JPH045378B2 - - Google Patents

Info

Publication number
JPH045378B2
JPH045378B2 JP59002521A JP252184A JPH045378B2 JP H045378 B2 JPH045378 B2 JP H045378B2 JP 59002521 A JP59002521 A JP 59002521A JP 252184 A JP252184 A JP 252184A JP H045378 B2 JPH045378 B2 JP H045378B2
Authority
JP
Japan
Prior art keywords
group
weight
ethylene glycol
parts
trihydroxybenzoate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59002521A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60146234A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59002521A priority Critical patent/JPS60146234A/ja
Priority to EP85300184A priority patent/EP0148787A3/en
Publication of JPS60146234A publication Critical patent/JPS60146234A/ja
Publication of JPH045378B2 publication Critical patent/JPH045378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59002521A 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物 Granted JPS60146234A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59002521A JPS60146234A (ja) 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物
EP85300184A EP0148787A3 (en) 1984-01-10 1985-01-10 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59002521A JPS60146234A (ja) 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60146234A JPS60146234A (ja) 1985-08-01
JPH045378B2 true JPH045378B2 (en, 2012) 1992-01-31

Family

ID=11531676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59002521A Granted JPS60146234A (ja) 1984-01-10 1984-01-10 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60146234A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654381B2 (ja) * 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
JPH0820730B2 (ja) * 1986-10-30 1996-03-04 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
KR0164962B1 (ko) * 1995-10-14 1999-01-15 김흥기 포지티브형 포토레지스트 조성물

Also Published As

Publication number Publication date
JPS60146234A (ja) 1985-08-01

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