JPH0410208B2 - - Google Patents
Info
- Publication number
- JPH0410208B2 JPH0410208B2 JP62198129A JP19812987A JPH0410208B2 JP H0410208 B2 JPH0410208 B2 JP H0410208B2 JP 62198129 A JP62198129 A JP 62198129A JP 19812987 A JP19812987 A JP 19812987A JP H0410208 B2 JPH0410208 B2 JP H0410208B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- transfer
- alignment
- pattern
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000012546 transfer Methods 0.000 claims description 51
- 238000001514 detection method Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 8
- 230000001427 coherent effect Effects 0.000 claims description 2
- 230000002452 interceptive effect Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 73
- 230000003287 optical effect Effects 0.000 description 25
- 238000012545 processing Methods 0.000 description 19
- 230000015654 memory Effects 0.000 description 17
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62198129A JPS63158404A (ja) | 1987-08-10 | 1987-08-10 | 転写装置の位置合わせ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62198129A JPS63158404A (ja) | 1987-08-10 | 1987-08-10 | 転写装置の位置合わせ装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56125974A Division JPS5828748A (ja) | 1981-08-13 | 1981-08-13 | 転写装置の位置合わせ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63158404A JPS63158404A (ja) | 1988-07-01 |
JPH0410208B2 true JPH0410208B2 (pt) | 1992-02-24 |
Family
ID=16385933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62198129A Granted JPS63158404A (ja) | 1987-08-10 | 1987-08-10 | 転写装置の位置合わせ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63158404A (pt) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4522142B2 (ja) * | 2004-05-18 | 2010-08-11 | 株式会社日立ハイテクノロジーズ | 露光装置、露光方法、及び基板製造方法 |
KR20210061892A (ko) * | 2019-11-20 | 2021-05-28 | 캐논 톡키 가부시키가이샤 | 얼라인먼트 기구, 얼라인먼트 방법, 성막장치 및 성막 방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53104086A (en) * | 1977-02-21 | 1978-09-09 | Fujitsu Ltd | Servo system |
JPS5459883A (en) * | 1978-10-11 | 1979-05-14 | Hitachi Ltd | Pattern printing apparatus |
JPS55134934A (en) * | 1979-04-09 | 1980-10-21 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Projection exposing method |
JPS5643156U (pt) * | 1979-09-12 | 1981-04-20 | ||
JPS5643156B2 (pt) * | 1976-12-02 | 1981-10-09 |
-
1987
- 1987-08-10 JP JP62198129A patent/JPS63158404A/ja active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5643156B2 (pt) * | 1976-12-02 | 1981-10-09 | ||
JPS53104086A (en) * | 1977-02-21 | 1978-09-09 | Fujitsu Ltd | Servo system |
JPS5459883A (en) * | 1978-10-11 | 1979-05-14 | Hitachi Ltd | Pattern printing apparatus |
JPS55134934A (en) * | 1979-04-09 | 1980-10-21 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Projection exposing method |
JPS5643156U (pt) * | 1979-09-12 | 1981-04-20 |
Also Published As
Publication number | Publication date |
---|---|
JPS63158404A (ja) | 1988-07-01 |
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