JPH0354189B2 - - Google Patents
Info
- Publication number
- JPH0354189B2 JPH0354189B2 JP61074051A JP7405186A JPH0354189B2 JP H0354189 B2 JPH0354189 B2 JP H0354189B2 JP 61074051 A JP61074051 A JP 61074051A JP 7405186 A JP7405186 A JP 7405186A JP H0354189 B2 JPH0354189 B2 JP H0354189B2
- Authority
- JP
- Japan
- Prior art keywords
- target material
- powder
- container
- ferromagnetic
- replenishment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013077 target material Substances 0.000 claims description 64
- 239000000843 powder Substances 0.000 claims description 43
- 239000003302 ferromagnetic material Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 12
- 238000005242 forging Methods 0.000 claims description 10
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 238000009792 diffusion process Methods 0.000 claims description 7
- 238000001513 hot isostatic pressing Methods 0.000 claims description 7
- 230000005294 ferromagnetic effect Effects 0.000 claims description 6
- 238000004064 recycling Methods 0.000 claims description 3
- 239000000696 magnetic material Substances 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- -1 iron group metals Chemical class 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- 229910017061 Fe Co Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7405186A JPS62230967A (ja) | 1986-03-31 | 1986-03-31 | 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7405186A JPS62230967A (ja) | 1986-03-31 | 1986-03-31 | 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62230967A JPS62230967A (ja) | 1987-10-09 |
| JPH0354189B2 true JPH0354189B2 (fr) | 1991-08-19 |
Family
ID=13535999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7405186A Granted JPS62230967A (ja) | 1986-03-31 | 1986-03-31 | 光磁気記録薄膜の形成に用いられた強磁性材製使用済みターゲットの再生方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62230967A (fr) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7175802B2 (en) | 2001-09-17 | 2007-02-13 | Heraeus, Inc. | Refurbishing spent sputtering targets |
| US20080145688A1 (en) | 2006-12-13 | 2008-06-19 | H.C. Starck Inc. | Method of joining tantalum clade steel structures |
| US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
| US7871563B2 (en) * | 2007-07-17 | 2011-01-18 | Williams Advanced Materials, Inc. | Process for the refurbishing of a sputtering target |
| US8246903B2 (en) | 2008-09-09 | 2012-08-21 | H.C. Starck Inc. | Dynamic dehydriding of refractory metal powders |
| JP4348396B1 (ja) | 2008-12-26 | 2009-10-21 | 田中貴金属工業株式会社 | 再生ターゲットの製造方法 |
| CN102747329A (zh) * | 2011-04-20 | 2012-10-24 | 光洋应用材料科技股份有限公司 | 再生溅镀靶材及其制作方法 |
| JP2013001971A (ja) * | 2011-06-17 | 2013-01-07 | Solar Applied Materials Technology Corp | 再製スパッタリングターゲット及びその製造方法 |
| US9412568B2 (en) | 2011-09-29 | 2016-08-09 | H.C. Starck, Inc. | Large-area sputtering targets |
| JP6532219B2 (ja) * | 2013-11-25 | 2019-06-19 | 株式会社フルヤ金属 | スパッタリングターゲットの再生方法及び再生スパッタリングターゲット |
| CN114477992B (zh) * | 2022-01-18 | 2023-04-28 | 宁波江丰热等静压技术有限公司 | 一种溅射后氧化铟锡靶材的再生方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6043404A (ja) * | 1983-08-16 | 1985-03-08 | Mitsubishi Metal Corp | 超硬合金製リング状部材の再生方法 |
-
1986
- 1986-03-31 JP JP7405186A patent/JPS62230967A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6043404A (ja) * | 1983-08-16 | 1985-03-08 | Mitsubishi Metal Corp | 超硬合金製リング状部材の再生方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62230967A (ja) | 1987-10-09 |
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