DE69005063T2 - Synthetisches Quarzglas und Verfahren zu dessen Herstellung. - Google Patents

Synthetisches Quarzglas und Verfahren zu dessen Herstellung.

Info

Publication number
DE69005063T2
DE69005063T2 DE90309654T DE69005063T DE69005063T2 DE 69005063 T2 DE69005063 T2 DE 69005063T2 DE 90309654 T DE90309654 T DE 90309654T DE 69005063 T DE69005063 T DE 69005063T DE 69005063 T2 DE69005063 T2 DE 69005063T2
Authority
DE
Germany
Prior art keywords
methyl silicate
silica
process according
quartz glass
silicon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE90309654T
Other languages
German (de)
English (en)
Other versions
DE69005063D1 (de
Inventor
Takaaki Shimizu
Masatoshi Takita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin-Etsu Chemical Co Ltd
Original Assignee
Shin-Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin-Etsu Chemical Co Ltd filed Critical Shin-Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE69005063D1 publication Critical patent/DE69005063D1/de
Publication of DE69005063T2 publication Critical patent/DE69005063T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/30—Additives
    • C03C2203/32—Catalysts
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/901—Liquid phase reaction process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE90309654T 1989-09-04 1990-09-04 Synthetisches Quarzglas und Verfahren zu dessen Herstellung. Expired - Fee Related DE69005063T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1228906A JPH0393638A (ja) 1989-09-04 1989-09-04 合成石英ガラス粉の製造方法

Publications (2)

Publication Number Publication Date
DE69005063D1 DE69005063D1 (de) 1994-01-20
DE69005063T2 true DE69005063T2 (de) 1994-04-21

Family

ID=16883709

Family Applications (1)

Application Number Title Priority Date Filing Date
DE90309654T Expired - Fee Related DE69005063T2 (de) 1989-09-04 1990-09-04 Synthetisches Quarzglas und Verfahren zu dessen Herstellung.

Country Status (4)

Country Link
US (1) US5021073A (enExample)
EP (1) EP0416865B1 (enExample)
JP (1) JPH0393638A (enExample)
DE (1) DE69005063T2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69518669T2 (de) * 1994-12-26 2001-04-12 Mitsubishi Chemical Corp., Tokio/Tokyo Verfahren zur herstellung eines synthetischen quarzpulvers
KR100364309B1 (ko) * 1996-11-20 2003-01-24 미쓰비시 가가꾸 가부시키가이샤 실리카겔,합성석영유리분말및석영유리의성형품
KR20030068730A (ko) * 2002-02-16 2003-08-25 삼성전자주식회사 솔-젤 공정의 매크로 버블 제거 방법
DE10260320B4 (de) * 2002-12-20 2006-03-30 Wacker Chemie Ag Verglaster SiO2-Formkörper, Verfahren zu seiner Herstellung und Vorrichtung
JP2010159198A (ja) * 2008-12-09 2010-07-22 Nippon Electric Glass Co Ltd プラズマディスプレイパネル用誘電体材料
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
US8197782B2 (en) * 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4681615A (en) * 1982-12-23 1987-07-21 Seiko Epson Kabushiki Kaisha Silica glass formation process
JPS6191024A (ja) * 1984-10-05 1986-05-09 Seiko Epson Corp 円筒状シリカ系ガラスの製造方法
US4680049A (en) * 1986-08-15 1987-07-14 Gte Laboratories Incorporated Process for molding optical components of silicate glass to a near net shape optical precision
EP0310486B1 (en) * 1987-09-30 1992-03-18 Shin-Etsu Chemical Co., Ltd. A method for the preparation of silica glass

Also Published As

Publication number Publication date
JPH0574535B2 (enExample) 1993-10-18
US5021073A (en) 1991-06-04
EP0416865A1 (en) 1991-03-13
EP0416865B1 (en) 1993-12-08
JPH0393638A (ja) 1991-04-18
DE69005063D1 (de) 1994-01-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee