JPH0334750Y2 - - Google Patents
Info
- Publication number
- JPH0334750Y2 JPH0334750Y2 JP1986052919U JP5291986U JPH0334750Y2 JP H0334750 Y2 JPH0334750 Y2 JP H0334750Y2 JP 1986052919 U JP1986052919 U JP 1986052919U JP 5291986 U JP5291986 U JP 5291986U JP H0334750 Y2 JPH0334750 Y2 JP H0334750Y2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- cleaning liquid
- arm
- support shaft
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 82
- 239000007788 liquid Substances 0.000 claims description 63
- 238000002347 injection Methods 0.000 claims description 12
- 239000007924 injection Substances 0.000 claims description 12
- 238000001035 drying Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986052919U JPH0334750Y2 (zh) | 1986-04-09 | 1986-04-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986052919U JPH0334750Y2 (zh) | 1986-04-09 | 1986-04-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62164347U JPS62164347U (zh) | 1987-10-19 |
| JPH0334750Y2 true JPH0334750Y2 (zh) | 1991-07-23 |
Family
ID=30878511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986052919U Expired JPH0334750Y2 (zh) | 1986-04-09 | 1986-04-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0334750Y2 (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5005571B2 (ja) * | 2008-02-14 | 2012-08-22 | 東京エレクトロン株式会社 | 液処理装置 |
| JP5467583B2 (ja) * | 2011-02-17 | 2014-04-09 | 東京エレクトロン株式会社 | 基板洗浄装置 |
| JP2016111302A (ja) * | 2014-12-10 | 2016-06-20 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
-
1986
- 1986-04-09 JP JP1986052919U patent/JPH0334750Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62164347U (zh) | 1987-10-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR900001231B1 (ko) | 기판의 회전 건조 장치 | |
| KR970077082A (ko) | 기판처리장치 및 처리방법 | |
| JPS6064436A (ja) | スピンドライヤ | |
| JP2004146784A (ja) | 基板処理装置および基板処理方法 | |
| JP2004156500A (ja) | フィルタ洗浄装置 | |
| JPS62150828A (ja) | ウエハ乾燥装置 | |
| JPH0334750Y2 (zh) | ||
| JP3396377B2 (ja) | 基板処理装置 | |
| TWI243420B (en) | Semiconductor wafer cleaning method and apparatus | |
| JP6045840B2 (ja) | 基板処理装置 | |
| JP2003163147A (ja) | 基板液処理装置 | |
| JP2957383B2 (ja) | 回転式塗布装置 | |
| JP3946026B2 (ja) | スピン処理装置 | |
| JP4358410B2 (ja) | スピン処理装置 | |
| WO2020034480A1 (zh) | 服装污点清洗装置及其洗涤面积调节结构 | |
| JPS5850742A (ja) | ウエ−ハ洗浄乾燥装置 | |
| JPH0346710Y2 (zh) | ||
| JPH11195635A (ja) | 半導体ウエハーの洗浄・乾燥装置 | |
| JPS6142919A (ja) | 基板処理機のためのラビリンスシール | |
| JPH0425706Y2 (zh) | ||
| JPH08162435A (ja) | スピン洗浄乾燥装置 | |
| JP3338544B2 (ja) | 乾燥方法及び乾燥装置 | |
| JPH0352150Y2 (zh) | ||
| JPS646080Y2 (zh) | ||
| JP4217095B2 (ja) | 基板洗浄処理装置 |