JPH0369138B2 - - Google Patents

Info

Publication number
JPH0369138B2
JPH0369138B2 JP59021760A JP2176084A JPH0369138B2 JP H0369138 B2 JPH0369138 B2 JP H0369138B2 JP 59021760 A JP59021760 A JP 59021760A JP 2176084 A JP2176084 A JP 2176084A JP H0369138 B2 JPH0369138 B2 JP H0369138B2
Authority
JP
Japan
Prior art keywords
sample
holding
wafer
support member
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59021760A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60167245A (ja
Inventor
Tadashi Ootaka
Takahiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Science Systems Ltd
Original Assignee
Hitachi Ltd
Hitachi Measurement Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Measurement Engineering Co Ltd filed Critical Hitachi Ltd
Priority to JP59021760A priority Critical patent/JPS60167245A/ja
Publication of JPS60167245A publication Critical patent/JPS60167245A/ja
Publication of JPH0369138B2 publication Critical patent/JPH0369138B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP59021760A 1984-02-10 1984-02-10 試料保持装置 Granted JPS60167245A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59021760A JPS60167245A (ja) 1984-02-10 1984-02-10 試料保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59021760A JPS60167245A (ja) 1984-02-10 1984-02-10 試料保持装置

Publications (2)

Publication Number Publication Date
JPS60167245A JPS60167245A (ja) 1985-08-30
JPH0369138B2 true JPH0369138B2 (enrdf_load_stackoverflow) 1991-10-31

Family

ID=12064019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59021760A Granted JPS60167245A (ja) 1984-02-10 1984-02-10 試料保持装置

Country Status (1)

Country Link
JP (1) JPS60167245A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0749789Y2 (ja) * 1986-11-19 1995-11-13 富士通株式会社 電子ビ−ム露光装置
US4817556A (en) * 1987-05-04 1989-04-04 Varian Associates, Inc. Apparatus for retaining wafers
US6509564B1 (en) 1998-04-20 2003-01-21 Hitachi, Ltd. Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
EP2197027A3 (en) * 2005-05-18 2017-04-26 Murata Manufacturing Co., Ltd. Positioning stage, bump forming apparatus equipped with the positioning stage, and bump forming method performed using the positioning stage
JP6731668B2 (ja) * 2016-08-08 2020-07-29 国立研究開発法人産業技術総合研究所 顕微鏡観察方法及び顕微鏡観察補助装置

Also Published As

Publication number Publication date
JPS60167245A (ja) 1985-08-30

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term