JPH0296727U - - Google Patents

Info

Publication number
JPH0296727U
JPH0296727U JP597589U JP597589U JPH0296727U JP H0296727 U JPH0296727 U JP H0296727U JP 597589 U JP597589 U JP 597589U JP 597589 U JP597589 U JP 597589U JP H0296727 U JPH0296727 U JP H0296727U
Authority
JP
Japan
Prior art keywords
boat
tube
heat treatment
semiconductor devices
upright
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP597589U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP597589U priority Critical patent/JPH0296727U/ja
Publication of JPH0296727U publication Critical patent/JPH0296727U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の半導体装置の熱処理装置の実
施例を示す側面図、第2図は第1図の本実施例装
置の断面図、第3図は本実施例によつて得られた
ボートの長さ方向の温度分布図、第4図は本実施
例と従来例とを比較して示すボートの長さ方向の
酸化膜厚図、第5図は従来装置を示す側面図であ
る。 1……チユーブ、2……炉口側、3……半導体
ウエハ、4……ボート、5……バツフアー板、6
……隙間、7……熱電対、8……切り込み。
FIG. 1 is a side view showing an embodiment of the heat treatment apparatus for semiconductor devices of the present invention, FIG. 2 is a sectional view of the apparatus of the embodiment shown in FIG. 1, and FIG. 3 is a boat obtained by this embodiment. FIG. 4 is a diagram showing the temperature distribution in the longitudinal direction of the boat, FIG. 4 is a diagram showing the oxide film thickness in the longitudinal direction of the boat, comparing the present embodiment with the conventional example, and FIG. 5 is a side view showing the conventional device. 1...Tube, 2...Furnace mouth side, 3...Semiconductor wafer, 4...Boat, 5...Buffer plate, 6
...Gap, 7...Thermocouple, 8...Notch.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] チユーブとこのチユーブ内に半導体ウエハを直
立状態に載置するボートとから成る半導体装置の
熱処理装置において、上記ボートの炉口側に直立
状態に載置されるバツフアー板を具備したことを
特徴とする半導体装置の熱処理装置。
A heat treatment apparatus for semiconductor devices comprising a tube and a boat on which semiconductor wafers are placed upright in the tube, characterized by comprising a buffer plate placed on the furnace mouth side of the boat in an upright position. Heat treatment equipment for semiconductor devices.
JP597589U 1989-01-20 1989-01-20 Pending JPH0296727U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP597589U JPH0296727U (en) 1989-01-20 1989-01-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP597589U JPH0296727U (en) 1989-01-20 1989-01-20

Publications (1)

Publication Number Publication Date
JPH0296727U true JPH0296727U (en) 1990-08-01

Family

ID=31209817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP597589U Pending JPH0296727U (en) 1989-01-20 1989-01-20

Country Status (1)

Country Link
JP (1) JPH0296727U (en)

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