JPH0375846B2 - - Google Patents

Info

Publication number
JPH0375846B2
JPH0375846B2 JP1087787A JP8778789A JPH0375846B2 JP H0375846 B2 JPH0375846 B2 JP H0375846B2 JP 1087787 A JP1087787 A JP 1087787A JP 8778789 A JP8778789 A JP 8778789A JP H0375846 B2 JPH0375846 B2 JP H0375846B2
Authority
JP
Japan
Prior art keywords
light source
light
optical axis
reflective member
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1087787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01295215A (ja
Inventor
Masato Shibuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP1087787A priority Critical patent/JPH01295215A/ja
Publication of JPH01295215A publication Critical patent/JPH01295215A/ja
Publication of JPH0375846B2 publication Critical patent/JPH0375846B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lenses (AREA)
  • Projection-Type Copiers In General (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP1087787A 1989-04-06 1989-04-06 照明装置 Granted JPH01295215A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1087787A JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1087787A JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58100689A Division JPS59226317A (ja) 1983-06-06 1983-06-06 照明装置

Publications (2)

Publication Number Publication Date
JPH01295215A JPH01295215A (ja) 1989-11-28
JPH0375846B2 true JPH0375846B2 (enrdf_load_stackoverflow) 1991-12-03

Family

ID=13924697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1087787A Granted JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Country Status (1)

Country Link
JP (1) JPH01295215A (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6885433B2 (en) 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
JP3005203B2 (ja) 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
US7948606B2 (en) 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7728954B2 (en) 2006-06-06 2010-06-01 Asml Netherlands B.V. Reflective loop system producing incoherent radiation
US7649676B2 (en) 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3693515A (en) * 1971-04-30 1972-09-26 Vari Typer Corp Optical reflector system
JPS56160040A (en) * 1980-05-14 1981-12-09 Canon Inc Printing device

Also Published As

Publication number Publication date
JPH01295215A (ja) 1989-11-28

Similar Documents

Publication Publication Date Title
JPS59226317A (ja) 照明装置
US4974919A (en) Illuminating device
JP3284045B2 (ja) Ｘ線光学装置およびデバイス製造方法
JP3264224B2 (ja) 照明装置及びそれを用いた投影露光装置
JP2655465B2 (ja) 反射型ホモジナイザーおよび反射型照明光学装置
US7148952B2 (en) Lithographic apparatus and device manufacturing method
JPH0375846B2 (enrdf_load_stackoverflow)
JP3278277B2 (ja) 投影露光装置及びこれを用いたデバイス製造方法
US3650605A (en) Interferometric apparatus with controlled scanning means
JP2017526968A (ja) 投影リソグラフィのための照明光学ユニットのためのファセットミラー
KR20000069918A (ko) 리소그래픽 투사용 3-거울 시스템과, 그와 같은 거울 시스템을포함하는 투사 장치
JP2586662B2 (ja) 投影露光装置
JPS63114186A (ja) 照明装置
JPS63100461A (ja) 照明装置
JPH11150051A (ja) 露光方法及び装置
JPH07113736B2 (ja) 照明装置
JPH01109720A (ja) 照明装置
JP2765162B2 (ja) 照明装置
JPH063616A (ja) ポリゴンスキャナ
JPH0349213A (ja) 露光装置
JPH0624180B2 (ja) 投影露光方法及びその装置
JP2712590B2 (ja) 倒立顕微鏡
JP2788434B2 (ja) 投影露光方法及びその装置
JPH02216406A (ja) 立体形状測定装置及び測定方法
JP3531245B2 (ja) 照明装置及び露光装置