JPH0393638A - 合成石英ガラス粉の製造方法 - Google Patents

合成石英ガラス粉の製造方法

Info

Publication number
JPH0393638A
JPH0393638A JP1228906A JP22890689A JPH0393638A JP H0393638 A JPH0393638 A JP H0393638A JP 1228906 A JP1228906 A JP 1228906A JP 22890689 A JP22890689 A JP 22890689A JP H0393638 A JPH0393638 A JP H0393638A
Authority
JP
Japan
Prior art keywords
silica
methyl silicate
glass powder
quartz glass
synthetic quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1228906A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0574535B2 (enExample
Inventor
Masatoshi Takita
滝田　政俊
Takaaki Shimizu
孝明 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP1228906A priority Critical patent/JPH0393638A/ja
Priority to US07/576,224 priority patent/US5021073A/en
Priority to DE90309654T priority patent/DE69005063T2/de
Priority to EP90309654A priority patent/EP0416865B1/en
Publication of JPH0393638A publication Critical patent/JPH0393638A/ja
Publication of JPH0574535B2 publication Critical patent/JPH0574535B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/30—Additives
    • C03C2203/32—Catalysts
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
JP1228906A 1989-09-04 1989-09-04 合成石英ガラス粉の製造方法 Granted JPH0393638A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1228906A JPH0393638A (ja) 1989-09-04 1989-09-04 合成石英ガラス粉の製造方法
US07/576,224 US5021073A (en) 1989-09-04 1990-08-31 Method of manufacturing synthetic silica glass
DE90309654T DE69005063T2 (de) 1989-09-04 1990-09-04 Synthetisches Quarzglas und Verfahren zu dessen Herstellung.
EP90309654A EP0416865B1 (en) 1989-09-04 1990-09-04 Synthetic silica glass and a manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1228906A JPH0393638A (ja) 1989-09-04 1989-09-04 合成石英ガラス粉の製造方法

Publications (2)

Publication Number Publication Date
JPH0393638A true JPH0393638A (ja) 1991-04-18
JPH0574535B2 JPH0574535B2 (enExample) 1993-10-18

Family

ID=16883709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1228906A Granted JPH0393638A (ja) 1989-09-04 1989-09-04 合成石英ガラス粉の製造方法

Country Status (4)

Country Link
US (1) US5021073A (enExample)
EP (1) EP0416865B1 (enExample)
JP (1) JPH0393638A (enExample)
DE (1) DE69005063T2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110263409A1 (en) * 2008-12-09 2011-10-27 Nippon Electric Glass Co., Ltd. Dielectric material for plasma display panel and glass plate for plasma display

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0801026B1 (en) * 1994-12-26 2000-08-30 Mitsubishi Chemical Corporation Process for producing synthetic quartz powder
KR100364309B1 (ko) * 1996-11-20 2003-01-24 미쓰비시 가가꾸 가부시키가이샤 실리카겔,합성석영유리분말및석영유리의성형품
KR20030068730A (ko) * 2002-02-16 2003-08-25 삼성전자주식회사 솔-젤 공정의 매크로 버블 제거 방법
DE10260320B4 (de) * 2002-12-20 2006-03-30 Wacker Chemie Ag Verglaster SiO2-Formkörper, Verfahren zu seiner Herstellung und Vorrichtung
US8197782B2 (en) * 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0131057B1 (en) * 1982-12-23 1987-11-04 Suwa Seikosha Co. Ltd Process for producing quartz glass
JPS6191024A (ja) * 1984-10-05 1986-05-09 Seiko Epson Corp 円筒状シリカ系ガラスの製造方法
US4680049A (en) * 1986-08-15 1987-07-14 Gte Laboratories Incorporated Process for molding optical components of silicate glass to a near net shape optical precision
EP0310486B1 (en) * 1987-09-30 1992-03-18 Shin-Etsu Chemical Co., Ltd. A method for the preparation of silica glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110263409A1 (en) * 2008-12-09 2011-10-27 Nippon Electric Glass Co., Ltd. Dielectric material for plasma display panel and glass plate for plasma display

Also Published As

Publication number Publication date
JPH0574535B2 (enExample) 1993-10-18
DE69005063T2 (de) 1994-04-21
DE69005063D1 (de) 1994-01-20
EP0416865A1 (en) 1991-03-13
US5021073A (en) 1991-06-04
EP0416865B1 (en) 1993-12-08

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Legal Events

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