JPH0324070B2 - - Google Patents
Info
- Publication number
- JPH0324070B2 JPH0324070B2 JP61043751A JP4375186A JPH0324070B2 JP H0324070 B2 JPH0324070 B2 JP H0324070B2 JP 61043751 A JP61043751 A JP 61043751A JP 4375186 A JP4375186 A JP 4375186A JP H0324070 B2 JPH0324070 B2 JP H0324070B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- regions
- semiconductor
- gate electrode
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 100
- 239000012535 impurity Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 15
- 238000009792 diffusion process Methods 0.000 description 36
- 238000000034 method Methods 0.000 description 14
- 230000007423 decrease Effects 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 208000022010 Lhermitte-Duclos disease Diseases 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Volatile Memory (AREA)
- Static Random-Access Memory (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61043751A JPS62200757A (ja) | 1986-02-28 | 1986-02-28 | Mos型半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61043751A JPS62200757A (ja) | 1986-02-28 | 1986-02-28 | Mos型半導体装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5327531A Division JP2653632B2 (ja) | 1993-12-24 | 1993-12-24 | マスクldd構造のmos型半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62200757A JPS62200757A (ja) | 1987-09-04 |
JPH0324070B2 true JPH0324070B2 (ko) | 1991-04-02 |
Family
ID=12672467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61043751A Granted JPS62200757A (ja) | 1986-02-28 | 1986-02-28 | Mos型半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62200757A (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63302569A (ja) * | 1987-06-01 | 1988-12-09 | Mitsubishi Electric Corp | 電界効果トランジスタ |
JP2601664B2 (ja) * | 1987-09-18 | 1997-04-16 | 日本テキサス・インスツルメンツ株式会社 | 絶縁ゲート型電界効果半導体装置 |
JP2549726B2 (ja) * | 1989-01-30 | 1996-10-30 | 株式会社東芝 | 半導体集積回路とその製造方法 |
JPH03190278A (ja) * | 1989-12-20 | 1991-08-20 | Oki Electric Ind Co Ltd | オフセット型misトランジスタ装置 |
JP2746087B2 (ja) * | 1993-12-01 | 1998-04-28 | 日本電気株式会社 | 半導体集積回路 |
JP2972533B2 (ja) * | 1994-11-29 | 1999-11-08 | 日本電気株式会社 | Cmos型半導体集積回路装置 |
US5793089A (en) * | 1997-01-10 | 1998-08-11 | Advanced Micro Devices, Inc. | Graded MOS transistor junction formed by aligning a sequence of implants to a selectively removable polysilicon sidewall space and oxide thermally grown thereon |
US5895955A (en) * | 1997-01-10 | 1999-04-20 | Advanced Micro Devices, Inc. | MOS transistor employing a removable, dual layer etch stop to protect implant regions from sidewall spacer overetch |
US6124610A (en) * | 1998-06-26 | 2000-09-26 | Advanced Micro Devices, Inc. | Isotropically etching sidewall spacers to be used for both an NMOS source/drain implant and a PMOS LDD implant |
JP4494344B2 (ja) * | 2006-02-06 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP4494512B2 (ja) * | 2009-08-21 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 半導体装置及びその作製方法、液晶パネル |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5563873A (en) * | 1978-11-07 | 1980-05-14 | Seiko Epson Corp | Semiconductor integrated circuit |
-
1986
- 1986-02-28 JP JP61043751A patent/JPS62200757A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5563873A (en) * | 1978-11-07 | 1980-05-14 | Seiko Epson Corp | Semiconductor integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
JPS62200757A (ja) | 1987-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR940002772B1 (ko) | 반도체 집적회로 장치 및 그 제조방법 | |
US4772927A (en) | Thin film FET doped with diffusion inhibitor | |
US6211003B1 (en) | Semiconductor integrated circuit device and process for manufacturing the same | |
EP0186855A2 (en) | Semiconductor read only memory device and method of manufacturing the same | |
EP2472586A1 (en) | Thin Film Metal-Dielectric-Metal Transistor | |
KR930010087B1 (ko) | 반도체 장치 및 그의 제조방법 | |
KR100214708B1 (ko) | 저접촉저항을 갖는 반도체장치 및 그의 제조방법 | |
US4178605A (en) | Complementary MOS inverter structure | |
KR100221439B1 (ko) | 반도체 메모리 | |
JPH0324070B2 (ko) | ||
US6486007B2 (en) | Method of fabricating a memory cell for a static random access memory | |
EP0392540B1 (en) | Static memory | |
JPH11330280A (ja) | チャネル消去/書込によるフラッシュメモリ―セル構造の製造方法およびその操作方法 | |
US6445041B1 (en) | Semiconductor memory cell array with reduced parasitic capacitance between word lines and bit lines | |
JP2004103851A (ja) | スタティック型半導体記憶装置 | |
JPH07226446A (ja) | 半導体装置及びその製造方法 | |
US5786265A (en) | Methods of forming integrated semiconductor devices having improved channel-stop regions therein, and devices formed thereby | |
US5623154A (en) | Semiconductor device having triple diffusion | |
KR0186070B1 (ko) | 반도체 메모리 구조 및 그 제조방법 | |
JP2006344735A (ja) | 半導体装置 | |
KR100252560B1 (ko) | 반도체메모리장치및그제조방법 | |
JPH0799254A (ja) | 半導体装置とその製造方法 | |
KR900004730B1 (ko) | 반도체 기억장치(半導體記憶裝置) 및 그 제조방법 | |
US5610428A (en) | Semiconductor integrated circuit | |
KR0170311B1 (ko) | 스태틱 랜덤 억세스 메모리 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |