JPH0336418B2 - - Google Patents

Info

Publication number
JPH0336418B2
JPH0336418B2 JP58230328A JP23032883A JPH0336418B2 JP H0336418 B2 JPH0336418 B2 JP H0336418B2 JP 58230328 A JP58230328 A JP 58230328A JP 23032883 A JP23032883 A JP 23032883A JP H0336418 B2 JPH0336418 B2 JP H0336418B2
Authority
JP
Japan
Prior art keywords
naphthoquinonediazide
hexahydroxy
sulfonic acid
composition
diphenylmethane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58230328A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60121445A (ja
Inventor
Yukihiro Hosaka
Takao Miura
Yoshuki Harita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP23032883A priority Critical patent/JPS60121445A/ja
Publication of JPS60121445A publication Critical patent/JPS60121445A/ja
Publication of JPH0336418B2 publication Critical patent/JPH0336418B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP23032883A 1983-12-06 1983-12-06 集積回路作製用ポジ型感光性樹脂組成物 Granted JPS60121445A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23032883A JPS60121445A (ja) 1983-12-06 1983-12-06 集積回路作製用ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23032883A JPS60121445A (ja) 1983-12-06 1983-12-06 集積回路作製用ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60121445A JPS60121445A (ja) 1985-06-28
JPH0336418B2 true JPH0336418B2 (en, 2012) 1991-05-31

Family

ID=16906108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23032883A Granted JPS60121445A (ja) 1983-12-06 1983-12-06 集積回路作製用ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60121445A (en, 2012)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
US4737437A (en) * 1986-03-27 1988-04-12 East Shore Chemical Co. Light sensitive diazo compound, composition and method of making the composition
JPS62280843A (ja) * 1986-05-30 1987-12-05 Nec Corp 感光剤
JPH0820730B2 (ja) * 1986-10-30 1996-03-04 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
DE3724791A1 (de) * 1987-07-27 1989-02-09 Merck Patent Gmbh Positiv-fotoresist-zusammensetzungen
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5290656A (en) * 1988-05-07 1994-03-01 Sumitomo Chemical Company, Limited Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
JP2706978B2 (ja) * 1988-05-07 1998-01-28 住友化学工業株式会社 ポジ型レジスト組成物
JP2552900B2 (ja) * 1988-06-07 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2636348B2 (ja) * 1988-07-20 1997-07-30 住友化学工業株式会社 ポジ型レジスト用組成物
EP0354503A3 (en) * 1988-08-09 1992-05-13 Konica Corporation Light-sensitive silver halide photographic material
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
JPH02245754A (ja) * 1989-03-17 1990-10-01 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5431712B2 (en, 2012) * 1972-07-11 1979-10-09
JPS53494B2 (en, 2012) * 1972-09-08 1978-01-09
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters

Also Published As

Publication number Publication date
JPS60121445A (ja) 1985-06-28

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