JPH0355551B2 - - Google Patents
Info
- Publication number
- JPH0355551B2 JPH0355551B2 JP15304788A JP15304788A JPH0355551B2 JP H0355551 B2 JPH0355551 B2 JP H0355551B2 JP 15304788 A JP15304788 A JP 15304788A JP 15304788 A JP15304788 A JP 15304788A JP H0355551 B2 JPH0355551 B2 JP H0355551B2
- Authority
- JP
- Japan
- Prior art keywords
- pinholes
- insulating film
- plasma treatment
- film
- density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 23
- 239000010409 thin film Substances 0.000 claims description 14
- 238000009832 plasma treatment Methods 0.000 claims description 12
- 150000002500 ions Chemical class 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002887 superconductor Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15304788A JPH01319678A (ja) | 1988-06-21 | 1988-06-21 | プラズマ処理による膜改質方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15304788A JPH01319678A (ja) | 1988-06-21 | 1988-06-21 | プラズマ処理による膜改質方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01319678A JPH01319678A (ja) | 1989-12-25 |
| JPH0355551B2 true JPH0355551B2 (enExample) | 1991-08-23 |
Family
ID=15553813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15304788A Granted JPH01319678A (ja) | 1988-06-21 | 1988-06-21 | プラズマ処理による膜改質方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01319678A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106947948A (zh) * | 2011-06-17 | 2017-07-14 | 应用材料公司 | 无针孔介电薄膜制造 |
-
1988
- 1988-06-21 JP JP15304788A patent/JPH01319678A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01319678A (ja) | 1989-12-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |