JPH0370214B2 - - Google Patents
Info
- Publication number
- JPH0370214B2 JPH0370214B2 JP60165293A JP16529385A JPH0370214B2 JP H0370214 B2 JPH0370214 B2 JP H0370214B2 JP 60165293 A JP60165293 A JP 60165293A JP 16529385 A JP16529385 A JP 16529385A JP H0370214 B2 JPH0370214 B2 JP H0370214B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- printing
- plate
- printing plate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16529385A JPS6225750A (ja) | 1985-07-26 | 1985-07-26 | 平凹版用感光性印刷版材 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16529385A JPS6225750A (ja) | 1985-07-26 | 1985-07-26 | 平凹版用感光性印刷版材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6225750A JPS6225750A (ja) | 1987-02-03 |
JPH0370214B2 true JPH0370214B2 (enrdf_load_stackoverflow) | 1991-11-06 |
Family
ID=15809575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16529385A Granted JPS6225750A (ja) | 1985-07-26 | 1985-07-26 | 平凹版用感光性印刷版材 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6225750A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2604770B2 (ja) * | 1987-12-28 | 1997-04-30 | 工業技術院長 | 感光性樹脂組成物 |
JPH0713099B2 (ja) | 1988-12-14 | 1995-02-15 | 工業技術院長 | 感光性ポリビニルアルコール誘導体 |
JPH06102833B2 (ja) * | 1990-04-02 | 1994-12-14 | 新日本製鐵株式会社 | すべり性と密着性に優れた電磁鋼板の電気絶縁皮膜処理方法 |
EP1058154A1 (en) * | 1999-06-04 | 2000-12-06 | Toyo Gosei Kogyo Co., Ltd. | Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57185035A (en) * | 1981-05-11 | 1982-11-15 | Agency Of Ind Science & Technol | Photosensitive resin composition |
-
1985
- 1985-07-26 JP JP16529385A patent/JPS6225750A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6225750A (ja) | 1987-02-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |