JPS561399A - Mono electromagnet device for double deflection scanning of charged particle beam - Google Patents

Mono electromagnet device for double deflection scanning of charged particle beam

Info

Publication number
JPS561399A
JPS561399A JP7380180A JP7380180A JPS561399A JP S561399 A JPS561399 A JP S561399A JP 7380180 A JP7380180 A JP 7380180A JP 7380180 A JP7380180 A JP 7380180A JP S561399 A JPS561399 A JP S561399A
Authority
JP
Japan
Prior art keywords
mono
charged particle
particle beam
electromagnet device
deflection scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7380180A
Other languages
Japanese (ja)
Other versions
JPH0340360B2 (en
Inventor
Ronarudo Hanrei Piitaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Medical Systems Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Publication of JPS561399A publication Critical patent/JPS561399A/en
Publication of JPH0340360B2 publication Critical patent/JPH0340360B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Particle Accelerators (AREA)
JP7380180A 1979-06-04 1980-06-03 Mono electromagnet device for double deflection scanning of charged particle beam Granted JPS561399A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4503579A 1979-06-04 1979-06-04

Publications (2)

Publication Number Publication Date
JPS561399A true JPS561399A (en) 1981-01-09
JPH0340360B2 JPH0340360B2 (en) 1991-06-18

Family

ID=21935663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7380180A Granted JPS561399A (en) 1979-06-04 1980-06-03 Mono electromagnet device for double deflection scanning of charged particle beam

Country Status (4)

Country Link
JP (1) JPS561399A (en)
CH (1) CH649652A5 (en)
DE (1) DE3020281C2 (en)
GB (1) GB2052146B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190000U (en) * 1982-06-14 1983-12-16 日新ハイボルテ−ジ株式会社 charged particle deflector

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4276477A (en) * 1979-09-17 1981-06-30 Varian Associates, Inc. Focusing apparatus for uniform application of charged particle beam
JPS57182864U (en) * 1981-05-18 1982-11-19
DE3513546A1 (en) * 1985-04-16 1986-10-16 Leybold-Heraeus GmbH, 5000 Köln Method and arrangement for deflecting an electron beam
US5461235A (en) * 1991-06-21 1995-10-24 Cottrell; John S. Mass spectrometry apparatus and method relating thereto
AU2002239682A1 (en) * 2000-12-28 2002-07-16 Proteros, Llc Ion beam collimating system
DE102011009488A1 (en) * 2011-01-26 2012-07-26 Global Beam Technologies Ag Electron-beam system for processing of component e.g. turbine blade, has beam director that directs deflected electron beam to construction material layer surface at preset incident angle

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106267A (en) * 1976-03-03 1977-09-06 Hitachi Ltd Electronic line deflection unit

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB832500A (en) * 1955-12-12 1960-04-13 Ass Elect Ind Improvements relating to electron optical apparatus
US3569757A (en) * 1968-10-04 1971-03-09 Houghes Aircraft Co Acceleration system for implanting ions in specimen
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation
US3983402A (en) * 1975-12-22 1976-09-28 International Business Machines Corporation Ion implantation apparatus
US4117339A (en) * 1977-07-01 1978-09-26 Burroughs Corporation Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106267A (en) * 1976-03-03 1977-09-06 Hitachi Ltd Electronic line deflection unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190000U (en) * 1982-06-14 1983-12-16 日新ハイボルテ−ジ株式会社 charged particle deflector

Also Published As

Publication number Publication date
GB2052146A (en) 1981-01-21
JPH0340360B2 (en) 1991-06-18
DE3020281C2 (en) 1993-10-07
GB2052146B (en) 1983-06-22
CH649652A5 (en) 1985-05-31
DE3020281A1 (en) 1980-12-11

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