JPH0338580B2 - - Google Patents

Info

Publication number
JPH0338580B2
JPH0338580B2 JP59232682A JP23268284A JPH0338580B2 JP H0338580 B2 JPH0338580 B2 JP H0338580B2 JP 59232682 A JP59232682 A JP 59232682A JP 23268284 A JP23268284 A JP 23268284A JP H0338580 B2 JPH0338580 B2 JP H0338580B2
Authority
JP
Japan
Prior art keywords
light
shielding
release layer
weight
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59232682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61110141A (ja
Inventor
Yoshiaki Murakami
Noriji Iwai
Shinji Oomura
Joichi Kasamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Chemical Co Ltd
Original Assignee
Shinko Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Chemical Co Ltd filed Critical Shinko Chemical Co Ltd
Priority to JP59232682A priority Critical patent/JPS61110141A/ja
Publication of JPS61110141A publication Critical patent/JPS61110141A/ja
Publication of JPH0338580B2 publication Critical patent/JPH0338580B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59232682A 1984-11-05 1984-11-05 遮光性マスキングフイルム Granted JPS61110141A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59232682A JPS61110141A (ja) 1984-11-05 1984-11-05 遮光性マスキングフイルム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59232682A JPS61110141A (ja) 1984-11-05 1984-11-05 遮光性マスキングフイルム

Publications (2)

Publication Number Publication Date
JPS61110141A JPS61110141A (ja) 1986-05-28
JPH0338580B2 true JPH0338580B2 (enrdf_load_stackoverflow) 1991-06-11

Family

ID=16943138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59232682A Granted JPS61110141A (ja) 1984-11-05 1984-11-05 遮光性マスキングフイルム

Country Status (1)

Country Link
JP (1) JPS61110141A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07104593B2 (ja) * 1986-12-25 1995-11-13 尾池工業株式会社 遮光性マスキングフイルム
JPH07120035B2 (ja) * 1987-07-31 1995-12-20 ソマ−ル株式会社 遮光性マスキングフイルム
JPH07111577B2 (ja) * 1988-02-16 1995-11-29 ソマール株式会社 マスキングフィルム
JPH0769602B2 (ja) * 1988-04-19 1995-07-31 ソマール株式会社 遮光性マスキングフィルム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846011A (ja) * 1981-09-14 1983-03-17 Kao Corp 毛髪処理剤

Also Published As

Publication number Publication date
JPS61110141A (ja) 1986-05-28

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