JPH03250707A - Magnetic alloy - Google Patents
Magnetic alloyInfo
- Publication number
- JPH03250707A JPH03250707A JP2048117A JP4811790A JPH03250707A JP H03250707 A JPH03250707 A JP H03250707A JP 2048117 A JP2048117 A JP 2048117A JP 4811790 A JP4811790 A JP 4811790A JP H03250707 A JPH03250707 A JP H03250707A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- magnetic alloy
- coercive force
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 34
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims abstract description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 229910052733 gallium Inorganic materials 0.000 claims 2
- 229910045601 alloy Inorganic materials 0.000 abstract description 14
- 239000000956 alloy Substances 0.000 abstract description 14
- 230000004907 flux Effects 0.000 abstract description 10
- 230000007797 corrosion Effects 0.000 abstract description 8
- 238000005260 corrosion Methods 0.000 abstract description 8
- 230000035699 permeability Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 2
- 230000008569 process Effects 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- 229910000713 I alloy Inorganic materials 0.000 description 1
- 229910000979 O alloy Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229940110728 nitrogen / oxygen Drugs 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Compounds Of Iron (AREA)
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度磁気記録用の磁気ヘッドに適する磁性
合金に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic alloy suitable for a magnetic head for high-density magnetic recording.
（従来の技術）
近年、磁気記録の高密度化や広帯域化の必要性が高まり
、磁気記録媒体に高い抗磁力を有する磁性材料を使用し
て記録トラック幅を狭くすることにより、高密度磁気記
録再生を実現している。そして、この高い抗磁力をもつ
磁気記録媒体に記録再生するための磁気ヘッド材料とし
て、飽和磁束密度Ｂｓの高い磁性合金が必要とされてお
り、センダスト合金やＣｏ−Ｚｒ系非晶質合金等をコア
の一部または全部に使用した磁気ヘッドが提案されてい
る。(Prior art) In recent years, the need for higher density and wider band magnetic recording has increased, and high-density magnetic recording has been achieved by narrowing the recording track width by using magnetic materials with high coercive force in magnetic recording media. Achieving regeneration. Magnetic alloys with high saturation magnetic flux density Bs are required as magnetic head materials for recording and reproducing on magnetic recording media with high coercive force, and Sendust alloys, Co-Zr amorphous alloys, etc. A magnetic head using part or all of the core has been proposed.
然しなから、磁気記録媒体の高抗磁力化か一段と進み、
磁気記録媒体の抗磁力か２００００ ｅ以上になるとセ
ンダスト合金やＣｏ−Ｚｒ系非晶質合金を使用した磁気
ヘッドでは良好な磁気記録再生か困難になった。However, progress has been made in increasing the coercive force of magnetic recording media.
When the coercive force of a magnetic recording medium exceeds 20,000 e, it becomes difficult to perform good magnetic recording and reproduction with a magnetic head using a Sendust alloy or a Co--Zr amorphous alloy.
又、磁気記録媒体の長手方向ではなく、厚さ方向に磁化
して記録する垂直磁化記録方式も提案されているが、こ
の垂直磁化記録方式を良好に行うには、磁気ヘッドの主
磁極の先端部の厚さを０，５μｍ以下にする必要があり
、比較的抗磁力の低い磁気記録媒体に記録するにも、高
い飽和磁束密度を持つ磁気ヘッド用磁性合金が必要にな
る。Also, a perpendicular magnetization recording method has been proposed in which the magnetic recording medium is magnetized in the thickness direction rather than in the longitudinal direction, but in order to perform well with this perpendicular magnetization recording method, the tip of the main pole of the magnetic head must be The thickness of the magnetic head must be 0.5 μm or less, and a magnetic alloy for a magnetic head with a high saturation magnetic flux density is required even for recording on a magnetic recording medium with relatively low coercive force.
そして、センダスト合金やＣｏ−Ｚｒ系非晶質合金より
も飽和磁束密度の高い磁性合金として、窒化鉄やＦｅ−
５ｉ系合金等の鉄を主成分とした磁性合金が知られてい
る。Iron nitride and Fe-
Magnetic alloys containing iron as a main component, such as 5i-based alloys, are known.
（発明が解決しようとする課題）
ところが、従来より知られている、これらの高Ｂｓ磁性
合金は保磁力Ｈｃか大きく、そのままでは磁気ヘッドの
材料としては不十分であるのでセンダスト合金やパーマ
ロイ等の保磁力の小さい磁性材料か、或いは５ｉＯｚ等
の非磁性材事」を中間層とした多層構造の磁気ヘッドが
提案されている。(Problem to be Solved by the Invention) However, these conventionally known high Bs magnetic alloys have a large coercive force Hc and are not sufficient as materials for magnetic heads as they are, so sendust alloys, permalloy, etc. A multilayer magnetic head has been proposed in which the intermediate layer is made of a magnetic material with a low coercive force or a non-magnetic material such as 5iOz.
然しなから、このように異なる系の物質を多層化するに
は工数やコストかかかり、信頼性を保つのも難しいとい
う問題点があった。特に数１１ ｍ以上の膜厚にする為
には、場合によっては１００層以上の多層構造とする必
要があり、使用範囲も限られていた。However, creating multiple layers of different types of materials in this way requires a lot of man-hours and costs, and it is difficult to maintain reliability. In particular, in order to obtain a film thickness of several 11 m or more, it is necessary to have a multilayer structure of 100 or more layers depending on the case, and the range of use has been limited.
これらの問題点を解決するために、不発四人等はＦｅ−
Ｎ−０合金によって、多層構造にしない単層でも高飽和
磁束密度を有し、さらに低保磁力である磁性合金を提案
したが熱安定性の面からガラスモールド工程には適さな
いというｆｆ７１題点があった。そこで、本発明は多層
構造にしなくても高飽和磁束密度を持ち、保磁力が小さ
く、熱安定性に優れた磁性合金を提供することをＬ１的
とする。In order to solve these problems, the four unexploded people etc.
We proposed a magnetic alloy using N-0 alloy that has a high saturation magnetic flux density even in a single layer without a multilayer structure, and also has a low coercive force, but the problem with ff71 was that it was not suitable for the glass molding process due to thermal stability. was there. Therefore, the L1 objective of the present invention is to provide a magnetic alloy that has a high saturation magnetic flux density without having a multilayer structure, has a small coercive force, and has excellent thermal stability.
（課題を解決するための手段）
本発明は上記の課題を解決するためになされたされ、ｖ
、ｗ、ｘ、ｙて示される原子９６が１≦Ｗ≦２０ ０
．１≦ｘ≦１０
０．５≦ｙ≦６
ｖ ＋ｗ＋ ｘ 十ｙ ＝１００
なる関係を有する磁性合金（但しＭはＢ，Ａｌ，Ｇａ、
Ｃ，Ｇｅ、からなる群の中から選ばれた少なくとも１種
類以上の元素）または、
Ｆ ｅＶ ＮＷ ＯＸ ＭＹ ＬＺなる組成式で表され
、ｖ、ｗ、）ｃ、ｙ、ｚて示される原子％か１≦ｗ≦２
０ ０．１≦ｘ≦１．０
０．５≦ｙ≦６０．３≦２≦６
ｖ＋ｗ＋ｘ＋ｙ＋ｚ＝１．００
なる関係を有する磁性合金（但しＭはＢ、ＡｌＧａ、Ｃ
，Ｇｅからなる群の中から選ばれた少なくとも１種類以
上の元素であり、ＬはＴｉ、Ｖ。(Means for Solving the Problems) The present invention has been made to solve the above problems, and v
, w, x, y atoms 96 are 1≦W≦20 0
．． A magnetic alloy having the following relationships: 1≦x≦10 0.5≦y≦6 v +w+
At least one element selected from the group consisting of C, Ge, or F eV NW OX MY LZ, represented by v, w,) c, y, z atomic % or1≦w≦2
0 0.1≦x≦1.0 0.5≦y≦60.3≦2≦6 v+w+x+y+z=1.00 Magnetic alloy (where M is B, AlGa, C
, Ge, and L is Ti or V.
Ｃｒ、Ｃｏ、Ｎｉ、Ｃｕ、Ｙ、Ｚｒ、Ｎｂ、Ｍｏ。Cr, Co, Ni, Cu, Y, Zr, Nb, Mo.
Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｓｎ、Ｓｂ、Ｈｆ。Ru, Rh, Pd, Ag, Sn, Sb, Hf.
Ｔａ、Ｗ、Ｒｅ、Ｏｓ、Ｉ ｒ、Ｐｔ、Ａｕ、Ｐｂから
なる群の中から選ばれた少なくとも１種類以上の元素）
をそれぞれ提供するものである。At least one element selected from the group consisting of Ta, W, Re, Os, Ir, Pt, Au, and Pb)
Each of these will provide the following:
（実施例）
本発明になる磁性合金の製造装置の一実施例を第１図に
示す。(Example) An example of the magnetic alloy manufacturing apparatus according to the present invention is shown in FIG.
一対のターゲット５．５は鉄（Ｆ ｅ）とＢＡｌ、Ｇａ
等の添加元素の合金ターゲットか、或いは適当な凹部を
設けた純鉄のターゲットの四部にチップ状のＢ、ＡＩ等
をはめ込んだ複合ターゲットである。このターゲット５
．５はターゲットホルダ９によって支えられており、こ
のターゲット５とターゲットホルダ９には、直流電源１
３よりマイナス電位が印加され、更にこのターケ・ノド
ホルダ９の周囲にはシールド４が取り付けである。A pair of targets 5.5 are iron (Fe), BAl, and Ga.
It is either an alloy target with additive elements such as, or a composite target in which chip-shaped B, AI, etc. are inserted into the four parts of a pure iron target with appropriate recesses. This target 5
．． 5 is supported by a target holder 9, and the target 5 and target holder 9 are connected to a DC power source 1.
A negative potential is applied from 3, and a shield 4 is attached around this tube holder 9.
又、このターゲットホルダ９の内部には、両ターゲット
５．５間にプラズマ１４を集束するための磁石６．６が
挿入され、かつターゲット５の表面の加熱を防ぐために
冷却水８が流入している。Further, inside this target holder 9, a magnet 6.6 for focusing the plasma 14 is inserted between both targets 5.5, and cooling water 8 flows in to prevent the surface of the target 5 from being heated. There is.
そして、接地された真空槽１５の左右に、２個のターゲ
ットホルダ９が絶縁体７によって絶縁されて設けられて
いる。Two target holders 9 are provided on the left and right sides of the grounded vacuum chamber 15 and are insulated by an insulator 7.
又、この真空槽１５の上部より、窒素（Ｎ２）又、この
真空槽１５の上部より、窒素（Ｎ２）酸素（０２）アル
ゴン（Ａｒ）かそれぞれ流量計１〜３により、所定の流
量に調節されて導入されている。Further, nitrogen (N2) is supplied from the upper part of this vacuum chamber 15, and nitrogen (N2), oxygen (02), and argon (Ar) are supplied from the upper part of this vacuum chamber 15, each of which is adjusted to a predetermined flow rate using flowmeters 1 to 3. has been introduced.
なお、アルゴンはターゲット５をスパッタすると同時に
成膜する磁性合金膜中の酸素と窒素の量を調節するため
のものである。Note that argon is used to adjust the amount of oxygen and nitrogen in the magnetic alloy film formed at the same time as sputtering the target 5.
そして、真空槽１５の下部には基板ホルダ１２上に基板
１１が置かれ、不純物を防くためのシャッタ１０が基板
１コを覆っている。A substrate 11 is placed on a substrate holder 12 at the bottom of the vacuum chamber 15, and a shutter 10 for preventing impurities covers the substrate 1.
このようなスパッタ装置において、直流電源１３により
、左右のターケラトホルダ９に支えられたターゲット５
．５の間にプラズマ１４を発生させると、ターゲット５
はマイナス電位であるので、プラズマ１４中のアルゴン
イオン（Ａｒ’）がターゲット５に衝突し、ターゲット
５の鉄原子及びＢ、ＡＩ、Ｇａ等の原子が飛び出す。In such a sputtering apparatus, the target 5 supported by the left and right turbo holders 9 is powered by the DC power supply 13.
．． When the plasma 14 is generated between 5 and 5, the target 5
Since is at a negative potential, argon ions (Ar') in the plasma 14 collide with the target 5, and iron atoms and atoms of B, AI, Ga, etc. of the target 5 fly out.
そして、ターゲット５から飛び出した鉄とＢ。Then, Tetsu and B jumped out from Target 5.
ＡＩ、Ｇａ等の原子とプラズマ中の窒素および酸素の原
子または分子が結合して基板１１の上に成なお、スパッ
タ開始後の数分間は、シャッタ１０を閉じて基板１１を
覆うことにより、ターゲット５の表面の不純物が基板１
１の上に付かないようにし、その後でシャッタ１０を開
けるようにする。Atoms of AI, Ga, etc. and atoms or molecules of nitrogen and oxygen in the plasma combine and form on the substrate 11. For several minutes after the start of sputtering, the shutter 10 is closed to cover the substrate 11 to protect the target. Impurities on the surface of substrate 1
1, and then open the shutter 10.
そして、流量計１〜３にて窒素、酸素、アルゴンの導入
量を調整することにより、所望の窒素及び酸素を含んだ
Ｆ ｅｖ ＮｗＯＸ Ｍｙ金合金得ることができる。Then, by adjusting the amounts of nitrogen, oxygen, and argon introduced using the flow meters 1 to 3, a F ev NwOX My gold alloy containing desired nitrogen and oxygen can be obtained.
このようにして得たＦｅｖＮＷＯＸＭＹ合金の窒素・酸
素及びＢ、ＡＩ、Ｇａ等の含有量と飽和磁束密度ＢＳ、
保磁力Ｈｃ、関係を表１に示す。Contents of nitrogen, oxygen, B, AI, Ga, etc. and saturation magnetic flux density BS of the FevNWOXMY alloy thus obtained,
Table 1 shows the relationship between coercive force Hc.
（以下余白）
表
表１は窒素・酸素及びＢ、ＡＩ、Ｇａ等の含有量と飽和
磁束密度（Ｂｓ）、保磁力（Ｈｅ）との関係を示す表で
あり、含有量はＥＳＣＡ（Ｘ線光電子分光分析法） 、
ＥＰＭＡ （Ｘ線マイクロアナライザ法）等による定量
分析で原子％て表しているか、±２０％程度の誤差が見
込まれる。保磁力は真空中での熱処理を行った時の値で
あり、熱処理温度はここでは４００°Ｃである。この内
、試料番号１はＦｅに窒素のみを含有させた時の結果で
ある。試料番号２〜ＩＯは本発明の磁性合金である。(Leaving space below) Table 1 shows the relationship between the content of nitrogen/oxygen, B, AI, Ga, etc., saturation magnetic flux density (Bs), and coercive force (He). photoelectron spectroscopy),
Quantitative analysis using EPMA (X-ray microanalyzer method) or the like is expressed as atomic %, and an error of about ±20% is expected. The coercive force is the value when heat treatment is performed in vacuum, and the heat treatment temperature is 400°C here. Among these, sample number 1 is the result when only nitrogen is contained in Fe. Sample numbers 2 to IO are magnetic alloys of the present invention.
窒素の含有量が１原子９６未満であると、顕著な窒素の
効果が見られずＨｃはほとんど低下しない。When the nitrogen content is less than 1 atom, 96 atoms, no significant effect of nitrogen is observed and Hc hardly decreases.
また第４図に示したように、窒素の含有量が２０原子％
以下であるとＢｓか１ＯｋＧ以上の磁性合金が得られる
。従って、窒素の含有量が１〜２０原子９６さらに好ま
しくは１〜１０原子％である時、高Ｂｓで低Ｈｃの磁性
合金が得られる。窒素含有量が１〜ｌＯ原子％の時はＢ
ｓか１５ｋＧ以上の磁性合金が得られる。In addition, as shown in Figure 4, the nitrogen content is 20 at%
If it is below, a magnetic alloy with Bs of 1 OkG or more can be obtained. Therefore, when the nitrogen content is 1 to 20 atoms,96 and more preferably 1 to 10 at%, a high Bs and low Hc magnetic alloy can be obtained. B when the nitrogen content is 1 to 10 atom%
A magnetic alloy with a tensile strength of 15 kG or more can be obtained.
酸素の含有量が０．１原子％未満であると、顕著な酸素
の効果が見られず磁気特性の改善かほとんど見られない
。また、酸素の含有量が１０原子％を越えるとＨｃが増
大する。従って、酸素の含有量が０．１〜ＩＯ原子％で
ある時、高Ｂｓで低Ｈｃで特に透磁率の高い磁性合金が
得られる。When the oxygen content is less than 0.1 atomic %, no significant oxygen effect is observed and almost no improvement in magnetic properties is observed. Furthermore, when the oxygen content exceeds 10 atomic %, Hc increases. Therefore, when the oxygen content is between 0.1 and IO atomic %, a magnetic alloy with high Bs, low Hc and particularly high magnetic permeability can be obtained.
第２図には本発明になる磁性合金と従来例である窒化鉄
（ＦｅＮ）合金の、熱処理温度による保磁力（Ｈｃ）の
変化を示す。窒化鉄は熱処理温度３００°Ｃの時は比較
的Ｈｃは低いが３００’ｃ以上にすると急激にＨｃが増
大する。これに対し本発明になる磁性合金は、Ｈｃが小
さく熱安定性にも優れていることが解る。ここで、Ｂ、
ＡＩ、Ｇａ等の元素の合計の含有量が０．５原子％未満
であると、熱安定性の向上に対する顕著な効果は見られ
ず、６原子％を越えるとＢｓの低下とＨｃの増大が生じ
る。従って、Ｂ、ＡＩ、Ｇａ、Ｃ，Ｇｅからなる群の中
から選ばれた少くとも１種類以上の元素の合計の含有量
が０．５〜６原子％の時、高ＢＳ・低Ｈｃて熱安定性に
も優れた磁性合金を得ることができる。また第３図には
膜厚を２μｍとした時の本発明になる磁性合金の透磁率
μと周波数の関係を示す。比較例としてＦｅ−Ｎ−Ａｌ
合金のμを示す。本発明になる磁性合金は、透磁率μが
Ｆｅ−Ｎ−Ａ１合金の３０００よりも高＜ ５０００以
上であるので、より高性能の磁気デバイスに適した磁性
合金が得られる。FIG. 2 shows the change in coercive force (Hc) of the magnetic alloy according to the present invention and a conventional iron nitride (FeN) alloy depending on the heat treatment temperature. Iron nitride has a relatively low Hc when the heat treatment temperature is 300°C, but when the heat treatment temperature exceeds 300°C, the Hc increases rapidly. In contrast, it can be seen that the magnetic alloy of the present invention has a small Hc and excellent thermal stability. Here, B,
When the total content of elements such as AI and Ga is less than 0.5 at%, no significant effect on improving thermal stability is observed, and when it exceeds 6 at%, Bs decreases and Hc increases. arise. Therefore, when the total content of at least one element selected from the group consisting of B, AI, Ga, C, and Ge is 0.5 to 6 at%, high BS and low Hc result in high heat. A magnetic alloy with excellent stability can also be obtained. Further, FIG. 3 shows the relationship between the magnetic permeability μ and frequency of the magnetic alloy according to the present invention when the film thickness is 2 μm. As a comparative example, Fe-N-Al
Indicates the μ of the alloy. Since the magnetic alloy according to the present invention has a magnetic permeability μ of 5000 or more, which is higher than 3000 of the Fe-N-A1 alloy, a magnetic alloy suitable for higher performance magnetic devices can be obtained.
（以下余白）
表
表２はＴｉ、Ｃｒ等の元素が耐蝕性の向上に寄与するこ
とを示したものである。実験は試料を６０’ｃ−９０％
の高温高湿中に放置し、１０００時間経過後に腐蝕痕が
見られないものを○腐蝕痕が生じたものを×として耐蝕
性を示した。試料番号２１は比較例であるＦｅＮ合金、
試料番号２２〜４４はＦｅ−Ｎ−０−Ａ Ｉ合金にＴｉ
、Ｃｒ等の元素を添加した合金であり、試料番号２２〜
４４が本発明になる磁性合金である。(Left below) Table 2 shows that elements such as Ti and Cr contribute to improving corrosion resistance. In the experiment, the sample was 60'c-90%
The samples were left in a high temperature and high humidity environment for 1,000 hours, and after 1000 hours, the samples with no corrosion marks were rated as ○, and the samples with corrosion marks were graded as x, indicating corrosion resistance. Sample number 21 is a comparative example of FeN alloy,
Sample numbers 22 to 44 are Fe-N-0-A I alloy with Ti
It is an alloy to which elements such as , Cr, etc. are added, and sample numbers 22~
44 is a magnetic alloy according to the present invention.
ここで、Ｔｉ、Ｃｒ等の合計の含有量が０．３原子％未
満であると、耐蝕性に対する顕著な効果が見られず、６
原子９６を越えると磁気特性の劣化が生じる。従って、
Ｔｉ、Ｖ、Ｃｒ、Ｃｏ、Ｎｉ。Here, if the total content of Ti, Cr, etc. is less than 0.3 at%, no significant effect on corrosion resistance is observed, and 6
When the number exceeds 96 atoms, deterioration of magnetic properties occurs. Therefore,
Ti, V, Cr, Co, Ni.
Ｃｕ、Ｙ、Ｚｒ、Ｎｂ、Ｍｏ、Ｒｕ、Ｒｈ、Ｐｄ。Cu, Y, Zr, Nb, Mo, Ru, Rh, Pd.
Ａｇ、Ｓｎ、Ｓｂ、Ｈｆ、Ｔａ、Ｗ、Ｒｅ、０ｓＩｒ、
Ｐｔ、Ａｕ、Ｐｂからなる群の中から選ばれた少なくと
も１種類以上の元素の合計の含有量が０．３〜６原子９
６である時、磁気特性と耐蝕性に優れた磁性合金が得ら
れる。Ag, Sn, Sb, Hf, Ta, W, Re, 0sIr,
The total content of at least one element selected from the group consisting of Pt, Au, and Pb is 0.3 to 6 atoms9
6, a magnetic alloy with excellent magnetic properties and corrosion resistance can be obtained.
また、磁歪制御等を目的としてＴａ、Ｎｂを合計で６原
子％以下含有させることかできる。Further, for the purpose of controlling magnetostriction, etc., Ta and Nb can be contained in a total of 6 atomic % or less.
（発明の効果）
本発明は、以上のような組成の磁性合金とすることによ
り、高飽和磁束密度を有し、保磁力が小さく、透磁率が
大きく、更に熱安定性と耐蝕性に優れた磁気ヘッド等の
磁気デバイス用磁性合金が得られる。従って、本発明の
磁性合金を用いれば、高保磁力媒体への良好な記録再生
が行える他、高性能の薄膜磁気ヘッド等を作成すること
ができ、高密度な磁気記録再生が実現できる。(Effects of the Invention) The present invention provides a magnetic alloy having the composition described above, which has high saturation magnetic flux density, low coercive force, high magnetic permeability, and excellent thermal stability and corrosion resistance. A magnetic alloy for magnetic devices such as magnetic heads is obtained. Therefore, by using the magnetic alloy of the present invention, it is possible to perform good recording and reproducing on a high coercive force medium, and also to create a high-performance thin film magnetic head and the like, and realize high-density magnetic recording and reproducing.
第１図は、本発明になる磁性合金膜を製造する装置の一
実施例であるスパッタ装置の概略図、第２図は、熱処理
温度によるＨｃの変化を表わす図、第３図は透磁率μと
周波数の関係を示す図、第４図は窒素含有量と飽和磁束
密度（Ｂｓ）の関係を示す図である。FIG. 1 is a schematic diagram of a sputtering apparatus which is an embodiment of the apparatus for manufacturing a magnetic alloy film according to the present invention, FIG. 2 is a diagram showing changes in Hc depending on heat treatment temperature, and FIG. 3 is a diagram showing magnetic permeability μ FIG. 4 is a diagram showing the relationship between nitrogen content and saturation magnetic flux density (Bs).
Claims (1)
ｖ，ｗ，ｘ，ｙで示される原子％が １≦ｗ≦２０ ０．１≦ｘ≦１０ ０．５≦ｙ≦６ ｖ＋ｗ＋ｘ＋ｙ＝１００ なる関係を有する磁性合金。（但しＭはＢ，Ａｌ，Ｇａ
，Ｃ，Ｇｅからなる群の中から選ばれた少なくとも１種
類以上の元素） （２）Ｆｅ＿ｖＮ＿ｗＯ＿ｘＭ＿ＹＬ＿ｚなる組成式で
表され、ｖ，ｗ，ｘ，ｙ，ｚで示される原子％が１≦ｗ
≦２０ ０．１≦ｘ≦１０ ０．５≦ｙ≦６ ０．３≦ｚ≦６ ｖ＋ｗ＋ｘ＋ｙ＋ｚ＝１００ なる関係を有する磁性合金。（但しＭはＢ，Ａｌ，Ｇａ
，Ｃ，Ｇｅからなる群の中から選ばれた少なくとも１種
類以上の元素であり、ＬはＴｉ，Ｖ，Ｃｒ，Ｃｏ，Ｎｉ
，Ｃｕ，Ｙ，Ｚｒ，Ｎｂ，Ｍｏ，Ｒｕ，Ｒｈ，Ｐｄ，Ａ
ｇ，Ｓｎ，Ｓｂ，Ｈｆ，Ｔａ，Ｗ，Ｒｅ，Ｏｓ，Ｉｒ，
Ｐｔ，Ａｕ，Ｐｂからなる群の中から選ばれた少なくと
も１種類以上の元素）[Claims] (1) It is expressed by the compositional formula Fe_vN_wO_xM_Y, and the atomic % represented by v, w, x, and y is 1≦w≦20 0.1≦x≦10 0.5≦y≦6 v+w+x+y= A magnetic alloy having a relationship of 100. (However, M is B, Al, Ga
, C, Ge) (2) It is represented by the composition formula Fe_vN_wO_xM_YL_z, and the atomic % represented by v, w, x, y, z is 1≦w
≦20 0.1≦x≦10 0.5≦y≦6 0.3≦z≦6 v+w+x+y+z=100 A magnetic alloy having the following relationships. (However, M is B, Al, Ga
, C, and Ge, and L is Ti, V, Cr, Co, and Ni.
, Cu, Y, Zr, Nb, Mo, Ru, Rh, Pd, A
g, Sn, Sb, Hf, Ta, W, Re, Os, Ir,
At least one element selected from the group consisting of Pt, Au, and Pb)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2048117A JP2668590B2 (en) | 1990-02-28 | 1990-02-28 | Magnetic alloy for magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2048117A JP2668590B2 (en) | 1990-02-28 | 1990-02-28 | Magnetic alloy for magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03250707A true JPH03250707A (en) | 1991-11-08 |
| JP2668590B2 JP2668590B2 (en) | 1997-10-27 |
Family
ID=12794380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2048117A Expired - Lifetime JP2668590B2 (en) | 1990-02-28 | 1990-02-28 | Magnetic alloy for magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2668590B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0199203A (en) * | 1987-10-13 | 1989-04-18 | Sony Corp | Soft magnetic laminated layer film |
-
1990
- 1990-02-28 JP JP2048117A patent/JP2668590B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0199203A (en) * | 1987-10-13 | 1989-04-18 | Sony Corp | Soft magnetic laminated layer film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5617275A (en) * | 1994-05-02 | 1997-04-01 | Sanyo Electric Co., Ltd. | Thin film head having a core comprising Fe-N-O in a specific atomic composition ratio |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2668590B2 (en) | 1997-10-27 |
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