JPH0410208B2 - - Google Patents

Info

Publication number
JPH0410208B2
JPH0410208B2 JP62198129A JP19812987A JPH0410208B2 JP H0410208 B2 JPH0410208 B2 JP H0410208B2 JP 62198129 A JP62198129 A JP 62198129A JP 19812987 A JP19812987 A JP 19812987A JP H0410208 B2 JPH0410208 B2 JP H0410208B2
Authority
JP
Japan
Prior art keywords
mask
transfer
alignment
pattern
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62198129A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63158404A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP62198129A priority Critical patent/JPS63158404A/ja
Publication of JPS63158404A publication Critical patent/JPS63158404A/ja
Publication of JPH0410208B2 publication Critical patent/JPH0410208B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP62198129A 1987-08-10 1987-08-10 転写装置の位置合わせ装置 Granted JPS63158404A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62198129A JPS63158404A (ja) 1987-08-10 1987-08-10 転写装置の位置合わせ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62198129A JPS63158404A (ja) 1987-08-10 1987-08-10 転写装置の位置合わせ装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56125974A Division JPS5828748A (ja) 1981-08-13 1981-08-13 転写装置の位置合わせ装置

Publications (2)

Publication Number Publication Date
JPS63158404A JPS63158404A (ja) 1988-07-01
JPH0410208B2 true JPH0410208B2 (enrdf_load_stackoverflow) 1992-02-24

Family

ID=16385933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62198129A Granted JPS63158404A (ja) 1987-08-10 1987-08-10 転写装置の位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS63158404A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4522142B2 (ja) * 2004-05-18 2010-08-11 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び基板製造方法
KR102776950B1 (ko) * 2019-11-20 2025-03-05 캐논 톡키 가부시키가이샤 얼라인먼트 기구, 얼라인먼트 방법, 성막장치 및 성막 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586963B2 (ja) * 1977-02-21 1983-02-07 富士通株式会社 サ−ボ方式
JPS5459883A (en) * 1978-10-11 1979-05-14 Hitachi Ltd Pattern printing apparatus
JPS55134934A (en) * 1979-04-09 1980-10-21 Chiyou Lsi Gijutsu Kenkyu Kumiai Projection exposing method
JPS5643156U (enrdf_load_stackoverflow) * 1979-09-12 1981-04-20

Also Published As

Publication number Publication date
JPS63158404A (ja) 1988-07-01

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