JPH0414490B2 - - Google Patents
Info
- Publication number
- JPH0414490B2 JPH0414490B2 JP59204828A JP20482884A JPH0414490B2 JP H0414490 B2 JPH0414490 B2 JP H0414490B2 JP 59204828 A JP59204828 A JP 59204828A JP 20482884 A JP20482884 A JP 20482884A JP H0414490 B2 JPH0414490 B2 JP H0414490B2
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- lens
- blanking
- deflector
- aperture mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 20
- 238000007493 shaping process Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 230000005284 excitation Effects 0.000 claims description 6
- 239000010419 fine particle Substances 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 description 16
- 238000010884 ion-beam technique Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59204828A JPS6182428A (ja) | 1984-09-29 | 1984-09-29 | 電荷ビ−ム光学鏡筒のレンズ調整方法 |
US06/778,243 US4684809A (en) | 1984-09-29 | 1985-09-20 | Method of adjusting optical column in energy beam exposure system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59204828A JPS6182428A (ja) | 1984-09-29 | 1984-09-29 | 電荷ビ−ム光学鏡筒のレンズ調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6182428A JPS6182428A (ja) | 1986-04-26 |
JPH0414490B2 true JPH0414490B2 (de) | 1992-03-13 |
Family
ID=16497054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59204828A Granted JPS6182428A (ja) | 1984-09-29 | 1984-09-29 | 電荷ビ−ム光学鏡筒のレンズ調整方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4684809A (de) |
JP (1) | JPS6182428A (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0304525A1 (de) * | 1987-08-28 | 1989-03-01 | FISONS plc | Gepulste mikrofokussierte Ionenstrahlen |
JPH02258689A (ja) * | 1989-03-31 | 1990-10-19 | Canon Inc | 結晶質薄膜の形成方法 |
US5920073A (en) * | 1997-04-22 | 1999-07-06 | Schlumberger Technologies, Inc. | Optical system |
US6365897B1 (en) | 1997-12-18 | 2002-04-02 | Nikon Corporation | Electron beam type inspection device and method of making same |
JP6087154B2 (ja) * | 2013-01-18 | 2017-03-01 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置、試料面へのビーム入射角調整方法、および荷電粒子ビーム描画方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5322375A (en) * | 1976-08-13 | 1978-03-01 | Jeol Ltd | Beam blanking device |
JPS5349957A (en) * | 1976-10-18 | 1978-05-06 | Fujitsu Ltd | Focusing method for electronic beam exposure device |
US4560878A (en) * | 1980-05-19 | 1985-12-24 | Hughes Aircraft Company | Electron and ion beam-shaping apparatus |
JPS5740927A (en) * | 1980-08-26 | 1982-03-06 | Fujitsu Ltd | Exposing method of electron beam |
JPS5760842A (en) * | 1980-09-30 | 1982-04-13 | Toshiba Corp | Electron beam exposure device |
JPS5760841A (en) * | 1980-09-30 | 1982-04-13 | Toshiba Corp | Exposure device for electron beam |
EP0049872B1 (de) * | 1980-10-15 | 1985-09-25 | Kabushiki Kaisha Toshiba | System zur Bestrahlung mit Elektronen |
US4423305A (en) * | 1981-07-30 | 1983-12-27 | International Business Machines Corporation | Method and apparatus for controlling alignment of an electron beam of a variable shape |
JPS5979525A (ja) * | 1982-10-29 | 1984-05-08 | Toshiba Corp | 電子ビ−ム露光装置 |
-
1984
- 1984-09-29 JP JP59204828A patent/JPS6182428A/ja active Granted
-
1985
- 1985-09-20 US US06/778,243 patent/US4684809A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4684809A (en) | 1987-08-04 |
JPS6182428A (ja) | 1986-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |