JPH0373101B2 - - Google Patents

Info

Publication number
JPH0373101B2
JPH0373101B2 JP61012105A JP1210586A JPH0373101B2 JP H0373101 B2 JPH0373101 B2 JP H0373101B2 JP 61012105 A JP61012105 A JP 61012105A JP 1210586 A JP1210586 A JP 1210586A JP H0373101 B2 JPH0373101 B2 JP H0373101B2
Authority
JP
Japan
Prior art keywords
ray
electrode
plasma
gas
extraction window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61012105A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62172648A (ja
Inventor
Yasunao Saito
Ikuo Okada
Hideo Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP61012105A priority Critical patent/JPS62172648A/ja
Priority to US06/857,112 priority patent/US4771447A/en
Priority to EP86105914A priority patent/EP0201034B1/en
Priority to DE86105914T priority patent/DE3688946T2/de
Publication of JPS62172648A publication Critical patent/JPS62172648A/ja
Publication of JPH0373101B2 publication Critical patent/JPH0373101B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61012105A 1985-04-30 1986-01-24 Ｘ線発生装置 Granted JPS62172648A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61012105A JPS62172648A (ja) 1986-01-24 1986-01-24 Ｘ線発生装置
US06/857,112 US4771447A (en) 1985-04-30 1986-04-29 X-ray source
EP86105914A EP0201034B1 (en) 1985-04-30 1986-04-29 X-ray source
DE86105914T DE3688946T2 (de) 1985-04-30 1986-04-29 Röntgenstrahlungsquelle.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61012105A JPS62172648A (ja) 1986-01-24 1986-01-24 Ｘ線発生装置

Publications (2)

Publication Number Publication Date
JPS62172648A JPS62172648A (ja) 1987-07-29
JPH0373101B2 true JPH0373101B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-11-20

Family

ID=11796285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61012105A Granted JPS62172648A (ja) 1985-04-30 1986-01-24 Ｘ線発生装置

Country Status (1)

Country Link
JP (1) JPS62172648A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
CN101065999B (zh) * 2004-11-29 2011-04-06 皇家飞利浦电子股份有限公司 用于产生波长范围从大约1nm至大约30nm的辐射并在光刻装置或计量学中使用的方法和设备
DE102004058500A1 (de) * 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
JP4628122B2 (ja) * 2005-02-04 2011-02-09 株式会社小松製作所 極端紫外光源装置用ノズル

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4589123A (en) * 1985-02-27 1986-05-13 Maxwell Laboratories, Inc. System for generating soft X rays

Also Published As

Publication number Publication date
JPS62172648A (ja) 1987-07-29

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term