JPH0348650B2 - - Google Patents

Info

Publication number
JPH0348650B2
JPH0348650B2 JP57052108A JP5210882A JPH0348650B2 JP H0348650 B2 JPH0348650 B2 JP H0348650B2 JP 57052108 A JP57052108 A JP 57052108A JP 5210882 A JP5210882 A JP 5210882A JP H0348650 B2 JPH0348650 B2 JP H0348650B2
Authority
JP
Japan
Prior art keywords
pattern
layer
metal
substrate
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57052108A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58169910A (ja
Inventor
Noriaki Nakayama
Yoshimi Yamashita
Sumio Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5210882A priority Critical patent/JPS58169910A/ja
Publication of JPS58169910A publication Critical patent/JPS58169910A/ja
Publication of JPH0348650B2 publication Critical patent/JPH0348650B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
JP5210882A 1982-03-30 1982-03-30 微細パタ−ン形成方法 Granted JPS58169910A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5210882A JPS58169910A (ja) 1982-03-30 1982-03-30 微細パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5210882A JPS58169910A (ja) 1982-03-30 1982-03-30 微細パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS58169910A JPS58169910A (ja) 1983-10-06
JPH0348650B2 true JPH0348650B2 (enrdf_load_stackoverflow) 1991-07-25

Family

ID=12905661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5210882A Granted JPS58169910A (ja) 1982-03-30 1982-03-30 微細パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS58169910A (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5248468A (en) * 1975-10-15 1977-04-18 Nec Home Electronics Ltd Process for production of semiconductor device
JPS5339864A (en) * 1976-09-24 1978-04-12 Nec Corp Production of semiconductor element electrode
JPS58130521A (ja) * 1982-01-29 1983-08-04 Toshiba Corp 金属パタ−ン形成方法
JPS58151023A (ja) * 1982-03-02 1983-09-08 Nippon Telegr & Teleph Corp <Ntt> 多層よりなるレジスト層の形成方法

Also Published As

Publication number Publication date
JPS58169910A (ja) 1983-10-06

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