JPH035081Y2 - - Google Patents

Info

Publication number
JPH035081Y2
JPH035081Y2 JP1983157082U JP15708283U JPH035081Y2 JP H035081 Y2 JPH035081 Y2 JP H035081Y2 JP 1983157082 U JP1983157082 U JP 1983157082U JP 15708283 U JP15708283 U JP 15708283U JP H035081 Y2 JPH035081 Y2 JP H035081Y2
Authority
JP
Japan
Prior art keywords
electrode
rod
vacuum
shaped electrode
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983157082U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6064559U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15708283U priority Critical patent/JPS6064559U/ja
Publication of JPS6064559U publication Critical patent/JPS6064559U/ja
Application granted granted Critical
Publication of JPH035081Y2 publication Critical patent/JPH035081Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
JP15708283U 1983-10-11 1983-10-11 放電トリガ− Granted JPS6064559U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15708283U JPS6064559U (ja) 1983-10-11 1983-10-11 放電トリガ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15708283U JPS6064559U (ja) 1983-10-11 1983-10-11 放電トリガ−

Publications (2)

Publication Number Publication Date
JPS6064559U JPS6064559U (ja) 1985-05-08
JPH035081Y2 true JPH035081Y2 (enrdf_load_stackoverflow) 1991-02-08

Family

ID=30346430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15708283U Granted JPS6064559U (ja) 1983-10-11 1983-10-11 放電トリガ−

Country Status (1)

Country Link
JP (1) JPS6064559U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112017006830B4 (de) 2017-02-27 2025-02-13 Hitachi Astemo, Ltd. Drucksensor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS539993A (en) * 1976-07-15 1978-01-28 Toshiba Corp Ion producing device
JPS58157083A (ja) * 1982-03-15 1983-09-19 松下電工株式会社 非常灯回路
JPS58157084A (ja) * 1982-03-15 1983-09-19 松下電工株式会社 調光制御回路

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112017006830B4 (de) 2017-02-27 2025-02-13 Hitachi Astemo, Ltd. Drucksensor

Also Published As

Publication number Publication date
JPS6064559U (ja) 1985-05-08

Similar Documents

Publication Publication Date Title
JP2959508B2 (ja) プラズマ発生装置
US5397956A (en) Electron beam excited plasma system
CN109786205B (zh) 电子回旋共振离子源
TWI242396B (en) Plasma processing apparatus
JPS6348952B2 (enrdf_load_stackoverflow)
KR870003557A (ko) 반도체 웨이퍼 면 부식 장치
RU2004120251A (ru) Плазменный ускоритель
GB1113579A (en) Improvements in and relating to the sputtering of substances by means of electric arc discharges
JPH07502862A (ja) イオンビームガン
TWI497555B (zh) Microwave ion source and its starting method
JPH035081Y2 (enrdf_load_stackoverflow)
JP3454384B2 (ja) イオンビーム発生装置及び方法
JPH079335Y2 (ja) 放電トリガ−
JP2603722B2 (ja) 高周波誘導結合プラズマ質量分析装置
US3376455A (en) Ionic vacuum pump having multiple externally mounted magnetic circuits
GB1077518A (en) The generation and acceleration of plasma
JP4677123B2 (ja) 高密度へリコンプラズマを利用した緻密な硬質薄膜の形成装置及び形成方法
JPH0845457A (ja) イオン源装置
JPH0619961B2 (ja) マイクロ波イオン源
JP3167207B2 (ja) イオン加速装置
JPH02132798A (ja) プラズマ発生装置およびそれを用いたイオン源
JPH06251738A (ja) 高周波イオン源
JPS6345732Y2 (enrdf_load_stackoverflow)
JP2801096B2 (ja) イオン源
JP2806641B2 (ja) 高周波誘導結合プラズマ質量分析装置