GB2052146B - Unitary electromagnet for double deflection scanning of charged particle beam - Google Patents
Unitary electromagnet for double deflection scanning of charged particle beamInfo
- Publication number
- GB2052146B GB2052146B GB8016659A GB8016659A GB2052146B GB 2052146 B GB2052146 B GB 2052146B GB 8016659 A GB8016659 A GB 8016659A GB 8016659 A GB8016659 A GB 8016659A GB 2052146 B GB2052146 B GB 2052146B
- Authority
- GB
- United Kingdom
- Prior art keywords
- charged particle
- particle beam
- deflection scanning
- double deflection
- electromagnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002245 particle Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
- G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4503579A | 1979-06-04 | 1979-06-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2052146A GB2052146A (en) | 1981-01-21 |
GB2052146B true GB2052146B (en) | 1983-06-22 |
Family
ID=21935663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8016659A Expired GB2052146B (en) | 1979-06-04 | 1980-05-20 | Unitary electromagnet for double deflection scanning of charged particle beam |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS561399A (en) |
CH (1) | CH649652A5 (en) |
DE (1) | DE3020281C2 (en) |
GB (1) | GB2052146B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4276477A (en) * | 1979-09-17 | 1981-06-30 | Varian Associates, Inc. | Focusing apparatus for uniform application of charged particle beam |
JPS57182864U (en) * | 1981-05-18 | 1982-11-19 | ||
JPS58190000U (en) * | 1982-06-14 | 1983-12-16 | 日新ハイボルテ−ジ株式会社 | charged particle deflector |
DE3513546A1 (en) * | 1985-04-16 | 1986-10-16 | Leybold-Heraeus GmbH, 5000 Köln | Method and arrangement for deflecting an electron beam |
US5461235A (en) * | 1991-06-21 | 1995-10-24 | Cottrell; John S. | Mass spectrometry apparatus and method relating thereto |
AU2002239682A1 (en) * | 2000-12-28 | 2002-07-16 | Proteros, Llc | Ion beam collimating system |
DE102011009488A1 (en) * | 2011-01-26 | 2012-07-26 | Global Beam Technologies Ag | Electron-beam system for processing of component e.g. turbine blade, has beam director that directs deflected electron beam to construction material layer surface at preset incident angle |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB832500A (en) * | 1955-12-12 | 1960-04-13 | Ass Elect Ind | Improvements relating to electron optical apparatus |
US3569757A (en) * | 1968-10-04 | 1971-03-09 | Houghes Aircraft Co | Acceleration system for implanting ions in specimen |
US3778626A (en) * | 1972-07-28 | 1973-12-11 | Western Electric Co | Mechanical scan system for ion implantation |
US3983402A (en) * | 1975-12-22 | 1976-09-28 | International Business Machines Corporation | Ion implantation apparatus |
JPS52106267A (en) * | 1976-03-03 | 1977-09-06 | Hitachi Ltd | Electronic line deflection unit |
US4117339A (en) * | 1977-07-01 | 1978-09-26 | Burroughs Corporation | Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices |
-
1980
- 1980-05-20 GB GB8016659A patent/GB2052146B/en not_active Expired
- 1980-05-28 DE DE19803020281 patent/DE3020281C2/en not_active Expired - Lifetime
- 1980-06-03 JP JP7380180A patent/JPS561399A/en active Granted
- 1980-06-04 CH CH432680A patent/CH649652A5/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPS561399A (en) | 1981-01-09 |
DE3020281C2 (en) | 1993-10-07 |
DE3020281A1 (en) | 1980-12-11 |
JPH0340360B2 (en) | 1991-06-18 |
GB2052146A (en) | 1981-01-21 |
CH649652A5 (en) | 1985-05-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Effective date: 20000519 |