JPH03265104A - Soft magnetic alloy film - Google Patents
Soft magnetic alloy filmInfo
- Publication number
- JPH03265104A JPH03265104A JP2063808A JP6380890A JPH03265104A JP H03265104 A JPH03265104 A JP H03265104A JP 2063808 A JP2063808 A JP 2063808A JP 6380890 A JP6380890 A JP 6380890A JP H03265104 A JPH03265104 A JP H03265104A
- Authority
- JP
- Japan
- Prior art keywords
- soft magnetic
- crystal grains
- flux density
- alloy film
- carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims description 13
- 239000013078 crystal Substances 0.000 claims abstract description 31
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 6
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 6
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 5
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 5
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 230000005291 magnetic effect Effects 0.000 abstract description 58
- 230000004907 flux Effects 0.000 abstract description 19
- 238000010438 heat treatment Methods 0.000 abstract description 10
- 230000035699 permeability Effects 0.000 abstract description 6
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- 239000010408 film Substances 0.000 description 30
- 238000004544 sputter deposition Methods 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000003466 welding Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000013081 microcrystal Substances 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- 230000005389 magnetism Effects 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910017112 Fe—C Inorganic materials 0.000 description 3
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910000713 I alloy Inorganic materials 0.000 description 1
- 102000005717 Myeloma Proteins Human genes 0.000 description 1
- 108010045503 Myeloma Proteins Proteins 0.000 description 1
- 229910004525 TaCr Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Carbon And Carbon Compounds (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
この発明は、磁気ヘッド等に適した軟磁性合金膜に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a soft magnetic alloy film suitable for magnetic heads and the like.
［従来の技術］
磁気記録の分野においては、記録密度を高めるために磁
気テープ等の記録媒体の高保磁力化が推進されているが
、それに対応する磁気ヘッドの材料として飽和磁束密度
（Ｂｓ）の高いものが要求されている。[Prior Art] In the field of magnetic recording, increasing the coercive force of recording media such as magnetic tapes is being promoted in order to increase the recording density. High demands are being made.
従来の高飽和゛磁束密度の軟磁性材料（膜）として、Ｆ
ｅ−９ｉ−Ａ Ｉ合金（センダスト）が代表的なもの
であるが、近年、強磁性金属元素であるＣＯを主体とす
る非晶質の合金膜が開発されている。As a conventional soft magnetic material (film) with high saturation magnetic flux density, F
The e-9i-A I alloy (Sendust) is a typical example, but in recent years, amorphous alloy films mainly containing CO, which is a ferromagnetic metal element, have been developed.
また最近の試みとして、Ｆｅを主成分とする微細結晶か
らなる合金膜（Ｆ ｅ−Ｃ、Ｐ ｅ−Ｓ ｉ等）により
、Ｆ’ｅの結晶磁気異方性の影響（軟磁性に対する悪影
響）を結晶の微細化により軽減し、高飽和磁束密度でか
つ軟磁気特性の優れた膜を得た例がある。In addition, as a recent attempt, alloy films (Fe-C, Pe-Si, etc.) consisting of fine crystals mainly composed of Fe have been developed to reduce the influence of magnetocrystalline anisotropy of F'e (adverse effect on soft magnetism). There is an example in which a film with high saturation magnetic flux density and excellent soft magnetic properties was obtained by reducing this by making crystals finer.
［発明が解決しようとする課題］
ところで、磁気ヘッドを組み込んだ装置は小型化、軽量
化する傾向にあり、移動に伴う振動にさらされたり、悪
環境のもとで使用されたりすることが多くなっている。[Problem to be solved by the invention] Incidentally, devices incorporating magnetic heads tend to be smaller and lighter, and are often exposed to vibrations caused by movement or used in adverse environments. It has become.
そこで、磁気ヘッドには、磁気特性が優秀であって磁気
テープに対する耐摩耗性が優れていることは勿論、湿度
や腐食性の雰囲気中での耐用性、すなわち耐環境性や、
耐振動性等が高いことが要求されている。そのため、ギ
ャップ形成やケースへの組み込み等をガラス溶着で行う
ことが必要となり、磁気ヘッドの素材はヘッドの製造工
程におけるガラス溶着工程の高温に耐え得ることが必要
である。Therefore, magnetic heads must not only have excellent magnetic properties and wear resistance against magnetic tape, but also durability in humid and corrosive atmospheres, that is, environmental resistance.
High vibration resistance is required. Therefore, it is necessary to perform gap formation, assembly into a case, etc. by glass welding, and the material of the magnetic head needs to be able to withstand the high temperatures of the glass welding process in the head manufacturing process.
しかしながら、前記従来の軟磁性合金膜において、セン
ダストからなるものは、飽和磁束密度が約１００００Ｇ
（ガウス）程度であり、今後−層の高密度化の要求に対
しては不充分である。、また、Ｃｏ系のアモルファス合
金膜では１３０００Ｇ以上の高い飽和磁束密度のものも
得られているが、従来のアモルファス合金の飽和磁束密
度を高くしようとすると、アモルファス形成元素である
Ｔｉ。However, among the conventional soft magnetic alloy films, those made of sendust have a saturation magnetic flux density of about 10,000G.
(Gauss), which is insufficient to meet future demands for higher density layers. In addition, some Co-based amorphous alloy films have high saturation magnetic flux densities of 13,000 G or more, but when trying to increase the saturation magnetic flux density of conventional amorphous alloys, Ti, an amorphous forming element, is used.
Ｚｒ Ｈｆ Ｎｂ、Ｔａ’、Ｍｏ、Ｗ等の添加量を少な
くする必要があるが、添加量を少なくすると、アモルフ
ァス構造の安定性が低下し、ガラス溶着に必要な温度（
約５００℃以上）には耐え得ない問題がある。It is necessary to reduce the amount of addition of Zr Hf Nb, Ta', Mo, W, etc., but if the addition amount is reduced, the stability of the amorphous structure will decrease and the temperature required for glass welding (
There is a problem that it cannot withstand temperatures of about 500°C or higher).
更に、上述したＦｅを主成分とする微細結晶からなる合
金膜（Ｆ ｅ−Ｃ、Ｆ ｅ−８ｉ等）は、高温で結晶成
長を起こし、軟磁気特性が劣化する（Ｆｅ−Ｃの場合、
４００℃が最大）ために、やはりガラス溶着に適したも
のとは言い難い。Furthermore, the alloy films (Fe-C, Fe-8i, etc.) made of fine crystals mainly composed of Fe described above undergo crystal growth at high temperatures, resulting in deterioration of soft magnetic properties (in the case of Fe-C,
400° C.), it is still difficult to say that it is suitable for glass welding.
このような背景から杏願発明者らは、特願平１−２７８
２２０号などにおいて、前記の問題を解決した軟磁性合
金膜を特許出願している。Against this background, the inventors of the Anonymous Patent Application No. 1-278
No. 220, etc., patent applications have been filed for soft magnetic alloy films that solve the above-mentioned problems.
特願平１−２７８２２０号明細書において特許出願して
いる軟磁性合金膜の１つは、組成式が、ＦｅａＭｅＣｄ
で示され、組成比ａは原子％で５０〜９６、Ｃは２〜３
０、ｄは０．５〜２５、ａ＋ｃ−ｔ−ｄ＝ ３００なる
関係を満足するものであった。One of the soft magnetic alloy films for which a patent application has been filed in Japanese Patent Application No. 1-278220 has a compositional formula of FeaMeCd.
The composition ratio a is 50 to 96 atomic %, and C is 2 to 3.
0 and d satisfied the relationship of 0.5 to 25 and a+c-t-d=300.
また、他の１つは、組成式がＦｅａＴｂＭｃＣｄで示さ
れ、組成比ａは原子％で５０〜９６、ｂは０．１−１０
、Ｃは２〜３０、ｄは０．５〜２５、ａ＋ｂ＋ｃ＋ｄ＝
１００なる関係を満足するものであった。The other one has a compositional formula of FeaTbMcCd, with a compositional ratio a of 50 to 96 atomic % and b of 0.1 to 10.
, C is 2-30, d is 0.5-25, a+b+c+d=
This satisfied the relationship 100.
この特許出願で提供した軟磁性合金膜は、一部組酸のも
のは１５０００Ｇ以上の高い飽和磁束密度を宵し、従来
の各種材料に比較すると高い熱安定性を備え、通常の使
用環境下では十分な耐食性と耐環境性を有しているが、
Ｆｅを主成分とするために、悪環境下で使用された場合
は変色あるいは発錆を招くおそれがあった。The soft magnetic alloy film provided in this patent application has a high saturation magnetic flux density of 15,000 G or more when it is partially fused, has high thermal stability compared to various conventional materials, and under normal usage environments. Although it has sufficient corrosion resistance and environmental resistance,
Since Fe is the main component, there is a risk of discoloration or rusting when used in adverse environments.
本発明は上述の問題点を解決し、保磁力が小さく透磁率
が高く、その特性が熱的に安定であるとともに、高い飽
和磁束密度を示し、良好な耐食性を有する軟磁性合金膜
を提供することを目的とするものである。The present invention solves the above-mentioned problems and provides a soft magnetic alloy film that has low coercive force, high magnetic permeability, thermally stable properties, high saturation magnetic flux density, and good corrosion resistance. The purpose is to
［課題を解決するための手段］
請求項１に記載した発明は前記課題を解決するために、
組成式がＦｅａＣｒｃＭｄＣｅで示され、ＭはＴ ｉ、
Ｚ ｒ、Ｈｆ、Ｖ 、Ｎ ｂ、Ｔ ａ、Ｍｏ、Ｗのう
ち、少なくとも１種からなる金属元素又はその混合物で
あり、組成比ａ、ｃ、ｄ、ｅは原子％で５０≦ａ≦９５
．０５≦ｃ≦２０．２≦ｄ≦２５．０５≦ｅ≦２５、ａ
＋ｃ＋ｄ＋ｅ＝ １００なる関係を満足させるとともに
、その組織が基本的に平均結晶粒径０．０８μｍ以下の
微細な結晶粒からなり、その一部に元素Ｍ・の炭化物の
結晶相を含むものである。[Means for solving the problem] In order to solve the problem, the invention described in claim 1 has the following features:
The compositional formula is FeaCrcMdCe, where M is Ti,
A metal element or a mixture thereof consisting of at least one of Zr, Hf, V, Nb, Ta, Mo, and W, and the composition ratios a, c, d, and e are 50≦a≦95 in atomic %.
．． 05≦c≦20.2≦d≦25.05≦e≦25, a
It satisfies the relationship: +c+d+e=100, and its structure basically consists of fine crystal grains with an average crystal grain size of 0.08 μm or less, and a portion thereof includes a crystal phase of carbide of element M.
請求項２に記載した発明は前記課題を解決するために、
組成式がＦｅａＴ ｂｃｒｃＭ ｄＣｅで示され、Ｔは
Ｃｏ、Ｎｉのうち少なくとも１種からなる金属元素又は
その混合物、ＭはＴｉ、Ｚｒ、Ｉｆ。In order to solve the above problem, the invention described in claim 2 has the following features:
The compositional formula is FeaT bcrcM dCe, T is a metal element consisting of at least one of Co and Ni, or a mixture thereof, and M is Ti, Zr, If.
Ｖ 、Ｎｂ、ＴａｌＭｏ、Ｗのうち、少なくとも１種か
らなる金属元素又はその混合物であり、組成比ａ、ｂ。A metal element consisting of at least one of V, Nb, TalMo, and W, or a mixture thereof, with a composition ratio of a and b.
ｃ、ｄ、ｅは原子％で５０≦ａ≦９５．０．１≦ｂ≦１
０゜０．５≦ｃ≦２０．２≦ｄ≦２５．０．５≦ｅ≦２
５、ａ＋ｂ＋ｃ＋ｄ＋ｅ＝ １００なる関係を満足させ
るとともに、その組織が、基本的に平均結晶粒径０゜０
８μｍ以下の微細な結晶粒からなり、その一部に元素Ｍ
の炭化物の結晶相を含むものである。c, d, e are 50≦a≦95.0.1≦b≦1 in atomic%
0゜0.5≦c≦20.2≦d≦25.0.5≦e≦2
5, satisfies the relationship a+b+c+d+e=100, and the structure basically has an average grain size of 0°0
It consists of fine crystal grains of 8 μm or less, and some of them contain the element M.
It contains a crystalline phase of carbide.
請求項３に記載した発明は前記課題を解決するために、
請求項１または２に記載の組織が基本的に平均粒径０．
０８μｍ以下の結晶粒と非晶質相が混在した組織である
ものである。In order to solve the above problem, the invention described in claim 3 has the following features:
The structure according to claim 1 or 2 basically has an average grain size of 0.
It has a structure in which crystal grains of 0.08 μm or less and an amorphous phase coexist.
以下に本発明を更に詳細に説明する。The present invention will be explained in more detail below.
前記合金膜の生成方法としては、合金膜をスパッタ、蒸
着等の薄膜形成装置により作製する。スパッタ装置とし
ては、ＲＦ２極スパッタ、ＤＣスパッタ、マグネトロン
スパッタ、３極スパツタ、イオンビームスパッタ、対向
ターゲット式スパッタ、等の既存のものを使用すること
ができる。As a method for producing the alloy film, the alloy film is produced using a thin film forming apparatus such as sputtering or vapor deposition. As the sputtering apparatus, existing ones such as RF two-pole sputtering, DC sputtering, magnetron sputtering, three-pole sputtering, ion beam sputtering, and facing target sputtering can be used.
また、Ｃを膜中に添加する方法としては、ターゲツト板
上にグラファイトのベレットを配置して複合ターゲット
とし、これをスパッタする方法、あるいは、Ｃを含まな
いターゲット（Ｆ ｅ−Ｃｒ−Ｍ系あるいはＦ ｅ−Ｔ
−Ｃｒ−Ｍ系）を用い、Ａｒ等の不活性ガス中にメタ
ン（ＣＨ，）等の炭化水素ガスを混合したガス雰囲気で
スパッタする反応性スパッタ法等を用いることができ、
特Ｉこ反応性スパッタ法では膜中のＣ濃度の制御が容易
であるので所望のＣ濃度の優れた膜を得ることができる
。In addition, as a method of adding C to the film, a graphite pellet is placed on a target plate to form a composite target, and this is sputtered. Alternatively, a target that does not contain C (Fe-Cr-M type or Fe-T
-Cr-M system) can be used, and a reactive sputtering method can be used in which sputtering is performed in a gas atmosphere in which a hydrocarbon gas such as methane (CH, ) is mixed in an inert gas such as Ar.
Special feature I: Since the reactive sputtering method allows easy control of the C concentration in the film, it is possible to obtain a film with an excellent desired C concentration.
このようにして作製したままの膜はアモルファス相をか
なりの割合で含んだしのであり、不安定であるので、４
００〜７００℃程度に加熱する熱処理を施すことによっ
て微結晶を析出させる。そして、この熱処理を無磁場、
静磁場中あるいは回転磁場中で行うことにより、優れた
軟磁気特性が得られる。また、この熱処理は磁気ヘッド
の製造工程におけるガラス溶着工程と兼ねて行うことが
できる。The film as produced in this way contains a considerable proportion of amorphous phase and is unstable.
Microcrystals are precipitated by performing heat treatment to about 00 to 700°C. This heat treatment is then carried out without a magnetic field.
Excellent soft magnetic properties can be obtained by performing the process in a static magnetic field or a rotating magnetic field. Further, this heat treatment can be performed concurrently with the glass welding step in the manufacturing process of the magnetic head.
なお、前記微結晶の析出工程は、完全に行なわれる必要
はなく、微結晶が相当数（好ましくは５０％以上）析出
していれば良いので、アモルファス成分が一部残留して
いても差し支えなく、残留したアモルファス成分が特性
向上の障害となることはない。Note that the step of precipitating the microcrystals does not need to be performed completely, and it is sufficient that a considerable number of microcrystals (preferably 50% or more) are precipitated, so there is no problem even if some amorphous components remain. , the remaining amorphous components do not impede the improvement of properties.
以下、前記のように成分を限定した理由について述べる
。The reason for limiting the components as described above will be described below.
Ｆｅは主成分であり、磁性を担う元素であって、少なく
ともフェライト（Ｂｓ ５０００Ｇ）以上の飽和磁束
密度を得るためには、８２５０％が必要である。また、
良好な軟磁気特性を得るためには、８６９５％でなけれ
ばならない。Fe is the main component and is an element responsible for magnetism, and in order to obtain a saturation magnetic flux density at least higher than ferrite (Bs 5000G), 8250% is required. Also,
In order to obtain good soft magnetic properties, it must be 8695%.
元素Ｔ（即ちＣｏ、Ｎｉ）は、磁歪の調整の目的で添加
する元素である。Ｆｅ−Ｍ−Ｃ膜の場合、熱処理温度が
低いと磁歪が正になり、熱処理温度が高いと磁歪が負に
なる。高い熱処理温度（ガラス溶着温度）を必要とする
場合、磁歪を正にする効果のあるＮｉ、Ｇｏを過員添加
することにより、磁歪をほぼ零にすることができる。な
お、熱処理温度が適当な場合、元素Ｔの添加は特に必要
ないが、Ｔの添加は正の磁歪が＋１０−５台以上まで大
きくならないように５５１０％としなくてはならない。Element T (ie, Co, Ni) is an element added for the purpose of adjusting magnetostriction. In the case of a Fe-MC film, when the heat treatment temperature is low, the magnetostriction becomes positive, and when the heat treatment temperature is high, the magnetostriction becomes negative. When a high heat treatment temperature (glass welding temperature) is required, the magnetostriction can be made almost zero by adding Ni or Go, which has the effect of making the magnetostriction positive. Note that if the heat treatment temperature is appropriate, addition of element T is not particularly necessary, but the addition of T must be 5510% so that the positive magnetostriction does not increase to more than +10-5.
元素Ｍは軟磁気特性を良好にするために必要であり、ま
たＣと結合して炭化物の微細結晶を形成する。良好な軟
磁気特性を維持するためには、ｄ≧２％とする必要があ
るが、多すぎると飽和磁束密度が低下してしまうので、
４６２５％とする必要がある。Element M is necessary to improve soft magnetic properties, and also combines with C to form fine carbide crystals. In order to maintain good soft magnetic properties, it is necessary to make d≧2%, but if it is too large, the saturation magnetic flux density will decrease.
It needs to be 4625%.
Ｃは軟磁気特性を良好にするため、及び、耐熱性を向上
させるために必要であり、Ｃは元素Ｍと結合して炭化物
の微細結晶を形成する。良好な軟磁気特性、及び、熱的
安定性を維持するためには、ｅ≧０．５％とする必要が
あるが、多すぎると飽和磁束密度が低下してしまうので
、０５２５％とする必要がある。C is necessary to improve soft magnetic properties and heat resistance, and C combines with element M to form fine crystals of carbide. In order to maintain good soft magnetic properties and thermal stability, it is necessary to set e≧0.5%, but if it is too large, the saturation magnetic flux density will decrease, so it is necessary to set it to 0525%. There is.
元素Ｍの炭化物の微細結晶は磁壁のピンニングサイトと
して働き、透磁率の高周波特性を向上させる働きがある
とともに、膜中に均一に分散させることで、Ｆｅの微結
晶が熱処理により成長して軟磁性を損うことを防止する
働きがある。つまり、Ｆｅの結晶粒が成長して大きくな
ると結晶磁気異方性の悪影響が大きくなり、軟磁気特性
が悪化するが、元素Ｍの炭化物の微結晶がＦｅの粒成長
の障壁として働くことにより軟磁気特性の悪化を防止す
る。The carbide microcrystals of element M act as pinning sites for the domain wall, improving the high-frequency characteristics of magnetic permeability, and by uniformly dispersing them in the film, Fe microcrystals grow through heat treatment, resulting in soft magnetic properties. It has the function of preventing damage to the In other words, as the crystal grains of Fe grow and become larger, the negative effect of magnetocrystalline anisotropy increases and the soft magnetic properties deteriorate. Prevents deterioration of magnetic properties.
以上説明のＦｅと元素Ｔと元素ＭとＣの成分限定理由は
特願平１−２７８２２０号の場合と同等である。The reasons for limiting the components of Fe, element T, element M, and C described above are the same as those in Japanese Patent Application No. 1-278220.
Ｃｒは耐食性を向上させるために添加する元素であるが
、Ｃ≧０．５％としなければ耐食性の改善効果が現れな
い。また、Ｃ≧２０％とすると飽和磁束密度が低くなり
過ぎる（フェライト以下になる）ので好ましくない。Cr is an element added to improve corrosion resistance, but the effect of improving corrosion resistance will not appear unless C≧0.5%. Further, if C≧20%, the saturation magnetic flux density becomes too low (below ferrite), which is not preferable.
そして、金属組織が基本的に０，０８μｍ以下の微結晶
からなっているから、非晶質に比べて熱的安定性に優れ
ており、添加元素を少なくでき、飽和磁束密度を高くす
ることができる。And since the metal structure basically consists of microcrystals of 0.08 μm or less, it has superior thermal stability compared to amorphous materials, can reduce the amount of added elements, and can increase the saturation magnetic flux density. can.
［作用］
上記軟磁性合金膜においては、その組織かＦｅに富む結
晶を主体とし、飽和磁束密度を低下させる成分の添加が
制限されているから、非晶質状態に比べ鉄原子１個あた
りの磁気モーメントおよびキュリー温度が高くなってお
り、高い飽和磁束密度が得られる。また、元素Ｍ及びＣ
が含まれているとともに、金属組織が微細な結晶粒から
なっており、結晶磁気異方性による軟磁性への悪影響が
軽減されるので、良好な軟磁気特性が得られる。[Function] In the above-mentioned soft magnetic alloy film, its structure is mainly composed of Fe-rich crystals, and the addition of components that reduce the saturation magnetic flux density is limited, so the The magnetic moment and Curie temperature are high, resulting in a high saturation magnetic flux density. Also, elements M and C
In addition, the metal structure is made up of fine crystal grains, which reduces the negative influence of magnetocrystalline anisotropy on soft magnetism, so that good soft magnetic properties can be obtained.
更に、元素Ｍの炭化物が析出してＦｅを主成分とする結
晶粒の成長を抑えるので、ガラス溶着工程において加熱
されても、結晶粒が粗大化することがない。更にまた、
Ｃｒを特定量添加しているので耐食性が向上し、耐環境
性に優れる。Furthermore, since the carbide of element M precipitates and suppresses the growth of crystal grains mainly composed of Fe, the crystal grains do not become coarse even when heated in the glass welding process. Furthermore,
Since a specific amount of Cr is added, corrosion resistance is improved and environmental resistance is excellent.
［実施例］
（１）成膜
ＲＦ２極スパッタ装置を用いて、後記の第１表に示す組
成の合金膜を形成した。[Example] (1) Film Formation An alloy film having a composition shown in Table 1 below was formed using an RF two-pole sputtering device.
使用したターゲットは、Ｆｅターゲット上にＴａＣｒ、
Ｎｉ、グラファイトの各ペレットを適宜配置して構成し
た複合ターゲットを用い、Ａｒガス雰囲気中でスパッタ
を行って膜厚５〜６μｍの薄膜を形成した。The target used was TaCr on Fe target,
Using a composite target composed of appropriately arranged Ni and graphite pellets, sputtering was performed in an Ar gas atmosphere to form a thin film with a thickness of 5 to 6 μm.
（２）熱処理
成膜後、５５０℃で２０分間保持するアニールを行った
。このアニールには、静磁場中で行うものと無磁場中で
行うものの２種類を実施した。(2) Heat treatment After film formation, annealing was performed at 550° C. for 20 minutes. Two types of annealing were performed: one in a static magnetic field and one in no magnetic field.
（３）測定
前記のように製造された合金膜と、スパッタにより成膜
したＣｒを含有しない合金膜（特願平ｌ−２７８２２０
号において特許出願している発明に係る合金膜）につい
て、静磁場アニール後あるいは無磁場アニール後におけ
る飽和磁束密度（Ｂｓ）と、初透磁率（μ、ａｔｌＭｈ
ｚ）および保磁力（Ｈｅ）の測定を行った。以上の結果
を第１表に示す。(3) Measurement The alloy film produced as described above and the Cr-free alloy film formed by sputtering (Japanese Patent Application No. 1-278220)
The saturation magnetic flux density (Bs) and initial magnetic permeability (μ, atlMh
z) and coercive force (He) were measured. The above results are shown in Table 1.
（以下、余白）
第１表のサンプル１の比較例は、本発明者らが先に特許
出願しているもので、Ｃｒの添加のみを省略したもので
あるが、この組成にＣｒを添加しても初透磁率と保磁力
などの軟磁気特性の劣化はほとんど問題にならないこと
が判明した。(Hereinafter, blank space) The comparative example of Sample 1 in Table 1 is one for which the present inventors have previously applied for a patent, and only the addition of Cr is omitted; However, it was found that the deterioration of soft magnetic properties such as initial magnetic permeability and coercive force is hardly a problem.
前記と同様な方法で作製した軟磁性合金膜を純水中に２
４０時間浸漬した後の変色状況を目視て判定した結果を
以下の第２表に示す。A soft magnetic alloy film prepared in the same manner as above was placed in pure water for 2 hours.
The results of visually determining the discoloration after 40 hours of immersion are shown in Table 2 below.
第 ２ 表
第２表に示す結果から、Ｃｒを添加することで耐食性を
向上できることが明らかになった。Table 2 From the results shown in Table 2, it was revealed that corrosion resistance could be improved by adding Cr.
［発明の効果］
以上詳述したようにこの発明は、Ｆｅを主成分とする微
細な結晶粒から主になる軟磁性合金膜であり、飽和磁束
密度を低下させる成分の添加が制限されているから、高
い飽和磁束密度が得られる。[Effects of the Invention] As detailed above, the present invention is a soft magnetic alloy film mainly composed of fine crystal grains containing Fe as the main component, and the addition of components that reduce the saturation magnetic flux density is restricted. Therefore, a high saturation magnetic flux density can be obtained.
更に、従来のアモルファス合金膜とは異なり、無磁場中
で熱処理を行っても高い透磁率を発揮する膜を得ること
ができ、磁場をかけて熱処理する場合よりも工程の簡略
化をなしえる。Further, unlike conventional amorphous alloy films, it is possible to obtain a film that exhibits high magnetic permeability even when heat-treated in the absence of a magnetic field, and the process can be simplified compared to when heat-treated by applying a magnetic field.
また、元素Ｍ（Ｔｉ、Ｚｒ、ＨＬＶ、Ｎ，Ｂ，Ｔａ，Ｍ
ｏ、Ｗ）及びＣという軟磁性を良好とする成分が添加さ
れるとともに、金属組織が微細な結晶粒から成り、結晶
磁気異方性による軟磁性への悪影響が軽減されるので、
良好な軟磁気特性が得られる。In addition, elements M (Ti, Zr, HLV, N, B, Ta, M
Components such as o, W) and C that improve soft magnetism are added, and the metal structure consists of fine crystal grains, reducing the adverse effect of magnetocrystalline anisotropy on soft magnetism.
Good soft magnetic properties can be obtained.
更に、微細な結晶粒からなるとともに、添加された元素
ＭがＣと炭化物を形成するから、ガラス溶着工程におい
て加熱されても、結晶粒が粗大化することがなく、上記
の特性を維持するので、高密度記録に要求される高い性
能を有する磁気ヘッドの素材として好適である。Furthermore, since it is composed of fine crystal grains and the added element M forms a carbide with C, the crystal grains do not become coarse even when heated in the glass welding process, and the above characteristics are maintained. It is suitable as a material for magnetic heads that have the high performance required for high-density recording.
更にまた、上記組成に加えて元素Ｔ（Ｃｏ、Ｎｉ）を添
加し、磁歪を調整することにより、磁気ヘッド製造工程
で生じる種々の歪による軟磁気特性の劣化を防ぐことが
できるものである。Furthermore, by adding elements T (Co, Ni) in addition to the above composition to adjust the magnetostriction, it is possible to prevent deterioration of the soft magnetic properties due to various strains occurring in the manufacturing process of the magnetic head.
そして、前記成分にＣｒを特定量添加しているので、Ｆ
ｅ基の合金としては耐食性に優れ、悪環境下であっても
変色や発錆を生じない特徴がある。Since a specific amount of Cr is added to the above components, F
As an e-based alloy, it has excellent corrosion resistance and is characterized by not discoloring or rusting even under adverse environments.
Claims (1)
ｉ，Ｚｒ，Ｈｆ，Ｖ，Ｎ，Ｂ，Ｔａ，Ｍｏ，Ｗのうち、
少なくとも１種からなる金属元素又はその混合物であり
、組成比ａ，ｃ，ｄ，ｅは原子％で ５０≦ａ≦９５ ０．５≦ｃ≦２０ ２≦ｄ≦２５ ０．５≦ｅ≦２５ ａ＋ｃ＋ｄ＋ｅ＝１００ なる関係を満足させるとともに、その組織が基本的に平
均結晶粒径０．０８μｍ以下の微細な結晶粒からなり、
その一部に元素Ｍの炭化物の結晶相を含むことを特徴と
する軟磁性合金膜。 （２）組成式がＦｅａＴｂＣｒｃＭｄＣｅで示され、Ｔ
はＣｏ，Ｎｉのうち少なくとも１種からなる金属元素又
はその混合物、ＭはＴｉ，Ｚｒ，Ｈｆ，Ｖ，Ｎｂ，Ｔａ
，Ｍｏ，Ｗのうち、少なくとも１種からなる金属元素又
はその混合物であり、組成比ａ，ｂ，ｃ，ｄ，ｅは原子
％で ５０≦ａ≦９５ ０．１≦ｂ≦１０ ０．５≦ｃ≦２０ ２≦ｄ≦２５ ０．５≦ｅ≦２５ ａ＋ｂ＋ｃ＋ｄ＋ｅ＝１００ なる関係を満足させるとともに、その組織が基本的に平
均結晶粒径０．０８μｍ以下の微細な結晶粒からなり、
その一部に元素Ｍの炭化物の結晶相を含むことを特徴と
する軟磁性合金膜。 （３）請求項１または２に記載の組織が平均結晶粒径０
．０８μｍ以下の微細な結晶粒と非晶質相との混在した
組織であることを特徴とする軟磁性合金膜。[Claims] (1) The compositional formula is FeaCrcMdCe, and M is T.
i, Zr, Hf, V, N, B, Ta, Mo, W,
It is a metal element or a mixture thereof consisting of at least one kind, and the composition ratios a, c, d, and e are 50≦a≦95 0.5≦c≦20 2≦d≦25 0.5≦e≦25 in atomic % It satisfies the relationship: a+c+d+e=100, and its structure basically consists of fine crystal grains with an average crystal grain size of 0.08 μm or less,
A soft magnetic alloy film characterized in that a part thereof contains a crystal phase of a carbide of element M. (2) The compositional formula is FeaTbCrcMdCe, and T
is a metal element consisting of at least one of Co and Ni, or a mixture thereof; M is Ti, Zr, Hf, V, Nb, Ta
, Mo, and W, or a mixture thereof, and the composition ratios a, b, c, d, and e are atomic %: 50≦a≦95 0.1≦b≦10 0.5 ≦c≦20 2≦d≦25 0.5≦e≦25 a+b+c+d+e=100 The structure basically consists of fine crystal grains with an average grain size of 0.08 μm or less,
A soft magnetic alloy film characterized in that a part thereof contains a crystal phase of a carbide of element M. (3) The structure according to claim 1 or 2 has an average crystal grain size of 0.
．． A soft magnetic alloy film characterized by having a structure in which fine crystal grains of 0.08 μm or less and an amorphous phase coexist.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2063808A JP2710440B2 (en) | 1990-03-14 | 1990-03-14 | Soft magnetic alloy film |
| KR1019910003741A KR940007048B1 (en) | 1990-03-14 | 1991-03-08 | Soft-magnetic materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2063808A JP2710440B2 (en) | 1990-03-14 | 1990-03-14 | Soft magnetic alloy film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03265104A true JPH03265104A (en) | 1991-11-26 |
| JP2710440B2 JP2710440B2 (en) | 1998-02-10 |
Family
ID=13240044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2063808A Expired - Fee Related JP2710440B2 (en) | 1990-03-14 | 1990-03-14 | Soft magnetic alloy film |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2710440B2 (en) |
| KR (1) | KR940007048B1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995027889A1 (en) * | 1994-04-08 | 1995-10-19 | Nippon Steel Corporation | Stress sensor |
| KR100414452B1 (en) * | 2001-10-17 | 2004-01-13 | 주식회사 포스코 | Amorphous alloy materials for the fluid filtering media |
| EP1850334A1 (en) * | 2006-04-27 | 2007-10-31 | Heraeus, Inc. | Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target |
| CN103938034A (en) * | 2014-03-27 | 2014-07-23 | 安徽华兴金属有限责任公司 | Aluminum alloy composition and preparation process thereof |
| CN103938131A (en) * | 2014-03-27 | 2014-07-23 | 安徽华兴金属有限责任公司 | Amorphous alloy composition and preparation method thereof |
-
1990
- 1990-03-14 JP JP2063808A patent/JP2710440B2/en not_active Expired - Fee Related
-
1991
- 1991-03-08 KR KR1019910003741A patent/KR940007048B1/en not_active IP Right Cessation
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995027889A1 (en) * | 1994-04-08 | 1995-10-19 | Nippon Steel Corporation | Stress sensor |
| US5652394A (en) * | 1994-04-08 | 1997-07-29 | Nippon Steel Corporation | Stress sensor fabricated from a material having precipitated granular carbides |
| KR100414452B1 (en) * | 2001-10-17 | 2004-01-13 | 주식회사 포스코 | Amorphous alloy materials for the fluid filtering media |
| EP1850334A1 (en) * | 2006-04-27 | 2007-10-31 | Heraeus, Inc. | Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target |
| CN103938034A (en) * | 2014-03-27 | 2014-07-23 | 安徽华兴金属有限责任公司 | Aluminum alloy composition and preparation process thereof |
| CN103938131A (en) * | 2014-03-27 | 2014-07-23 | 安徽华兴金属有限责任公司 | Amorphous alloy composition and preparation method thereof |
| CN103938131B (en) * | 2014-03-27 | 2016-01-20 | 安徽华兴金属有限责任公司 | A kind of non-crystaline amorphous metal composition and preparation method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR940007048B1 (en) | 1994-08-04 |
| JP2710440B2 (en) | 1998-02-10 |
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