JPH0348497B2 - - Google Patents

Info

Publication number
JPH0348497B2
JPH0348497B2 JP61003924A JP392486A JPH0348497B2 JP H0348497 B2 JPH0348497 B2 JP H0348497B2 JP 61003924 A JP61003924 A JP 61003924A JP 392486 A JP392486 A JP 392486A JP H0348497 B2 JPH0348497 B2 JP H0348497B2
Authority
JP
Japan
Prior art keywords
light
release layer
weight
shielding
antistatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61003924A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62163054A (ja
Inventor
Noriji Iwai
Shinji Oomura
Tetsuya Maekawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Chemical Co Ltd
Original Assignee
Shinko Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Chemical Co Ltd filed Critical Shinko Chemical Co Ltd
Priority to JP61003924A priority Critical patent/JPS62163054A/ja
Publication of JPS62163054A publication Critical patent/JPS62163054A/ja
Publication of JPH0348497B2 publication Critical patent/JPH0348497B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61003924A 1986-01-11 1986-01-11 帯電防止型遮光性マスキングフイルム Granted JPS62163054A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61003924A JPS62163054A (ja) 1986-01-11 1986-01-11 帯電防止型遮光性マスキングフイルム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61003924A JPS62163054A (ja) 1986-01-11 1986-01-11 帯電防止型遮光性マスキングフイルム

Publications (2)

Publication Number Publication Date
JPS62163054A JPS62163054A (ja) 1987-07-18
JPH0348497B2 true JPH0348497B2 (enrdf_load_stackoverflow) 1991-07-24

Family

ID=11570690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61003924A Granted JPS62163054A (ja) 1986-01-11 1986-01-11 帯電防止型遮光性マスキングフイルム

Country Status (1)

Country Link
JP (1) JPS62163054A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108537A (ja) * 1981-12-22 1983-06-28 Daicel Chem Ind Ltd 遮光性マスキングフイルム
JPH0629970B2 (ja) * 1983-12-08 1994-04-20 株式会社きもと マスク層を有する製版用静電記録材料

Also Published As

Publication number Publication date
JPS62163054A (ja) 1987-07-18

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