JPH0299558U - - Google Patents
Info
- Publication number
- JPH0299558U JPH0299558U JP900989U JP900989U JPH0299558U JP H0299558 U JPH0299558 U JP H0299558U JP 900989 U JP900989 U JP 900989U JP 900989 U JP900989 U JP 900989U JP H0299558 U JPH0299558 U JP H0299558U
- Authority
- JP
- Japan
- Prior art keywords
- accelerator
- deflection electrode
- analysis electromagnet
- accelerating voltage
- deflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004458 analytical method Methods 0.000 claims description 4
- 230000003321 amplification Effects 0.000 claims description 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Electron Tubes For Measurement (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Description
第１図はこの考案の実施例を示す配置図、第２
図は動作説明用の平面図、第３図は従来例の配置
図である。
１……イオン源、２……加速器、３……分析電
磁石、５……ビーム集束部、６……リツプル検出
器、８……電位補正増幅電源、１４……偏向電極
。
Figure 1 is a layout diagram showing an embodiment of this invention;
The figure is a plan view for explaining the operation, and FIG. 3 is a layout diagram of a conventional example. DESCRIPTION OF SYMBOLS 1... Ion source, 2... Accelerator, 3... Analysis electromagnet, 5... Beam focusing section, 6... Ripple detector, 8... Potential correction amplification power supply, 14... Deflection electrode.
Claims (1)
ムを分析する分析電磁石と、前記分析電磁石によ
つて分析されたビームを集束するビーム集束部と
を備えてなるマイクロビーム発生装置において、 前記分析電磁石の前段に偏向電極を配置すると
ともに、前記加速器の加速電圧のリツプル変動分
によつて変動するビームの位置を偏向補正するよ
うに、前記加速電圧のリツプル変動分に対応する
電位を前記偏向電極に加える電位補正増幅電源と
を備えたマイクロビーム発生装置。[Claims for Utility Model Registration] A microbeam comprising an accelerator, an analysis electromagnet that analyzes a beam accelerated by the accelerator, and a beam focusing unit that focuses the beam analyzed by the analysis electromagnet. In the generator, a deflection electrode is disposed in front of the analysis electromagnet, and a deflection electrode is arranged in response to ripple fluctuations in the accelerating voltage of the accelerator so as to correct deflection of a beam position that fluctuates due to ripple fluctuations in the accelerating voltage of the accelerator. and a potential correction amplification power supply that applies a potential to the deflection electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP900989U JPH0299558U (en) | 1989-01-26 | 1989-01-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP900989U JPH0299558U (en) | 1989-01-26 | 1989-01-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0299558U true JPH0299558U (en) | 1990-08-08 |
Family
ID=31215382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP900989U Pending JPH0299558U (en) | 1989-01-26 | 1989-01-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0299558U (en) |
-
1989
- 1989-01-26 JP JP900989U patent/JPH0299558U/ja active Pending