JPH0310148A - 発光分析装置 - Google Patents

発光分析装置

Info

Publication number
JPH0310148A
JPH0310148A JP1145712A JP14571289A JPH0310148A JP H0310148 A JPH0310148 A JP H0310148A JP 1145712 A JP1145712 A JP 1145712A JP 14571289 A JP14571289 A JP 14571289A JP H0310148 A JPH0310148 A JP H0310148A
Authority
JP
Japan
Prior art keywords
discharge
spark
gap
circuit
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1145712A
Other languages
English (en)
Other versions
JPH0676967B2 (ja
Inventor
Isao Fukui
福井　勲
Shuzo Hayashi
修三 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1145712A priority Critical patent/JPH0676967B2/ja
Priority to CN89108991A priority patent/CN1027520C/zh
Priority to US07/483,628 priority patent/US5216482A/en
Priority to EP90103719A priority patent/EP0401470B1/en
Priority to DE69030785T priority patent/DE69030785T2/de
Publication of JPH0310148A publication Critical patent/JPH0310148A/ja
Publication of JPH0676967B2 publication Critical patent/JPH0676967B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36—Investigating two or more bands of a spectrum by separate detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1789—Time resolved
    • G01N2021/1791—Time resolved stroboscopic; pulse gated; time range gated
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/718—Laser microanalysis, i.e. with formation of sample plasma

Landscapes

  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 （産業上の利用分野） 本発明はパルス光発光分析装置に関する。
（従来の技術） 試料に火花放電を行い、或はレーザ光パルスを照射して
試料を発光させ、その光を分光するパルス光発光分析法
には次のような問題がある。
スパーク放電による発光分光分析においては、試料面に
ある小さな傷、ピンホール、あるいは付着物などの影響
を少なくして分析精度を向上するために、予め放電によ
って試料表面を前処理した・後に分析を行うのが普通で
ある。この場合、例えば５秒間の分析に先立って高エネ
ルギー放電で１０秒以上の前処理を必要とする。
このように放電を前後２回に分けて行うのは、高エネル
ギー放電は試料を蒸発させる能力は大きいが、そのとき
の試料元素の輝線光に対するバッククラランド光が強く
、分析感度が低くなるので、分析そのものには低エネル
ギー放電の方が適しているためで、５〜１０秒の高エネ
ルギーによる予備放電の後、低エネルギーで数１０００
回の放電を行って測光するのである。しかし分析時の放
電エネルギーを余り低（すると試料からの蒸発量が少く
成分元素の輝線光が弱（なって分析感度も精度も低下す
る。このため低エネルギーで放電を行うと云っても、充
分低（はできず、バックグラウンド低下が困難であった
。
上述のように予備放電に比較的長時間を必要とする理由
は、１回の分析において毎回のスパークが試料面のある
領域内のどの地点に飛ぶかが一定していないために、そ
の領域全体を予め隈なく処理する必要があるからであり
、従ってまた分析精度を上げようとすればするほど予備
放電時間を長くする必要があった。
また分析放電時にも放電により試料から充分量の蒸発を
行わせる必要があるので、放電エネルギーも余り少（は
できず、従ってバックグラウンドを充分低下させること
ができず、高い感度を得ることが困難であった。

Claims (1)

    【特許請求の範囲】
  1. 毎回の発光を高エネルギー励起とそれに引続く低エネル
    ギー励起とに分けて行い、受光素子に光電子増倍管を用
    いて、少くとも高エネルギー励起中は上記光電子増倍管
    のダイノード電圧をオフし、低エネルギー励起中光電子
    増倍管のダイノードに電圧を印加するようにした発光分
    析装置。
JP1145712A 1989-06-08 1989-06-08 発光分析装置 Expired - Fee Related JPH0676967B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP1145712A JPH0676967B2 (ja) 1989-06-08 1989-06-08 発光分析装置
CN89108991A CN1027520C (zh) 1989-06-08 1989-11-29 发光分析装置
US07/483,628 US5216482A (en) 1989-06-08 1990-02-23 Apparatus for emission spectrochemical analysis
EP90103719A EP0401470B1 (en) 1989-06-08 1990-02-26 Apparatus for emission spectrochemical analysis
DE69030785T DE69030785T2 (de) 1989-06-08 1990-02-26 Vorrichtung zur spektrochemischen Emissionsanalyse

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1145712A JPH0676967B2 (ja) 1989-06-08 1989-06-08 発光分析装置

Publications (2)

Publication Number Publication Date
JPH0310148A true JPH0310148A (ja) 1991-01-17
JPH0676967B2 JPH0676967B2 (ja) 1994-09-28

Family

ID=15391381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1145712A Expired - Fee Related JPH0676967B2 (ja) 1989-06-08 1989-06-08 発光分析装置

Country Status (5)

Country Link
US (1) US5216482A (ja)
EP (1) EP0401470B1 (ja)
JP (1) JPH0676967B2 (ja)
CN (1) CN1027520C (ja)
DE (1) DE69030785T2 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04326043A (ja) * 1991-04-25 1992-11-16 Shimadzu Corp 発光分光分析装置
JP2009503448A (ja) * 2005-07-20 2009-01-29 サーモ ニトン アナライザーズ リミテッド ライアビリティ カンパニー スパークの位置と相関させたアーク／スパークの発光分析
JP2014020839A (ja) * 2012-07-13 2014-02-03 Jfe Steel Corp 発光分光分析による偏析評価方法および偏析評価装置
JP2015501415A (ja) * 2011-09-30 2015-01-15 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 光電検出器のための評価回路、および蛍光イベントを記録する方法
CN106442433A (zh) * 2016-09-29 2017-02-22 哈尔滨理工大学 一种基于iccd成像的聚合物击穿发光光谱测量系统

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2522216B2 (ja) * 1991-02-28 1996-08-07 株式会社島津製作所 発光分光分析方法
DE19651677A1 (de) * 1996-12-12 1998-06-18 Spectro Analytical Instr Optisches Emmissionsspektrometer mit steuerbarer Blende
DE19753348A1 (de) * 1997-12-03 1999-06-10 Spectro Analytical Instr Gmbh Vorrichtung zur Erfassung und Quantifizierung von Element-Konzentrationsverteilungen in Feststoffen
AUPP573098A0 (en) 1998-09-04 1998-10-01 Generation Technology Research Pty Ltd Apparatus and method for analyzing material
US20030189456A1 (en) * 2002-01-08 2003-10-09 Foster Thomas H. TTl controller system for one or more devices and a method thereof
EP1351049A3 (en) * 2002-04-01 2004-02-25 Central Iron & Steel Research Institute Analyzer for metal
US9072169B1 (en) 2010-07-13 2015-06-30 Cascodium Inc. Pulse generator and systems and methods for using same
CN102384784B (zh) * 2010-09-01 2015-05-20 北京普源精电科技有限公司 动态调节系统能量的分光光度计及其动态调节方法
CN103969245B (zh) * 2014-05-20 2016-03-23 江苏鑫知源仪器有限公司 一种真空光电直读光谱仪
DE102014010185A1 (de) * 2014-07-09 2016-01-14 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Laser-Scanning-Mikroskops
CN104267004B (zh) * 2014-10-24 2018-04-24 合肥市再德高分子材料有限公司 一种光电直读光谱分析仪的样品激发系统
DE102019100290B4 (de) * 2019-01-08 2020-12-03 Spectro Analytical Instruments Gmbh Spektrometer mit mechanischer Blende

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1066431A (en) * 1962-09-27 1967-04-26 Hilger & Watts Ltd Improvements in or relating to methods of and means for spectrochemical analysis
US3531202A (en) * 1966-11-14 1970-09-29 Baird Atomic Inc Spectrometer readout system
DE3015352A1 (de) * 1980-04-22 1981-11-05 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren und vorrichtung zum spektoskopischen naschweis von an der oberflaeche eines festkoerpers befindlichen elementen
US4393327A (en) * 1981-07-29 1983-07-12 Wisconsin Alumni Research Foundation Electric spark type light source for producing light for spectroscopic analysis
JPS59182344A (ja) * 1983-03-31 1984-10-17 Shimadzu Corp 発光分光分析装置
JP2603998B2 (ja) * 1987-11-30 1997-04-23 株式会社島津製作所 発光分光分析装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04326043A (ja) * 1991-04-25 1992-11-16 Shimadzu Corp 発光分光分析装置
JP2009503448A (ja) * 2005-07-20 2009-01-29 サーモ ニトン アナライザーズ リミテッド ライアビリティ カンパニー スパークの位置と相関させたアーク／スパークの発光分析
JP2015501415A (ja) * 2011-09-30 2015-01-15 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 光電検出器のための評価回路、および蛍光イベントを記録する方法
JP2014020839A (ja) * 2012-07-13 2014-02-03 Jfe Steel Corp 発光分光分析による偏析評価方法および偏析評価装置
CN106442433A (zh) * 2016-09-29 2017-02-22 哈尔滨理工大学 一种基于iccd成像的聚合物击穿发光光谱测量系统

Also Published As

Publication number Publication date
CN1047923A (zh) 1990-12-19
EP0401470A3 (en) 1991-03-20
JPH0676967B2 (ja) 1994-09-28
EP0401470A2 (en) 1990-12-12
US5216482A (en) 1993-06-01
DE69030785T2 (de) 1997-12-04
DE69030785D1 (de) 1997-07-03
CN1027520C (zh) 1995-01-25
EP0401470B1 (en) 1997-05-28

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