JPH033373B2 - - Google Patents

Info

Publication number
JPH033373B2
JPH033373B2 JP60232984A JP23298485A JPH033373B2 JP H033373 B2 JPH033373 B2 JP H033373B2 JP 60232984 A JP60232984 A JP 60232984A JP 23298485 A JP23298485 A JP 23298485A JP H033373 B2 JPH033373 B2 JP H033373B2
Authority
JP
Japan
Prior art keywords
pattern
original mask
transfer plate
mask
alignment mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60232984A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6292439A (ja
Inventor
Kunihiko Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60232984A priority Critical patent/JPS6292439A/ja
Publication of JPS6292439A publication Critical patent/JPS6292439A/ja
Publication of JPH033373B2 publication Critical patent/JPH033373B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60232984A 1985-10-18 1985-10-18 パタ−ン形成方法 Granted JPS6292439A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60232984A JPS6292439A (ja) 1985-10-18 1985-10-18 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60232984A JPS6292439A (ja) 1985-10-18 1985-10-18 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6292439A JPS6292439A (ja) 1987-04-27
JPH033373B2 true JPH033373B2 (Direct) 1991-01-18

Family

ID=16947969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60232984A Granted JPS6292439A (ja) 1985-10-18 1985-10-18 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6292439A (Direct)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3027990B2 (ja) * 1991-03-18 2000-04-04 富士通株式会社 半導体装置の製造方法
JP4976210B2 (ja) * 2007-06-20 2012-07-18 三菱電機株式会社 露光方法およびイメージセンサの製造方法

Also Published As

Publication number Publication date
JPS6292439A (ja) 1987-04-27

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