JPH0380254B2 - - Google Patents
Info
- Publication number
- JPH0380254B2 JPH0380254B2 JP58244783A JP24478383A JPH0380254B2 JP H0380254 B2 JPH0380254 B2 JP H0380254B2 JP 58244783 A JP58244783 A JP 58244783A JP 24478383 A JP24478383 A JP 24478383A JP H0380254 B2 JPH0380254 B2 JP H0380254B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- forming
- low resistance
- insulating layer
- epitaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 238000005530 etching Methods 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 18
- 239000013078 crystal Substances 0.000 claims description 13
- 238000009792 diffusion process Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 5
- 239000003990 capacitor Substances 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000000407 epitaxy Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 238000003486 chemical etching Methods 0.000 description 5
- 230000000087 stabilizing effect Effects 0.000 description 5
- 238000005187 foaming Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24478383A JPS60138434A (ja) | 1983-12-27 | 1983-12-27 | 半導体形静電容量式圧力センサの製造方法 |
| DE19843445774 DE3445774A1 (de) | 1983-12-27 | 1984-12-12 | Verfahren zur herstellung eines kapazitiven halbleiterdruckaufnehmers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24478383A JPS60138434A (ja) | 1983-12-27 | 1983-12-27 | 半導体形静電容量式圧力センサの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60138434A JPS60138434A (ja) | 1985-07-23 |
| JPH0380254B2 true JPH0380254B2 (zh) | 1991-12-24 |
Family
ID=17123853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24478383A Granted JPS60138434A (ja) | 1983-12-27 | 1983-12-27 | 半導体形静電容量式圧力センサの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS60138434A (zh) |
| DE (1) | DE3445774A1 (zh) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6263828A (ja) * | 1985-09-06 | 1987-03-20 | Yokogawa Electric Corp | 振動式トランスジューサ |
| US4872945A (en) * | 1986-06-25 | 1989-10-10 | Motorola Inc. | Post seal etching of transducer diaphragm |
| JPH0750789B2 (ja) * | 1986-07-18 | 1995-05-31 | 日産自動車株式会社 | 半導体圧力変換装置の製造方法 |
| JPH064304Y2 (ja) * | 1987-08-17 | 1994-02-02 | 横河電機株式会社 | 静電容量形半導体圧力センサ |
| DE4106933B4 (de) * | 1991-03-05 | 2004-12-16 | Robert Bosch Gmbh | Strukturierungsverfahren |
| EP0714017B1 (de) * | 1994-11-24 | 2000-07-12 | Siemens Aktiengesellschaft | Kapazitiver Drucksensor |
| DE4441903C1 (de) * | 1994-11-24 | 1996-03-21 | Siemens Ag | Drucksensor |
| DE59600621D1 (de) * | 1995-08-09 | 1998-11-05 | Siemens Ag | Mikromechanisches Bauelement mit perforierter, spannungsfreier Membran |
| US5888845A (en) * | 1996-05-02 | 1999-03-30 | National Semiconductor Corporation | Method of making high sensitivity micro-machined pressure sensors and acoustic transducers |
| DE59907268D1 (de) | 1998-08-11 | 2003-11-13 | Infineon Technologies Ag | Verfahren zur Herstellung eines Mikromechanischen Sensors |
| JP4250387B2 (ja) | 2002-08-20 | 2009-04-08 | 長野計器株式会社 | 変換器およびその製造方法 |
| JP2009033698A (ja) * | 2007-06-22 | 2009-02-12 | Panasonic Corp | ダイアフラム構造及び音響センサ |
| CN102143906A (zh) | 2008-09-10 | 2011-08-03 | 松下电器产业株式会社 | 微机电系统器件及其制造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5516228A (en) * | 1978-07-21 | 1980-02-04 | Hitachi Ltd | Capacity type sensor |
| JPS5764978A (en) * | 1980-10-03 | 1982-04-20 | Ibm | Capacitive pressure transducer |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2856708A1 (de) * | 1978-12-29 | 1980-07-10 | Siemens Ag | Messanordnung fuer einen druck-messumformer |
| US4261086A (en) * | 1979-09-04 | 1981-04-14 | Ford Motor Company | Method for manufacturing variable capacitance pressure transducers |
| DE2940955A1 (de) * | 1979-10-09 | 1981-04-23 | Gosudarstvennyj naučno-issledovatel'skij institut teploenergetičeskogo priborostroenija, Moskva | Halbleiter-dehnungswandler |
-
1983
- 1983-12-27 JP JP24478383A patent/JPS60138434A/ja active Granted
-
1984
- 1984-12-12 DE DE19843445774 patent/DE3445774A1/de not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5516228A (en) * | 1978-07-21 | 1980-02-04 | Hitachi Ltd | Capacity type sensor |
| JPS5764978A (en) * | 1980-10-03 | 1982-04-20 | Ibm | Capacitive pressure transducer |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3445774A1 (de) | 1985-07-04 |
| JPS60138434A (ja) | 1985-07-23 |
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