JPH0264A - フォトマスクカバーの製造方法 - Google Patents

フォトマスクカバーの製造方法

Info

Publication number
JPH0264A
JPH0264A JP1089137A JP8913789A JPH0264A JP H0264 A JPH0264 A JP H0264A JP 1089137 A JP1089137 A JP 1089137A JP 8913789 A JP8913789 A JP 8913789A JP H0264 A JPH0264 A JP H0264A
Authority
JP
Japan
Prior art keywords
film
thickness
thin film
photomask
supporting frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1089137A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0514262B2 (enExample
Inventor
Etsuo Otake
大竹　悦夫
Kaoru Yamaki
山木　薫
Takayuki Kuroda
隆之 黒田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP1089137A priority Critical patent/JPH0264A/ja
Publication of JPH0264A publication Critical patent/JPH0264A/ja
Publication of JPH0514262B2 publication Critical patent/JPH0514262B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Moulding By Coating Moulds (AREA)
JP1089137A 1989-04-07 1989-04-07 フォトマスクカバーの製造方法 Granted JPH0264A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1089137A JPH0264A (ja) 1989-04-07 1989-04-07 フォトマスクカバーの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1089137A JPH0264A (ja) 1989-04-07 1989-04-07 フォトマスクカバーの製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57103488A Division JPS58219023A (ja) 1982-06-15 1982-06-15 樹脂薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPH0264A true JPH0264A (ja) 1990-01-05
JPH0514262B2 JPH0514262B2 (enExample) 1993-02-24

Family

ID=13962490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1089137A Granted JPH0264A (ja) 1989-04-07 1989-04-07 フォトマスクカバーの製造方法

Country Status (1)

Country Link
JP (1) JPH0264A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6274524B1 (en) 1997-04-25 2001-08-14 Kyocera Corporation Semiconductive zirconia sintering body and electrostatic removing member constructed by semiconductive zirconia sintering body
US6342292B1 (en) 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same
KR100833470B1 (ko) * 2007-05-02 2008-06-02 연세대학교 산학협력단 식물의 엽록체 및 미토콘드리아 발달에 관여하는ＮｂＢＴＦ３유전자
KR100854594B1 (ko) * 2007-02-09 2008-08-27 전남대학교산학협력단 톨-유사 수용체-5 자극 활성이 강화된 ｐａｓ-플라젤린융합 단백질

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6274524B1 (en) 1997-04-25 2001-08-14 Kyocera Corporation Semiconductive zirconia sintering body and electrostatic removing member constructed by semiconductive zirconia sintering body
US6342292B1 (en) 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same
US6797207B2 (en) 1997-12-16 2004-09-28 Asahi Kasei Emd Corporation Process for producing organic thin film
KR100854594B1 (ko) * 2007-02-09 2008-08-27 전남대학교산학협력단 톨-유사 수용체-5 자극 활성이 강화된 ｐａｓ-플라젤린융합 단백질
KR100833470B1 (ko) * 2007-05-02 2008-06-02 연세대학교 산학협력단 식물의 엽록체 및 미토콘드리아 발달에 관여하는ＮｂＢＴＦ３유전자

Also Published As

Publication number Publication date
JPH0514262B2 (enExample) 1993-02-24

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