JPH02122432U - - Google Patents
Info
- Publication number
- JPH02122432U JPH02122432U JP3228289U JP3228289U JPH02122432U JP H02122432 U JPH02122432 U JP H02122432U JP 3228289 U JP3228289 U JP 3228289U JP 3228289 U JP3228289 U JP 3228289U JP H02122432 U JPH02122432 U JP H02122432U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- wafer
- boat
- holds
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 5
- 230000003647 oxidation Effects 0.000 claims 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Description
第１図は本考案の実施例１を示す縦断面図、第
２図は同横断面図、第３図は本考案の実施例２を
示す縦断面図、第４図は同横断面図、第５図は従
来の酸化装置を示す縦断面図、第６図は同横断面
図である。
１，２，１４……電気炉、３，１９……シリコ
ンウエハ、４，１６……反応管、５，１７……ボ
ート、１２，１８……ボート溝。
1 is a longitudinal sectional view showing a first embodiment of the present invention, FIG. 2 is a cross-sectional view thereof, FIG. 3 is a longitudinal sectional view showing a second embodiment of the present invention, and FIG. 4 is a cross-sectional view thereof; FIG. 5 is a longitudinal cross-sectional view showing a conventional oxidizing device, and FIG. 6 is a cross-sectional view thereof. 1, 2, 14... electric furnace, 3, 19... silicon wafer, 4, 16... reaction tube, 5, 17... boat, 12, 18... boat groove.
Claims (1)
応管と、半導体ウエハを保持し、該ウエハを反応
管内に設置するボートとを有する酸化装置におい
て、半導体ウエハを反応管内の軸方向に沿う酸化
種の流れ方向に対して斜めに保持するウエハ保持
部を前記ボートに有することを特徴とする酸化装
置。 In an oxidation apparatus that has a reaction tube surrounded by an electric furnace equipped with a temperature controller and a boat that holds a semiconductor wafer and places the wafer in the reaction tube, the semiconductor wafer is exposed to oxidizing species along the axial direction inside the reaction tube. An oxidation apparatus characterized in that the boat has a wafer holding section that holds the wafers obliquely with respect to the flow direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3228289U JPH02122432U (en) | 1989-03-22 | 1989-03-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3228289U JPH02122432U (en) | 1989-03-22 | 1989-03-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02122432U true JPH02122432U (en) | 1990-10-08 |
Family
ID=31258677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3228289U Pending JPH02122432U (en) | 1989-03-22 | 1989-03-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02122432U (en) |
-
1989
- 1989-03-22 JP JP3228289U patent/JPH02122432U/ja active Pending