JPH041493B2 - - Google Patents

Info

Publication number
JPH041493B2
JPH041493B2 JP56172950A JP17295081A JPH041493B2 JP H041493 B2 JPH041493 B2 JP H041493B2 JP 56172950 A JP56172950 A JP 56172950A JP 17295081 A JP17295081 A JP 17295081A JP H041493 B2 JPH041493 B2 JP H041493B2
Authority
JP
Japan
Prior art keywords
aperture
aluminum
mask
rectangular
creating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56172950A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5875832A (ja
Inventor
Seiichi Yoda
Hideo Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56172950A priority Critical patent/JPS5875832A/ja
Publication of JPS5875832A publication Critical patent/JPS5875832A/ja
Publication of JPH041493B2 publication Critical patent/JPH041493B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
JP56172950A 1981-10-30 1981-10-30 荷電ビ−ム露光装置用の角形アパ−チヤ作成方法 Granted JPS5875832A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56172950A JPS5875832A (ja) 1981-10-30 1981-10-30 荷電ビ−ム露光装置用の角形アパ−チヤ作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56172950A JPS5875832A (ja) 1981-10-30 1981-10-30 荷電ビ−ム露光装置用の角形アパ−チヤ作成方法

Publications (2)

Publication Number Publication Date
JPS5875832A JPS5875832A (ja) 1983-05-07
JPH041493B2 true JPH041493B2 (cs) 1992-01-13

Family

ID=15951356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56172950A Granted JPS5875832A (ja) 1981-10-30 1981-10-30 荷電ビ−ム露光装置用の角形アパ−チヤ作成方法

Country Status (1)

Country Link
JP (1) JPS5875832A (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002075849A (ja) * 2000-09-04 2002-03-15 Advantest Corp 電子ビーム露光装置、荷電粒子線を整形する部材及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS552118U (cs) * 1978-06-20 1980-01-09
JPS5824009B2 (ja) * 1978-10-23 1983-05-18 日本電子株式会社 電子線露光装置
JPS5678557U (cs) * 1979-11-22 1981-06-25
JPS56115532A (en) * 1980-02-07 1981-09-10 Fujitsu Ltd Aperture

Also Published As

Publication number Publication date
JPS5875832A (ja) 1983-05-07

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