JPH0312769B2 - - Google Patents
Info
- Publication number
- JPH0312769B2 JPH0312769B2 JP59000523A JP52384A JPH0312769B2 JP H0312769 B2 JPH0312769 B2 JP H0312769B2 JP 59000523 A JP59000523 A JP 59000523A JP 52384 A JP52384 A JP 52384A JP H0312769 B2 JPH0312769 B2 JP H0312769B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- inas
- alxga
- asysb
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/473—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT
- H10D30/4732—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT using Group III-V semiconductor material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/82—Heterojunctions
- H10D62/824—Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59000523A JPS60144979A (ja) | 1984-01-07 | 1984-01-07 | 半導体デバイス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59000523A JPS60144979A (ja) | 1984-01-07 | 1984-01-07 | 半導体デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60144979A JPS60144979A (ja) | 1985-07-31 |
| JPH0312769B2 true JPH0312769B2 (enEXAMPLES) | 1991-02-21 |
Family
ID=11476125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59000523A Granted JPS60144979A (ja) | 1984-01-07 | 1984-01-07 | 半導体デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60144979A (enEXAMPLES) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022014530A1 (ja) | 2020-07-13 | 2022-01-20 | 日油株式会社 | 無線起爆システム及び無線起爆システム用中継装置及び無線起爆システムを用いた無線起爆方法 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4827320A (en) * | 1986-09-19 | 1989-05-02 | University Of Illinois | Semiconductor device with strained InGaAs layer |
| US4987462A (en) * | 1987-01-06 | 1991-01-22 | Texas Instruments Incorporated | Power MISFET |
| US5091759A (en) * | 1989-10-30 | 1992-02-25 | Texas Instruments Incorporated | Heterostructure field effect transistor |
| JP2539268B2 (ja) * | 1989-07-12 | 1996-10-02 | 富士通株式会社 | 半導体装置 |
| EP0531550B1 (en) * | 1991-03-28 | 1997-12-29 | Asahi Kasei Kogyo Kabushiki Kaisha | Field effect transistor |
| JP3173080B2 (ja) * | 1991-12-05 | 2001-06-04 | 日本電気株式会社 | 電界効果トランジスタ |
| JP3224437B2 (ja) * | 1992-11-30 | 2001-10-29 | 富士通株式会社 | Iii−v族化合物半導体装置 |
| CN103137477B (zh) * | 2013-02-27 | 2016-01-13 | 中国科学院半导体研究所 | 在Si基上制备InP基HEMT的方法 |
-
1984
- 1984-01-07 JP JP59000523A patent/JPS60144979A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022014530A1 (ja) | 2020-07-13 | 2022-01-20 | 日油株式会社 | 無線起爆システム及び無線起爆システム用中継装置及び無線起爆システムを用いた無線起爆方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60144979A (ja) | 1985-07-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |