JPH0340360B2 - - Google Patents

Info

Publication number
JPH0340360B2
JPH0340360B2 JP55073801A JP7380180A JPH0340360B2 JP H0340360 B2 JPH0340360 B2 JP H0340360B2 JP 55073801 A JP55073801 A JP 55073801A JP 7380180 A JP7380180 A JP 7380180A JP H0340360 B2 JPH0340360 B2 JP H0340360B2
Authority
JP
Japan
Prior art keywords
gap
scanning
charged particle
electromagnet
deflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55073801A
Other languages
English (en)
Japanese (ja)
Other versions
JPS561399A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS561399A publication Critical patent/JPS561399A/ja
Publication of JPH0340360B2 publication Critical patent/JPH0340360B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Particle Accelerators (AREA)
JP7380180A 1979-06-04 1980-06-03 Mono electromagnet device for double deflection scanning of charged particle beam Granted JPS561399A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4503579A 1979-06-04 1979-06-04

Publications (2)

Publication Number Publication Date
JPS561399A JPS561399A (en) 1981-01-09
JPH0340360B2 true JPH0340360B2 (enrdf_load_stackoverflow) 1991-06-18

Family

ID=21935663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7380180A Granted JPS561399A (en) 1979-06-04 1980-06-03 Mono electromagnet device for double deflection scanning of charged particle beam

Country Status (4)

Country Link
JP (1) JPS561399A (enrdf_load_stackoverflow)
CH (1) CH649652A5 (enrdf_load_stackoverflow)
DE (1) DE3020281C2 (enrdf_load_stackoverflow)
GB (1) GB2052146B (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4276477A (en) * 1979-09-17 1981-06-30 Varian Associates, Inc. Focusing apparatus for uniform application of charged particle beam
JPS57182864U (enrdf_load_stackoverflow) * 1981-05-18 1982-11-19
JPS58190000U (ja) * 1982-06-14 1983-12-16 日新ハイボルテ−ジ株式会社 荷電粒子偏向装置
DE3513546A1 (de) * 1985-04-16 1986-10-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren und anordnung zum ablenken eines elektronenstrahls
US5461235A (en) * 1991-06-21 1995-10-24 Cottrell; John S. Mass spectrometry apparatus and method relating thereto
AU2002239682A1 (en) * 2000-12-28 2002-07-16 Proteros, Llc Ion beam collimating system
DE102011009488A1 (de) * 2011-01-26 2012-07-26 Global Beam Technologies Ag Elektronenstrahlanlage zur schichtweisen Herstellung oder Bearbeitung eines Bauteils

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB832500A (en) * 1955-12-12 1960-04-13 Ass Elect Ind Improvements relating to electron optical apparatus
US3569757A (en) * 1968-10-04 1971-03-09 Houghes Aircraft Co Acceleration system for implanting ions in specimen
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation
US3983402A (en) * 1975-12-22 1976-09-28 International Business Machines Corporation Ion implantation apparatus
JPS52106267A (en) * 1976-03-03 1977-09-06 Hitachi Ltd Electronic line deflection unit
US4117339A (en) * 1977-07-01 1978-09-26 Burroughs Corporation Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices

Also Published As

Publication number Publication date
GB2052146A (en) 1981-01-21
JPS561399A (en) 1981-01-09
CH649652A5 (de) 1985-05-31
DE3020281A1 (de) 1980-12-11
GB2052146B (en) 1983-06-22
DE3020281C2 (de) 1993-10-07

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