JPH0379434B2 - - Google Patents
Info
- Publication number
- JPH0379434B2 JPH0379434B2 JP28346685A JP28346685A JPH0379434B2 JP H0379434 B2 JPH0379434 B2 JP H0379434B2 JP 28346685 A JP28346685 A JP 28346685A JP 28346685 A JP28346685 A JP 28346685A JP H0379434 B2 JPH0379434 B2 JP H0379434B2
- Authority
- JP
- Japan
- Prior art keywords
- cooling base
- crucible
- evaporated
- crucibles
- vacuum evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001816 cooling Methods 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 17
- 238000007738 vacuum evaporation Methods 0.000 claims description 11
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 description 14
- 230000008020 evaporation Effects 0.000 description 14
- 230000008021 deposition Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 101100298222 Caenorhabditis elegans pot-1 gene Proteins 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、真空蒸着装置に関するものである。[Detailed description of the invention] Industrial applications The present invention relates to a vacuum evaporation apparatus.
従来の技術
近年、真空蒸着装置の被蒸着物を収容するるつ
ぼは、成膜プロセスの連続化及び多層膜化に対応
して、複数個配置され、順次電子ビーム加熱位置
に移動されるようになつている。これにより、連
続蒸着中に必要となる被蒸着物の材料補給及び材
料交換の度に、真空槽を大気圧に戻し、るつぼを
交換するという作業が省け、連続蒸着及び多層膜
蒸着が容易となつた。BACKGROUND ART In recent years, a plurality of crucibles for storing materials to be deposited in a vacuum evaporation apparatus have been arranged and successively moved to an electron beam heating position in response to continuous and multilayer film formation processes. ing. This eliminates the need to return the vacuum chamber to atmospheric pressure and replace the crucible each time the material to be deposited is replenished or replaced during continuous deposition, making continuous deposition and multilayer film deposition easier. Ta.
以下、上述した複数個のるつぼの駆動機構につ
いて説明する。 Hereinafter, the drive mechanism for the plurality of crucibles mentioned above will be explained.
第3図及び第4図は従来の複数個のるつぼの駆
動機構を示すものである。第3図において、1は
被蒸発物を収容するるつぼである。2はるつぼ1
が複数個同心円状に配置された冷却基台、3は電
子銃、4は電子銃3で発生した電子ビームを偏向
させる偏向磁場である。 FIGS. 3 and 4 show a conventional drive mechanism for a plurality of crucibles. In FIG. 3, 1 is a crucible containing a substance to be evaporated. 2 melting pot 1
3 is an electron gun, and 4 is a deflection magnetic field for deflecting the electron beam generated by the electron gun 3.
以上のように構成された複数個のるつぼの駆動
機構について、以下その動作について説明する。 The operation of the drive mechanism for a plurality of crucibles configured as described above will be described below.
るつぼ1が複数個同心状に配置された冷却基台
2が回転することにより、任意のるつぼ1を、電
子銃3より発生し偏向磁場3により偏向した電子
ビームの照射加熱位置に移動させる。るつぼ1内
に収容された被蒸発物は加熱されて蒸発する。蒸
着プロセスで被蒸発物の材料補給及び材料交換毎
に、冷却基台は回転し、所定の被蒸発物が収容さ
れたるつぼを電子ビームの照射位置に移動させ
る。 By rotating a cooling base 2 on which a plurality of crucibles 1 are arranged concentrically, any crucible 1 is moved to a heating position where it is irradiated with an electron beam generated by an electron gun 3 and deflected by a deflection magnetic field 3. The material to be evaporated contained in the crucible 1 is heated and evaporated. Each time the material to be evaporated is replenished or replaced in the vapor deposition process, the cooling base rotates and moves the crucible containing the predetermined material to be evaporated to the electron beam irradiation position.
発明が解決しようとする問題点
しかしながら上記のような構成では、巻き取り
蒸着装置のように長時間の連続蒸着を行なうため
に大型るつぼを使用する場合、るつぼを同心円上
に配置した冷却基台が大きくなりすぎて、真空槽
が大型になり、そのため真空槽の排気及び冷却基
台の駆動機構に費用がかかりすぎるという問題が
あつた。Problems to be Solved by the Invention However, with the above configuration, when a large crucible is used for continuous deposition over a long period of time, such as in a winding deposition device, the cooling base on which the crucibles are arranged concentrically is There was a problem in that the vacuum chamber became too large and the exhaust of the vacuum chamber and the drive mechanism for the cooling base were too expensive.
また、るつぼ内の被蒸発物の蒸発面の高さは、
蒸着基板上の膜厚分布と相関することが知られ、
るつぼの高さ、すなわち被蒸発物の蒸発面の高さ
を調節することが必要であるが、従来例の構成で
はその調節は不可能であつた。 Also, the height of the evaporation surface of the material to be evaporated in the crucible is
It is known that there is a correlation with the film thickness distribution on the deposition substrate.
Although it is necessary to adjust the height of the crucible, that is, the height of the evaporation surface of the material to be evaporated, this adjustment has not been possible with the conventional configuration.
本発明は上記問題点に鑑み、複数個のるつぼが
配置された小型の冷却基台及びるつぼの交換及び
るつぼ内の被蒸発物の蒸発面の高さの調節を可能
とした駆動機構を備えた真空蒸着装置を提供する
ものである。 In view of the above-mentioned problems, the present invention includes a small cooling base on which a plurality of crucibles are arranged, and a drive mechanism that enables exchange of the crucibles and adjustment of the height of the evaporation surface of the material to be evaporated in the crucible. A vacuum evaporation device is provided.
問題点を解決するための手段
上記問題点を解決するために本発明の真空蒸着
装置は、被蒸発物を収容する複数個のるつぼが直
線上に配置された冷却基台と、冷却基台を左右及
び上下に駆動させる駆動系を備えたものである。Means for Solving the Problems In order to solve the above problems, the vacuum evaporation apparatus of the present invention includes a cooling base in which a plurality of crucibles containing materials to be evaporated are arranged in a straight line; It is equipped with a drive system that drives left and right and up and down.
作 用
本発明は上記した構成によつて、大型るつぼを
使用する場合でも、るつぼを直線上に配置するた
め、従来の同心円型の冷却基台と比較して冷却基
台の外形が半分以下となるとともに、冷却基台を
上下に昇降可能なため、るつぼ内の被蒸発物の蒸
発面の高さが調節可能となつた。Effects The present invention has the above-described configuration, and even when a large crucible is used, the crucible is arranged in a straight line, so the outer diameter of the cooling base is less than half that of a conventional concentric cooling base. At the same time, since the cooling base can be moved up and down, the height of the evaporation surface of the material to be evaporated in the crucible can be adjusted.
実施例
以下本発明の一実施例の真空蒸着装置につい
て、図面を参照しながら説明する。Embodiment A vacuum evaporation apparatus according to an embodiment of the present invention will be described below with reference to the drawings.
第1図は本発明の実施例における真空蒸着装置
の蒸発源の構成を示すものである。5は被蒸発物
を収容したるつぼ、6は複数個のるつぼ5が直線
上に配置された冷却基台、7は電子銃、8は電子
銃7から発生した電子ビームを偏向させる偏向磁
場、9は冷却基台6を電子銃7に対して左右及び
上下に駆動する駆動系である。第2図は蒸発源の
断面図である。 FIG. 1 shows the configuration of an evaporation source of a vacuum evaporation apparatus in an embodiment of the present invention. 5 is a crucible containing the material to be evaporated; 6 is a cooling base on which a plurality of crucibles 5 are arranged in a straight line; 7 is an electron gun; 8 is a deflection magnetic field for deflecting the electron beam generated from the electron gun 7; is a drive system that drives the cooling base 6 horizontally and vertically relative to the electron gun 7. FIG. 2 is a cross-sectional view of the evaporation source.
以上のように構成された真空蒸着装置につい
て、以下第1図及び第2図を用いてその動作を説
明する。 The operation of the vacuum evaporation apparatus configured as described above will be described below with reference to FIGS. 1 and 2.
被蒸発物を収容したるつぼ5が直線上に配置さ
れた冷却基台6を駆動系9により左右に移動する
ことにより、電子銃7から発生し偏向磁場8によ
り偏向した電子ビームの照射加熱位置に所定のる
つぼ5が移動する。これにより、被蒸発物の材料
補給及び材料交換が可能となる。 By moving the cooling base 6 on which the crucible 5 containing the material to be evaporated is arranged in a straight line from side to side by the drive system 9, it is brought to the irradiation heating position of the electron beam generated from the electron gun 7 and deflected by the deflection magnetic field 8. A predetermined crucible 5 moves. This makes it possible to replenish and replace the material to be evaporated.
また駆動系9により冷却基台6が上下に昇降す
ることにより、冷却基台6に配置されたるつぼ5
の高さが変化し、るつぼ5内の被蒸発物の蒸発面
の高さが調節可能となる。 In addition, by moving the cooling base 6 up and down by the drive system 9, the crucible 5 placed on the cooling base 6 is moved up and down.
The height of the evaporation surface of the material to be evaporated in the crucible 5 can be adjusted.
以上のように本実施例によれば、複数個のるつ
ぼを直線上に冷却基台上に配置することにより、
冷却基台の外形を大幅に小さくできるとともに、
冷却基台を上下に昇降させることにより、るつぼ
内の蒸発面の高さを調節可能にした。 As described above, according to this embodiment, by arranging a plurality of crucibles on the cooling base in a straight line,
In addition to being able to significantly reduce the external size of the cooling base,
By moving the cooling base up and down, the height of the evaporation surface inside the crucible can be adjusted.
発明の効果
以上のように、本発明は被蒸発明を収容する複
数個のるつぼが直線上に配置された冷却基台と、
前記冷却基台を左右に移動させるとともに上下に
昇降させる駆動系とを設けることにより、冷却基
台の外形を小さくし、それにともない真空槽の小
型化及び駆動系の簡素化を可能にするとともに、
被蒸発物の蒸発物の蒸発面の高さを調節可能にす
ることができる。Effects of the Invention As described above, the present invention provides a cooling base in which a plurality of crucibles containing the invention to be vaporized are arranged in a straight line;
By providing a drive system that moves the cooling base from side to side and raises and lowers it up and down, the outer size of the cooling base can be reduced, thereby making it possible to downsize the vacuum chamber and simplify the drive system.
The height of the evaporation surface of the evaporation object can be adjusted.
第1図は本発明の実施例における真空蒸着装置
の蒸発源の構成を示す平面図、第2図は蒸発源の
断面図、第3図は従来例の真空蒸着装置の蒸発源
の構成を示す平面図、第4図は蒸発源の断面図で
ある。
5……るつぼ、6……冷却基台、7……電子
銃、8……偏向磁場、9……駆動系。
FIG. 1 is a plan view showing the configuration of an evaporation source in a vacuum evaporation apparatus according to an embodiment of the present invention, FIG. 2 is a sectional view of the evaporation source, and FIG. 3 is a diagram showing the configuration of an evaporation source in a conventional vacuum evaporation apparatus. The plan view and FIG. 4 are cross-sectional views of the evaporation source. 5... Crucible, 6... Cooling base, 7... Electron gun, 8... Deflection magnetic field, 9... Drive system.
Claims (1)
ビームで加熱、蒸発させて基板に被着する真空蒸
着装置であつて、前記被蒸発物を収容する複数個
のるつぼが直線上に配置された冷却基台と、前記
冷却基台を左右に移動させるとともに上下に昇降
させる駆動系とを備えたことを特徴とする真空蒸
着装置。1 A vacuum evaporation apparatus that heats and evaporates a material to be evaporated with an electron beam in a vacuum chamber whose interior can be evacuated, and deposits the material on a substrate, wherein a plurality of crucibles containing the material to be evaporated are arranged in a straight line. 1. A vacuum evaporation apparatus comprising: a cooling base; and a drive system that moves the cooling base from side to side and raises and lowers it up and down.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28346685A JPS62142760A (en) | 1985-12-17 | 1985-12-17 | Vacuum deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28346685A JPS62142760A (en) | 1985-12-17 | 1985-12-17 | Vacuum deposition device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62142760A JPS62142760A (en) | 1987-06-26 |
JPH0379434B2 true JPH0379434B2 (en) | 1991-12-18 |
Family
ID=17665907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28346685A Granted JPS62142760A (en) | 1985-12-17 | 1985-12-17 | Vacuum deposition device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62142760A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5179716B2 (en) * | 2005-11-17 | 2013-04-10 | キヤノントッキ株式会社 | Electron beam vacuum deposition method and apparatus |
-
1985
- 1985-12-17 JP JP28346685A patent/JPS62142760A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62142760A (en) | 1987-06-26 |
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