JPH0410739B2 - - Google Patents

Info

Publication number
JPH0410739B2
JPH0410739B2 JP58181096A JP18109683A JPH0410739B2 JP H0410739 B2 JPH0410739 B2 JP H0410739B2 JP 58181096 A JP58181096 A JP 58181096A JP 18109683 A JP18109683 A JP 18109683A JP H0410739 B2 JPH0410739 B2 JP H0410739B2
Authority
JP
Japan
Prior art keywords
oxide film
silicon
substrate
dry etching
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58181096A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6074441A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58181096A priority Critical patent/JPS6074441A/ja
Publication of JPS6074441A publication Critical patent/JPS6074441A/ja
Publication of JPH0410739B2 publication Critical patent/JPH0410739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP58181096A 1983-09-29 1983-09-29 半導体層の表面処理方法 Granted JPS6074441A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58181096A JPS6074441A (ja) 1983-09-29 1983-09-29 半導体層の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58181096A JPS6074441A (ja) 1983-09-29 1983-09-29 半導体層の表面処理方法

Publications (2)

Publication Number Publication Date
JPS6074441A JPS6074441A (ja) 1985-04-26
JPH0410739B2 true JPH0410739B2 (show.php) 1992-02-26

Family

ID=16094758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58181096A Granted JPS6074441A (ja) 1983-09-29 1983-09-29 半導体層の表面処理方法

Country Status (1)

Country Link
JP (1) JPS6074441A (show.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4701998A (en) * 1985-12-02 1987-10-27 International Business Machines Corporation Method for fabricating a bipolar transistor
US4897154A (en) * 1986-07-03 1990-01-30 International Business Machines Corporation Post dry-etch cleaning method for restoring wafer properties
JP2736061B2 (ja) * 1987-09-17 1998-04-02 株式会社東芝 半導体装置の製造方法
US4886765A (en) * 1988-10-26 1989-12-12 American Telephone And Telegraph Company, At&T Bell Laboratories Method of making silicides by heating in oxygen to remove contamination

Also Published As

Publication number Publication date
JPS6074441A (ja) 1985-04-26

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