712B2 JP 56134118 A JP56134118 A JP 56134118A JP 13411881 A JP13411881 A JP 13411881A JP H0419712 B2 JPH0419712 B2 JP H0419712B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- forming
- diaphragm
- silicon wafer
- tape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/50—Devices controlled by mechanical forces, e.g. pressure
Landscapes
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
- Dicing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56134118A JPS5835982A (ja) | 1981-08-28 | 1981-08-28 | 半導体圧力センサの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56134118A JPS5835982A (ja) | 1981-08-28 | 1981-08-28 | 半導体圧力センサの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5835982A JPS5835982A (ja) | 1983-03-02 |
JPH0419712B2 true JPH0419712B2 (en:Method) | 1992-03-31 |
Family
ID=15120876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56134118A Granted JPS5835982A (ja) | 1981-08-28 | 1981-08-28 | 半導体圧力センサの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5835982A (en:Method) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0697698B2 (ja) * | 1985-09-25 | 1994-11-30 | 日本電気株式会社 | 圧力センサの製造方法 |
JPH0233948A (ja) * | 1988-07-22 | 1990-02-05 | Matsushita Electric Ind Co Ltd | 光半導体装置の製造方法 |
KR20040011244A (ko) * | 2002-07-30 | 2004-02-05 | 주식회사 비에스이 | 다이어프램이 형성된 반도체소자의 커팅방법 |
JP4905696B2 (ja) * | 2007-04-09 | 2012-03-28 | 三菱電機株式会社 | 半導体装置の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5644413B2 (en:Method) * | 1973-05-12 | 1981-10-19 | ||
JPS5434752A (en) * | 1977-08-24 | 1979-03-14 | Nec Home Electronics Ltd | Manufacture of semiconductor device |
JPS562671A (en) * | 1979-06-22 | 1981-01-12 | Nissan Motor Co Ltd | Manufacture of semiconductor diaphragm |
-
1981
- 1981-08-28 JP JP56134118A patent/JPS5835982A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5835982A (ja) | 1983-03-02 |
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