JPH0325938B2 - - Google Patents

Info

Publication number
JPH0325938B2
JPH0325938B2 JP56147559A JP14755981A JPH0325938B2 JP H0325938 B2 JPH0325938 B2 JP H0325938B2 JP 56147559 A JP56147559 A JP 56147559A JP 14755981 A JP14755981 A JP 14755981A JP H0325938 B2 JPH0325938 B2 JP H0325938B2
Authority
JP
Japan
Prior art keywords
chamber
plasma processing
arm member
unloader
loader
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56147559A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5848935A (ja
Inventor
Akira Uehara
Isamu Hijikata
Juichi Myazaki
Hiroyuki Kyota
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP56147559A priority Critical patent/JPS5848935A/ja
Publication of JPS5848935A publication Critical patent/JPS5848935A/ja
Publication of JPH0325938B2 publication Critical patent/JPH0325938B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/3402—
    • H10P72/3412—

Landscapes

  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56147559A 1981-09-18 1981-09-18 自動プラズマ処理装置 Granted JPS5848935A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56147559A JPS5848935A (ja) 1981-09-18 1981-09-18 自動プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56147559A JPS5848935A (ja) 1981-09-18 1981-09-18 自動プラズマ処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP61250343A Division JPS6323331A (ja) 1986-10-21 1986-10-21 蓋体の開閉機構

Publications (2)

Publication Number Publication Date
JPS5848935A JPS5848935A (ja) 1983-03-23
JPH0325938B2 true JPH0325938B2 (enExample) 1991-04-09

Family

ID=15433075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56147559A Granted JPS5848935A (ja) 1981-09-18 1981-09-18 自動プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS5848935A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01181527A (ja) * 1988-01-11 1989-07-19 Mitsubishi Electric Corp プラズマ真空容器のシール装置
US6709522B1 (en) * 2000-07-11 2004-03-23 Nordson Corporation Material handling system and methods for a multichamber plasma treatment system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513743U (enExample) * 1974-06-25 1976-01-12
JPS5633151Y2 (enExample) * 1977-03-17 1981-08-06

Also Published As

Publication number Publication date
JPS5848935A (ja) 1983-03-23

Similar Documents

Publication Publication Date Title
JP4522329B2 (ja) 基板処理装置
KR890004571B1 (ko) Ic 제조를 위한 플라스마 처리장치
KR100875788B1 (ko) 기판처리장치
KR100240022B1 (ko) 반도체장치 제조용 현상 장치 및 그의 제어방법
KR100736802B1 (ko) 기판 처리장치 및 기판 처리방법
CN101388333A (zh) 基板处理装置以及基板处理方法
CN101009212A (zh) 基板处理装置
US20180314158A1 (en) Unit for supplying liquid, apparatus for treating a substrate, and method for treating a substrate
JPH0666295B2 (ja) 多段プラズマ処理装置
JP5004611B2 (ja) 基板処理装置
JP2008288447A (ja) 基板処理装置
JPS5860552A (ja) 縦型自動プラズマ処理装置
JPH0325938B2 (enExample)
US20030164181A1 (en) Substrate processing apparatus
JPS5860553A (ja) 縦型自動プラズマ処理装置
KR100542631B1 (ko) 반도체 제조 설비
KR102233465B1 (ko) 기판반송유닛, 이를 가지는 기판처리장치 및 방법
KR100268951B1 (ko) 반도체소자 제조 공정용 다중 챔버형 감광제 제거장치
JPS58124241A (ja) 半導体基板現像装置
JP4005388B2 (ja) 基板処理システム
CN100424815C (zh) 基板处理装置及基板处理方法
JPS6323653B2 (enExample)
KR102257430B1 (ko) 현상 장치, 기판 처리 장치, 현상 방법 및 기판 처리 방법
KR19990015331A (ko) 반도체장치 제조용 현상 장치 및 그의 제어방법
JPS62131517A (ja) 半導体製造装置