JPH0350325U - - Google Patents

Info

Publication number
JPH0350325U
JPH0350325U JP11076289U JP11076289U JPH0350325U JP H0350325 U JPH0350325 U JP H0350325U JP 11076289 U JP11076289 U JP 11076289U JP 11076289 U JP11076289 U JP 11076289U JP H0350325 U JPH0350325 U JP H0350325U
Authority
JP
Japan
Prior art keywords
susceptor
wafer
heater
facing
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11076289U
Other languages
English (en)
Other versions
JPH0735383Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11076289U priority Critical patent/JPH0735383Y2/ja
Publication of JPH0350325U publication Critical patent/JPH0350325U/ja
Application granted granted Critical
Publication of JPH0735383Y2 publication Critical patent/JPH0735383Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案の実施例に係る薄膜気相成長装
置の概略縦断面図。第２図は本考案の効果を確認
するため上面ヒータ部と側面ヒータ部を備えた装
置Ａと比較例Ｂとについてウエハ面内での温度分
布を測定した結果を示すグラフ。第３図は高周波
加熱を用いる従来例に係る薄膜気相成長装置の概
略縦断面図。 １……石英リアクタ、２……サセプタ、３……
ウエハ、４……高周波コイル、５……回転シヤフ
ト、６……熱電対、７……ヒータ、８……電極、
９……ウエハトレイ、１０……リフレクター、１
１……冷却水ジヤケツト、１２……ポケツト、１
３……凹部、１４……周段部、１７……冷却水入
口、１８……冷却水出口、１９……上面ヒータ部
、２０……側面ヒータ部。

Claims (1)

    【実用新案登録請求の範囲】
  1. 縦長のリアクタ１とリアクタ１の中に設けられ
    ウエハ３を保持するためのサセプタ２と、サセプ
    タ２を回転可能に支持する回転シヤフト５とを含
    み、サセプタ２の内部に抵抗加熱ヒータ７が設け
    られ、ウエハ３はサセプタ２の上に置かれるよう
    になつており、抵抗加熱ヒータ７はウエハ１に対
    向する上面ヒータ部１９とサセプタ側壁に対向す
    る側面ヒータ部２０とを有する事を特徴とする薄
    膜気相成長装置。
JP11076289U 1989-09-21 1989-09-21 薄膜気相成長装置 Expired - Fee Related JPH0735383Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11076289U JPH0735383Y2 (ja) 1989-09-21 1989-09-21 薄膜気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11076289U JPH0735383Y2 (ja) 1989-09-21 1989-09-21 薄膜気相成長装置

Publications (2)

Publication Number Publication Date
JPH0350325U true JPH0350325U (ja) 1991-05-16
JPH0735383Y2 JPH0735383Y2 (ja) 1995-08-09

Family

ID=31659281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11076289U Expired - Fee Related JPH0735383Y2 (ja) 1989-09-21 1989-09-21 薄膜気相成長装置

Country Status (1)

Country Link
JP (1) JPH0735383Y2 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009061826A (ja) * 2007-09-04 2009-03-26 Yac Co Ltd 給油キャップホルダー
JP2013093460A (ja) * 2011-10-26 2013-05-16 Ulvac Japan Ltd 成膜装置
JP2013131555A (ja) * 2011-12-20 2013-07-04 Stanley Electric Co Ltd 半導体製造装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009061826A (ja) * 2007-09-04 2009-03-26 Yac Co Ltd 給油キャップホルダー
JP2013093460A (ja) * 2011-10-26 2013-05-16 Ulvac Japan Ltd 成膜装置
JP2013131555A (ja) * 2011-12-20 2013-07-04 Stanley Electric Co Ltd 半導体製造装置

Also Published As

Publication number Publication date
JPH0735383Y2 (ja) 1995-08-09

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees