JPH0379434B2 - - Google Patents

Info

Publication number
JPH0379434B2
JPH0379434B2 JP28346685A JP28346685A JPH0379434B2 JP H0379434 B2 JPH0379434 B2 JP H0379434B2 JP 28346685 A JP28346685 A JP 28346685A JP 28346685 A JP28346685 A JP 28346685A JP H0379434 B2 JPH0379434 B2 JP H0379434B2
Authority
JP
Japan
Prior art keywords
cooling base
crucible
evaporated
crucibles
vacuum evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP28346685A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62142760A (ja
Inventor
Kunio Tanaka
Tanejiro Ikeda
Masahide Yokoyama
Hidetoshi Kawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP28346685A priority Critical patent/JPS62142760A/ja
Publication of JPS62142760A publication Critical patent/JPS62142760A/ja
Publication of JPH0379434B2 publication Critical patent/JPH0379434B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP28346685A 1985-12-17 1985-12-17 真空蒸着装置 Granted JPS62142760A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28346685A JPS62142760A (ja) 1985-12-17 1985-12-17 真空蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28346685A JPS62142760A (ja) 1985-12-17 1985-12-17 真空蒸着装置

Publications (2)

Publication Number Publication Date
JPS62142760A JPS62142760A (ja) 1987-06-26
JPH0379434B2 true JPH0379434B2 (enrdf_load_html_response) 1991-12-18

Family

ID=17665907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28346685A Granted JPS62142760A (ja) 1985-12-17 1985-12-17 真空蒸着装置

Country Status (1)

Country Link
JP (1) JPS62142760A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5179716B2 (ja) * 2005-11-17 2013-04-10 キヤノントッキ株式会社 電子ビーム真空蒸着方法およびその装置

Also Published As

Publication number Publication date
JPS62142760A (ja) 1987-06-26

Similar Documents

Publication Publication Date Title
JPS59208069A (ja) 多くの物質を蒸着させるための放射加熱部を有する蒸発装置
GB1315011A (en) Thin film coils and method and apparatus for making the same
JPS6345365A (ja) 基板に反応性蒸着する方法及び装置
JP4570232B2 (ja) プラズマディスプレイ保護膜形成装置および保護膜形成方法
US3227133A (en) Multiple layer coating and cleaning
JPH0379434B2 (enrdf_load_html_response)
JPS62142761A (ja) 真空蒸着装置
US4048462A (en) Compact rotary evaporation source
JPH06340967A (ja) 蒸着装置
JP2548387B2 (ja) 液晶の配向膜の製造装置
JPH0527489Y2 (enrdf_load_html_response)
JPH03173767A (ja) 薄膜形成装置
JP5179716B2 (ja) 電子ビーム真空蒸着方法およびその装置
KR20060030426A (ko) 진공 증착장치 및 진공 증착 방법
JPH0336519Y2 (enrdf_load_html_response)
JPH01119663A (ja) 薄膜形成装置
JPH0322464B2 (enrdf_load_html_response)
JPS61195968A (ja) 合金蒸着膜の製造方法
JPH05287520A (ja) 成膜装置
JPS58207371A (ja) 真空蒸着用蒸着源
JPS61227165A (ja) 蒸着装置
Craswell An apparatus for use in coating a body with an evaporant
JPS6263669A (ja) 電子ビ−ム蒸着装置
JPS58204173A (ja) 蒸着装置および蒸着方法
JPH0382757A (ja) 薄膜作製装置