AU2002239682A1 - Ion beam collimating system - Google Patents

Ion beam collimating system

Info

Publication number
AU2002239682A1
AU2002239682A1 AU2002239682A AU2002239682A AU2002239682A1 AU 2002239682 A1 AU2002239682 A1 AU 2002239682A1 AU 2002239682 A AU2002239682 A AU 2002239682A AU 2002239682 A AU2002239682 A AU 2002239682A AU 2002239682 A1 AU2002239682 A1 AU 2002239682A1
Authority
AU
Australia
Prior art keywords
ion beam
collimating system
beam collimating
ion
collimating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002239682A
Inventor
Harald Enge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proteros LLC
Original Assignee
Proteros LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Proteros LLC filed Critical Proteros LLC
Publication of AU2002239682A1 publication Critical patent/AU2002239682A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
AU2002239682A 2000-12-28 2001-12-28 Ion beam collimating system Abandoned AU2002239682A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25884400P 2000-12-28 2000-12-28
US60/258,844 2000-12-28
PCT/US2001/049866 WO2002054442A2 (en) 2000-12-28 2001-12-28 Ion beam collimating system

Publications (1)

Publication Number Publication Date
AU2002239682A1 true AU2002239682A1 (en) 2002-07-16

Family

ID=22982357

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002239682A Abandoned AU2002239682A1 (en) 2000-12-28 2001-12-28 Ion beam collimating system

Country Status (2)

Country Link
AU (1) AU2002239682A1 (en)
WO (1) WO2002054442A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7019314B1 (en) * 2004-10-18 2006-03-28 Axcelis Technologies, Inc. Systems and methods for ion beam focusing
CN103779161B (en) * 2012-11-08 2016-01-13 北京中科信电子装备有限公司 Broadband beam scanning method for uniform ion implantation

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2052146B (en) * 1979-06-04 1983-06-22 Varian Associates Unitary electromagnet for double deflection scanning of charged particle beam
US4578663A (en) * 1984-11-29 1986-03-25 Lockheed Missiles & Space Company, Inc. Magnetic assembly
US5311028A (en) * 1990-08-29 1994-05-10 Nissin Electric Co., Ltd. System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions
US5132544A (en) * 1990-08-29 1992-07-21 Nissin Electric Company Ltd. System for irradiating a surface with atomic and molecular ions using two dimensional magnetic scanning
JPH08212965A (en) * 1995-01-31 1996-08-20 Ulvac Japan Ltd Ion implanting device
US6060715A (en) * 1997-10-31 2000-05-09 Applied Materials, Inc. Method and apparatus for ion beam scanning in an ion implanter

Also Published As

Publication number Publication date
WO2002054442A3 (en) 2003-01-30
WO2002054442A2 (en) 2002-07-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase