JPH01139426U - - Google Patents

Info

Publication number
JPH01139426U
JPH01139426U JP3602788U JP3602788U JPH01139426U JP H01139426 U JPH01139426 U JP H01139426U JP 3602788 U JP3602788 U JP 3602788U JP 3602788 U JP3602788 U JP 3602788U JP H01139426 U JPH01139426 U JP H01139426U
Authority
JP
Japan
Prior art keywords
operating lever
cantilever
board
wafer boat
holds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3602788U
Other languages
Japanese (ja)
Other versions
JPH0648835Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988036027U priority Critical patent/JPH0648835Y2/en
Publication of JPH01139426U publication Critical patent/JPH01139426U/ja
Application granted granted Critical
Publication of JPH0648835Y2 publication Critical patent/JPH0648835Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a,bおよびcは本考案に係る半導体製
造装置用のカンチレバーを示す斜視図とそのb―
b線断面図、c―c線断面図、第2図は従来のカ
ンチレバーを用いた熱処理装置を示す断面図、第
3図は従来のカンチレバーを示す斜視図である。 1……反応管、4……半導体ウエハ、5……ウ
エハボート、11……操作レバー、12……開口
部、13……ボード。
Figures 1a, b, and c are perspective views showing a cantilever for semiconductor manufacturing equipment according to the present invention;
2 is a sectional view showing a heat treatment apparatus using a conventional cantilever, and FIG. 3 is a perspective view showing a conventional cantilever. DESCRIPTION OF SYMBOLS 1...Reaction tube, 4...Semiconductor wafer, 5...Wafer boat, 11...Operation lever, 12...Opening, 13...Board.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 反応管内に挿抜自在に設けられ半導体ウエハを
保持するウエハボートを搬送する操作レバーから
なり、この操作レバーに開口部を設けると共に、
前記ウエハボートを載置するボードを保持し、こ
のボードは前記操作レバーの熱伝導率より小さい
熱伝導率をもつ材料によつて形成されていること
を特徴とする半導体製造装置用のカンチレバー。
It consists of an operating lever for transporting a wafer boat that is inserted into and removed from the reaction tube and holds semiconductor wafers, and this operating lever is provided with an opening, and
A cantilever for semiconductor manufacturing equipment, wherein the cantilever holds a board on which the wafer boat is placed, and the board is made of a material having a thermal conductivity lower than that of the operating lever.
JP1988036027U 1988-03-18 1988-03-18 Cantilevers for semiconductor manufacturing equipment Expired - Lifetime JPH0648835Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988036027U JPH0648835Y2 (en) 1988-03-18 1988-03-18 Cantilevers for semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988036027U JPH0648835Y2 (en) 1988-03-18 1988-03-18 Cantilevers for semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JPH01139426U true JPH01139426U (en) 1989-09-22
JPH0648835Y2 JPH0648835Y2 (en) 1994-12-12

Family

ID=31262647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988036027U Expired - Lifetime JPH0648835Y2 (en) 1988-03-18 1988-03-18 Cantilevers for semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JPH0648835Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010141100A (en) * 2008-12-11 2010-06-24 Shin-Etsu Chemical Co Ltd Diffusion furnace device and diffusion method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154017A (en) * 1983-02-22 1984-09-03 Mitsubishi Electric Corp Furnace paddle for semiconductor wafer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154017A (en) * 1983-02-22 1984-09-03 Mitsubishi Electric Corp Furnace paddle for semiconductor wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010141100A (en) * 2008-12-11 2010-06-24 Shin-Etsu Chemical Co Ltd Diffusion furnace device and diffusion method

Also Published As

Publication number Publication date
JPH0648835Y2 (en) 1994-12-12

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