JPH0336419B2 - - Google Patents

Info

Publication number
JPH0336419B2
JPH0336419B2 JP58243583A JP24358383A JPH0336419B2 JP H0336419 B2 JPH0336419 B2 JP H0336419B2 JP 58243583 A JP58243583 A JP 58243583A JP 24358383 A JP24358383 A JP 24358383A JP H0336419 B2 JPH0336419 B2 JP H0336419B2
Authority
JP
Japan
Prior art keywords
group
benzene
naphthoquinonediazide
bis
trihydroxybenzoyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58243583A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60134235A (ja
Inventor
Yukihiro Hosaka
Takao Miura
Yoshuki Harita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP24358383A priority Critical patent/JPS60134235A/ja
Publication of JPS60134235A publication Critical patent/JPS60134235A/ja
Publication of JPH0336419B2 publication Critical patent/JPH0336419B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP24358383A 1983-12-23 1983-12-23 ポジ型感光性樹脂組成物 Granted JPS60134235A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24358383A JPS60134235A (ja) 1983-12-23 1983-12-23 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24358383A JPS60134235A (ja) 1983-12-23 1983-12-23 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60134235A JPS60134235A (ja) 1985-07-17
JPH0336419B2 true JPH0336419B2 (en, 2012) 1991-05-31

Family

ID=17105973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24358383A Granted JPS60134235A (ja) 1983-12-23 1983-12-23 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60134235A (en, 2012)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5139023A (en) * 1974-09-27 1976-04-01 Konishiroku Photo Ind Kankoseisoseibutsu
DE3100856A1 (de) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Also Published As

Publication number Publication date
JPS60134235A (ja) 1985-07-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term