JPH0334675B2 - - Google Patents
Info
- Publication number
- JPH0334675B2 JPH0334675B2 JP56115923A JP11592381A JPH0334675B2 JP H0334675 B2 JPH0334675 B2 JP H0334675B2 JP 56115923 A JP56115923 A JP 56115923A JP 11592381 A JP11592381 A JP 11592381A JP H0334675 B2 JPH0334675 B2 JP H0334675B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- superconducting layer
- forming
- thin film
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Drying Of Semiconductors (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56115923A JPS5817689A (ja) | 1981-07-24 | 1981-07-24 | ジヨセフソン回路の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56115923A JPS5817689A (ja) | 1981-07-24 | 1981-07-24 | ジヨセフソン回路の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5817689A JPS5817689A (ja) | 1983-02-01 |
JPH0334675B2 true JPH0334675B2 (en, 2012) | 1991-05-23 |
Family
ID=14674542
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56115923A Granted JPS5817689A (ja) | 1981-07-24 | 1981-07-24 | ジヨセフソン回路の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5817689A (en, 2012) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61263181A (ja) * | 1985-05-17 | 1986-11-21 | Agency Of Ind Science & Technol | 超電導線路の形成方法 |
JPS61271880A (ja) * | 1985-05-27 | 1986-12-02 | Agency Of Ind Science & Technol | 超電導線路の形成方法 |
US4790696A (en) * | 1987-12-03 | 1988-12-13 | The Stanley Works | Chuck key mounting and ejector arrangement |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54158870A (en) * | 1978-06-06 | 1979-12-15 | Matsushita Electric Ind Co Ltd | Etching method |
JPS5658247A (en) * | 1979-10-17 | 1981-05-21 | Fujitsu Ltd | Production of semiconductor device |
-
1981
- 1981-07-24 JP JP56115923A patent/JPS5817689A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5817689A (ja) | 1983-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5828736B2 (ja) | 平坦な薄膜の形成方法 | |
JPH0334675B2 (en, 2012) | ||
JP3055176B2 (ja) | 絶縁層上にメタライゼーション層を設け同一マスクを使用して貫通孔を開ける方法 | |
JPS6146081A (ja) | ジヨセフソン接合素子の製造方法 | |
JP3130726B2 (ja) | 半導体装置及びその製造方法 | |
JP2808674B2 (ja) | 半導体装置の製造方法 | |
JPS6379347A (ja) | 半導体装置の製造方法 | |
JPS6239823B2 (en, 2012) | ||
JPH0570301B2 (en, 2012) | ||
JP2991388B2 (ja) | 半導体装置の製造方法 | |
JPH08511659A (ja) | 半導体本体表面に多層配線構造が設けられた半導体装置の製造方法 | |
JPH0358433A (ja) | 電界効果トランジスタの製造方法 | |
JPS62136857A (ja) | 半導体装置の製造方法 | |
JPH0786209A (ja) | 半導体装置の製造方法 | |
JPH0427703B2 (en, 2012) | ||
JPS5841775B2 (ja) | ハンドウタイソウチノセイゾウホウホウ | |
JPH04307737A (ja) | 半導体装置の製造方法 | |
JPS5815253A (ja) | 半導体装置の電極製造方法 | |
JPS6130418B2 (en, 2012) | ||
JPH0513396B2 (en, 2012) | ||
JPS6262469B2 (en, 2012) | ||
JPH05326504A (ja) | 半導体装置の製造方法 | |
JPH0364933A (ja) | 半導体装置の製造方法 | |
JPS61193451A (ja) | 半導体装置の製造方法 | |
JPH05251441A (ja) | 半導体集積回路装置の製造方法 |