JPH03129740A - Mos型半導体装置の製造方法 - Google Patents
Mos型半導体装置の製造方法Info
- Publication number
- JPH03129740A JPH03129740A JP2206101A JP20610190A JPH03129740A JP H03129740 A JPH03129740 A JP H03129740A JP 2206101 A JP2206101 A JP 2206101A JP 20610190 A JP20610190 A JP 20610190A JP H03129740 A JPH03129740 A JP H03129740A
- Authority
- JP
- Japan
- Prior art keywords
- gate
- insulating film
- drain
- source
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Insulated Gate Type Field-Effect Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2206101A JPH03129740A (ja) | 1977-09-14 | 1990-08-02 | Mos型半導体装置の製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11072477A JPS5444482A (en) | 1977-09-14 | 1977-09-14 | Mos type semiconductor device and its manufacture |
| JP2206101A JPH03129740A (ja) | 1977-09-14 | 1990-08-02 | Mos型半導体装置の製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11072477A Division JPS5444482A (en) | 1977-09-14 | 1977-09-14 | Mos type semiconductor device and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03129740A true JPH03129740A (ja) | 1991-06-03 |
| JPH0465530B2 JPH0465530B2 (enrdf_load_stackoverflow) | 1992-10-20 |
Family
ID=26450281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2206101A Granted JPH03129740A (ja) | 1977-09-14 | 1990-08-02 | Mos型半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03129740A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009268674A (ja) * | 2008-05-07 | 2009-11-19 | Kyoto Nishikawa:Kk | 敷ふとん形態の家庭用電気治療器 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5232277A (en) * | 1975-09-05 | 1977-03-11 | Toshiba Corp | Insulated gate type field-effect transistor |
| JPS5250686A (en) * | 1975-10-22 | 1977-04-22 | Hitachi Ltd | Production of semiconductor device |
| JPS5284981A (en) * | 1976-01-06 | 1977-07-14 | Mitsubishi Electric Corp | Production of insulated gate type semiconductor device |
-
1990
- 1990-08-02 JP JP2206101A patent/JPH03129740A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5232277A (en) * | 1975-09-05 | 1977-03-11 | Toshiba Corp | Insulated gate type field-effect transistor |
| JPS5250686A (en) * | 1975-10-22 | 1977-04-22 | Hitachi Ltd | Production of semiconductor device |
| JPS5284981A (en) * | 1976-01-06 | 1977-07-14 | Mitsubishi Electric Corp | Production of insulated gate type semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009268674A (ja) * | 2008-05-07 | 2009-11-19 | Kyoto Nishikawa:Kk | 敷ふとん形態の家庭用電気治療器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0465530B2 (enrdf_load_stackoverflow) | 1992-10-20 |
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