CH649652A5 - Bestrahlungsvorrichtung mit doppelablenkung eines partikelstrahls. - Google Patents
Bestrahlungsvorrichtung mit doppelablenkung eines partikelstrahls. Download PDFInfo
- Publication number
- CH649652A5 CH649652A5 CH432680A CH432680A CH649652A5 CH 649652 A5 CH649652 A5 CH 649652A5 CH 432680 A CH432680 A CH 432680A CH 432680 A CH432680 A CH 432680A CH 649652 A5 CH649652 A5 CH 649652A5
- Authority
- CH
- Switzerland
- Prior art keywords
- plane
- gap
- deflection
- target
- electromagnet
- Prior art date
Links
- 239000002245 particle Substances 0.000 title claims description 13
- 230000005855 radiation Effects 0.000 title 1
- 150000002500 ions Chemical class 0.000 claims description 13
- 235000012431 wafers Nutrition 0.000 claims description 13
- 230000005284 excitation Effects 0.000 claims description 5
- 238000004804 winding Methods 0.000 claims description 4
- 230000007935 neutral effect Effects 0.000 claims description 3
- 230000005686 electrostatic field Effects 0.000 claims 2
- 238000010884 ion-beam technique Methods 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
- G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Physical Vapour Deposition (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4503579A | 1979-06-04 | 1979-06-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH649652A5 true CH649652A5 (de) | 1985-05-31 |
Family
ID=21935663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH432680A CH649652A5 (de) | 1979-06-04 | 1980-06-04 | Bestrahlungsvorrichtung mit doppelablenkung eines partikelstrahls. |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS561399A (enrdf_load_stackoverflow) |
| CH (1) | CH649652A5 (enrdf_load_stackoverflow) |
| DE (1) | DE3020281C2 (enrdf_load_stackoverflow) |
| GB (1) | GB2052146B (enrdf_load_stackoverflow) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4276477A (en) * | 1979-09-17 | 1981-06-30 | Varian Associates, Inc. | Focusing apparatus for uniform application of charged particle beam |
| JPS57182864U (enrdf_load_stackoverflow) * | 1981-05-18 | 1982-11-19 | ||
| JPS58190000U (ja) * | 1982-06-14 | 1983-12-16 | 日新ハイボルテ−ジ株式会社 | 荷電粒子偏向装置 |
| DE3513546A1 (de) * | 1985-04-16 | 1986-10-16 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und anordnung zum ablenken eines elektronenstrahls |
| US5461235A (en) * | 1991-06-21 | 1995-10-24 | Cottrell; John S. | Mass spectrometry apparatus and method relating thereto |
| AU2002239682A1 (en) * | 2000-12-28 | 2002-07-16 | Proteros, Llc | Ion beam collimating system |
| DE102011009488A1 (de) * | 2011-01-26 | 2012-07-26 | Global Beam Technologies Ag | Elektronenstrahlanlage zur schichtweisen Herstellung oder Bearbeitung eines Bauteils |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB832500A (en) * | 1955-12-12 | 1960-04-13 | Ass Elect Ind | Improvements relating to electron optical apparatus |
| US3569757A (en) * | 1968-10-04 | 1971-03-09 | Houghes Aircraft Co | Acceleration system for implanting ions in specimen |
| US3778626A (en) * | 1972-07-28 | 1973-12-11 | Western Electric Co | Mechanical scan system for ion implantation |
| US3983402A (en) * | 1975-12-22 | 1976-09-28 | International Business Machines Corporation | Ion implantation apparatus |
| JPS52106267A (en) * | 1976-03-03 | 1977-09-06 | Hitachi Ltd | Electronic line deflection unit |
| US4117339A (en) * | 1977-07-01 | 1978-09-26 | Burroughs Corporation | Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices |
-
1980
- 1980-05-20 GB GB8016659A patent/GB2052146B/en not_active Expired
- 1980-05-28 DE DE19803020281 patent/DE3020281C2/de not_active Expired - Lifetime
- 1980-06-03 JP JP7380180A patent/JPS561399A/ja active Granted
- 1980-06-04 CH CH432680A patent/CH649652A5/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB2052146A (en) | 1981-01-21 |
| JPH0340360B2 (enrdf_load_stackoverflow) | 1991-06-18 |
| JPS561399A (en) | 1981-01-09 |
| DE3020281A1 (de) | 1980-12-11 |
| GB2052146B (en) | 1983-06-22 |
| DE3020281C2 (de) | 1993-10-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |