JPH028023B2 - - Google Patents

Info

Publication number
JPH028023B2
JPH028023B2 JP14690782A JP14690782A JPH028023B2 JP H028023 B2 JPH028023 B2 JP H028023B2 JP 14690782 A JP14690782 A JP 14690782A JP 14690782 A JP14690782 A JP 14690782A JP H028023 B2 JPH028023 B2 JP H028023B2
Authority
JP
Japan
Prior art keywords
heater
heat input
control plate
input control
plating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14690782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5938381A (ja
Inventor
Kenichi Yanagi
Toshio Taguchi
Kanji Wake
Heizaburo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP14690782A priority Critical patent/JPS5938381A/ja
Publication of JPS5938381A publication Critical patent/JPS5938381A/ja
Publication of JPH028023B2 publication Critical patent/JPH028023B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP14690782A 1982-08-26 1982-08-26 真空蒸着炉 Granted JPS5938381A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14690782A JPS5938381A (ja) 1982-08-26 1982-08-26 真空蒸着炉

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14690782A JPS5938381A (ja) 1982-08-26 1982-08-26 真空蒸着炉

Publications (2)

Publication Number Publication Date
JPS5938381A JPS5938381A (ja) 1984-03-02
JPH028023B2 true JPH028023B2 (enrdf_load_stackoverflow) 1990-02-22

Family

ID=15418264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14690782A Granted JPS5938381A (ja) 1982-08-26 1982-08-26 真空蒸着炉

Country Status (1)

Country Link
JP (1) JPS5938381A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5081899B2 (ja) * 2007-03-26 2012-11-28 株式会社アルバック 蒸着源、蒸着装置、成膜方法
KR101885245B1 (ko) * 2012-05-31 2018-09-11 삼성디스플레이 주식회사 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법

Also Published As

Publication number Publication date
JPS5938381A (ja) 1984-03-02

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