JPS62142760A - Vacuum deposition device - Google Patents

Vacuum deposition device

Info

Publication number
JPS62142760A
JPS62142760A JP28346685A JP28346685A JPS62142760A JP S62142760 A JPS62142760 A JP S62142760A JP 28346685 A JP28346685 A JP 28346685A JP 28346685 A JP28346685 A JP 28346685A JP S62142760 A JPS62142760 A JP S62142760A
Authority
JP
Japan
Prior art keywords
evaporated
cooling base
crucibles
crucible
straight line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28346685A
Other languages
Japanese (ja)
Other versions
JPH0379434B2 (en
Inventor
Kunio Tanaka
田中 邦生
Tanejiro Ikeda
池田 種次郎
Masahide Yokoyama
政秀 横山
Hidetoshi Kawa
川 秀俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP28346685A priority Critical patent/JPS62142760A/en
Publication of JPS62142760A publication Critical patent/JPS62142760A/en
Publication of JPH0379434B2 publication Critical patent/JPH0379434B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To reduce the outside shape of a cooling base plate and to reduce the size of a vacuum vessel by providing the cooling base plate disposed with crucibles for containing materials to be evaporated on a straight line and making said plate movable, laterally and vertically. CONSTITUTION:This vacuum deposition device is formed of the cooling base plate 6 and a driving system 9 for moving said plate to the right and left and lifting the same upward and downward. The base plate 6 is disposed with plural pieces of the crucibles 5 for containing the materials to be evaporated on the straight line. The materials to be evaporated, heated and evaporated by an electron beam 7 are deposited on substrates in a vacuum vessel.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、真空蒸着装#に関するものである0従来の技
術 近年、真空蒸着装置の被蒸着物を収容するるつぼは、成
膜プロセスの連続化及び多層膜化に対応して、複数個配
置さn、順次電子ビーム加熱位置に移動さnるようにな
っている。これにより、連続蒸着中に必要となる被蒸着
物の材料補給及び材料交換の度に、真空槽を大気圧に戻
し、るつぼを交換するという作業が省け、連続蒸着及び
多層膜蒸着が容易となった。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a vacuum evaporation apparatus. 0. Prior Art In recent years, crucibles for storing materials to be deposited in vacuum evaporation apparatuses have been used for continuous film formation processes and In response to multilayer films, a plurality of them are arranged and sequentially moved to the electron beam heating position. This eliminates the need to return the vacuum chamber to atmospheric pressure and replace the crucible each time the material to be deposited is replenished or replaced during continuous deposition, making continuous deposition and multilayer film deposition easier. Ta.

以下、上述した複数個のるつぼの駆動機構について説明
する。
Hereinafter, the drive mechanism for the plurality of crucibles mentioned above will be explained.

第3図及び第4図に従来の複数個のるつぼの駆動機構を
示すものである。第3図において、1は被蒸発物を収容
するるつぼである。2はるつぼ1が複数個同心円状に配
置さnた冷却基台、3は電子銃、4は電子銃3で発生し
た電子ビームを偏向させる偏向磁場である。
FIGS. 3 and 4 show a conventional drive mechanism for a plurality of crucibles. In FIG. 3, 1 is a crucible containing a substance to be evaporated. 2 is a cooling base on which a plurality of crucibles 1 are arranged concentrically, 3 is an electron gun, and 4 is a deflection magnetic field for deflecting the electron beam generated by the electron gun 3.

以上のように構成された複数個のるつぼの駆動機構につ
いて、以下その動作について説明する。
The operation of the drive mechanism for a plurality of crucibles configured as described above will be described below.

るつぼ1が複数個同心状に配置された冷却基台2が回転
することにより、任意のるつぼ1を、電子銃3より発生
し偏向磁場3により偏向した電子ビームの照射加熱位置
に移動させる。るつぼ1内に収容された被蒸発物は加熱
さ扛て蒸発する。蒸着プロセスで被蒸発物の材料補給及
び材料交換毎に、冷却基台は回転し、所定の被蒸発物が
収容さルたるつぼを電子ビームの照射位置に移動させる
By rotating a cooling base 2 on which a plurality of crucibles 1 are arranged concentrically, any crucible 1 is moved to a heating position where it is irradiated with an electron beam generated by an electron gun 3 and deflected by a deflection magnetic field 3. The material to be evaporated contained in the crucible 1 is heated and evaporated. Each time the material to be evaporated is replenished or replaced in the vapor deposition process, the cooling base rotates and moves the crucible containing the predetermined material to be evaporated to the electron beam irradiation position.

発明が解決しようとする問題点 しかしながら上記のような構成では、巻き取り蒸着装置
のように長時間の連続蒸着を行なうために大型るつぼを
使用する場合、るつぼを同心円上に配置した冷却基台が
大きくなりすぎて、真空槽が大型になり、そのため真空
槽の排気及び冷却基台の駆動機構に費用がかかりすぎる
という問題があった。
Problems to be Solved by the Invention However, with the above configuration, when a large crucible is used for continuous deposition over a long period of time, such as in a winding deposition system, the cooling base on which the crucibles are arranged concentrically is If the vacuum chamber becomes too large, there is a problem that the exhaust of the vacuum chamber and the drive mechanism for the cooling base are too expensive.

捷だ、るつぼ内の被蒸発物の蒸発面の高さは、蒸着基板
上の膜厚分布と相関することが知られ、るつぼの高さ、
すなわち被蒸発物の蒸発面の高さを調節することが必要
であるが、従来例の構成ではその調節は不可能であった
It is known that the height of the evaporation surface of the material to be evaporated in the crucible is correlated with the film thickness distribution on the deposition substrate, and the height of the crucible,
That is, it is necessary to adjust the height of the evaporation surface of the material to be evaporated, but this adjustment was not possible with the conventional configuration.

本発明は上記問題点に鑑み、複数個のるつぼが配置さ扛
た小型の冷却基台及びるつぼの交換及びるつぼ内の被蒸
発物の蒸発面の高さの調節を可能とした駆動機構を備え
た真空蒸着装置を提供するものである。
In view of the above-mentioned problems, the present invention includes a small cooling base on which a plurality of crucibles are arranged and a drive mechanism that enables exchange of the crucibles and adjustment of the height of the evaporation surface of the material to be evaporated in the crucible. The present invention provides a vacuum evaporation apparatus that provides a vacuum evaporation system.

問題点を解決するだめの手段 上記問題点を解決するために本発明の真空蒸着装置は、
被蒸発物を収容する複数個のるつぼが直線上に配置され
た冷却基台と、冷却基台を左右及び上下に駆動させる1
東動系を備えたものである。
Means for Solving the Problems In order to solve the above problems, the vacuum evaporation apparatus of the present invention has the following features:
A cooling base in which a plurality of crucibles containing substances to be evaporated are arranged in a straight line, and 1 for driving the cooling base left and right and up and down.
It is equipped with a Todo system.

作   用 本発明は上記した構成によって、大型るつぼを使用する
場合でも、るつぼを直線上に配置するため、従来の同心
円型の冷却基台と比較して冷却基さが調節可能となった
Effects The present invention has the above-described configuration, and even when using a large crucible, the crucible is arranged in a straight line, so the cooling base can be adjusted compared to the conventional concentric cooling base.

実施例 以下本発明の一実施例の真空蒸着装置について、図面を
参照しながら説明する。
EXAMPLE Hereinafter, a vacuum evaporation apparatus according to an example of the present invention will be described with reference to the drawings.

第1図は本発明の実施例における真空蒸着装置の蒸発源
の構成を示すものである。5は被蒸発物を収容したるつ
ぼ、6は複数個のるつぼ6が直線上に配置さ牡た冷却基
台、7は電子銃、8は電子銃7から発生した′電子ビー
ムを偏向させる偏向磁場、9は冷却基台6を電子銃7に
対して左右及び上下に、“枢動する駆動系である。第2
図は蒸発源の断面図である。
FIG. 1 shows the configuration of an evaporation source of a vacuum evaporation apparatus in an embodiment of the present invention. 5 is a crucible containing the material to be evaporated, 6 is a cooling base on which a plurality of crucibles 6 are arranged in a straight line, 7 is an electron gun, and 8 is a deflection magnetic field for deflecting the electron beam generated from the electron gun 7. , 9 is a drive system that pivots the cooling base 6 horizontally and vertically with respect to the electron gun 7.
The figure is a cross-sectional view of the evaporation source.

以上のように構成された真空蒸着装置について、以下第
1図及び第2図を用いてその動作を説明する。
The operation of the vacuum evaporation apparatus configured as described above will be described below with reference to FIGS. 1 and 2.

被蒸発物を収容したるつぼ5が直線上に配置さnた冷却
基台6を駆動系9により左右に移動するが移動する。こ
扛により、被蒸発物の材料補給及び材料交換が可能とな
る。
A cooling base 6 on which a crucible 5 containing a substance to be evaporated is arranged in a straight line is moved left and right by a drive system 9. This makes it possible to replenish and exchange materials to be evaporated.

また、I駆動系9により冷却基台6が上下に昇降するこ
とにより、冷却基台6に配置されたるつぼ5の高さが変
化し、るつぼ6内の被蒸発物の蒸へ而の高さが調節可能
となる。
In addition, by moving the cooling base 6 up and down by the I drive system 9, the height of the crucible 5 placed on the cooling base 6 changes, and the height of the vaporized material in the crucible 6 changes. can be adjusted.

以上のように本実施例によr、ば、複数個のるつぼ全直
線上に冷却基台上に配置することにより、冷却基台の外
形を大幅に小さくできるとともに、冷却基台全上下に昇
降させることにより、るつぼ内の蒸発面の高さを調節可
能にしたつ 発明の効果 以上のように、本発明は被照発明を収容する複数個のる
つぼが直線上に配IRさ扛た冷却基台と、前記冷却基台
を左右に移動させるとともに上下に昇降させる駆動系と
を設けることにより、冷却基台の外形を小さくし、それ
にともない真空槽の小できる。
As described above, by arranging a plurality of crucibles on the cooling base in a straight line, the external size of the cooling base can be significantly reduced, and the cooling base can be raised and lowered in all directions. As described above, the present invention provides a cooling base in which a plurality of crucibles containing illuminated inventions are arranged in a straight line and arranged in a straight line with IR. By providing a stand and a drive system that moves the cooling base from side to side and raises and lowers it up and down, the outer size of the cooling base can be reduced, and the vacuum chamber can be made smaller accordingly.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例における4空蒸着装置の蒸発源
の構成を示す平面図、第2図は蒸発源の断面図、第3図
は従来例の真空蒸着装置の蒸発源の構成を示す平面図、
第4図は蒸発源の断面図である。 5・・・・・るつぼ、6・・・・・・冷却基台、7 ・
・電子銃、8・・・・・偏向磁場、9・−・・・・1川
動系。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名5−
−−るフLご 第2図 第3図 第 4 図
FIG. 1 is a plan view showing the configuration of an evaporation source in a four-vacuum evaporation apparatus according to an embodiment of the present invention, FIG. 2 is a sectional view of the evaporation source, and FIG. A plan view showing,
FIG. 4 is a cross-sectional view of the evaporation source. 5... Crucible, 6... Cooling base, 7.
・Electron gun, 8...deflection magnetic field, 9...1 river motion system. Name of agent: Patent attorney Toshio Nakao and 1 other person5-
--Rufu L Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 内部が排気可能な真空槽内で被蒸発物を電子ビームで加
熱、蒸発させて基板に被着する真空蒸着装置であって、
前記被蒸発物を収容する複数個のるつぼが直線上に配置
された冷却基台と、前記冷却基台を左右に移動させると
ともに上下に昇降させる駆動系とを備えたことを特徴と
する真空蒸着装置。
A vacuum evaporation device that heats and evaporates a material to be evaporated with an electron beam in a vacuum chamber whose interior can be evacuated, and deposits the material on a substrate,
Vacuum evaporation characterized by comprising a cooling base in which a plurality of crucibles containing the material to be evaporated are arranged in a straight line, and a drive system that moves the cooling base from side to side and raises and lowers it up and down. Device.
JP28346685A 1985-12-17 1985-12-17 Vacuum deposition device Granted JPS62142760A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28346685A JPS62142760A (en) 1985-12-17 1985-12-17 Vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28346685A JPS62142760A (en) 1985-12-17 1985-12-17 Vacuum deposition device

Publications (2)

Publication Number Publication Date
JPS62142760A true JPS62142760A (en) 1987-06-26
JPH0379434B2 JPH0379434B2 (en) 1991-12-18

Family

ID=17665907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28346685A Granted JPS62142760A (en) 1985-12-17 1985-12-17 Vacuum deposition device

Country Status (1)

Country Link
JP (1) JPS62142760A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007138235A (en) * 2005-11-17 2007-06-07 Tokki Corp Electron beam vacuum vapor deposition method, and its apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007138235A (en) * 2005-11-17 2007-06-07 Tokki Corp Electron beam vacuum vapor deposition method, and its apparatus

Also Published As

Publication number Publication date
JPH0379434B2 (en) 1991-12-18

Similar Documents

Publication Publication Date Title
US3945903A (en) Sputter-coating of glass sheets or other substrates
US3641973A (en) Vacuum coating apparatus
EP0740710B1 (en) Magnetron sputtering apparatus for compound thin films
JP2002038256A (en) Electron beam source with more than one pocket
JPS59208069A (en) Evaporation device having radiation heat portion for evaporating many substances
KR20170102615A (en) Plane source evaporator for flexible OLED pattern production
JPS62142760A (en) Vacuum deposition device
JPH02173261A (en) Vacuum film forming device
JPS62142761A (en) Vacuum deposition device
JPS6379959A (en) Device for vapor-depositing thin film
JP3865841B2 (en) Electron beam evaporation system
JPH0527489Y2 (en)
JP5179716B2 (en) Electron beam vacuum deposition method and apparatus
JPS61276964A (en) Rotary film forming apparatus
JP2548387B2 (en) Liquid crystal alignment film manufacturing equipment
JPH0770740A (en) Formation of conductive thin film
JPH0633225A (en) Vacuum deposition device
JPH03173767A (en) Apparatus for forming thin film
KR20000054211A (en) Heating crucible of apparatus for depositing a organic materials
WO2023155613A1 (en) Pulsed laser deposition device and method
JP2890686B2 (en) Laser sputtering equipment
JP3446138B2 (en) Substrate masking mechanism and combinatorial film forming apparatus
JPH0382757A (en) Thin film forming device
JPS58204173A (en) Device and method for vapor deposition
JPH02294472A (en) Vacuum deposition device