JPH0263305B2 - - Google Patents
Info
- Publication number
- JPH0263305B2 JPH0263305B2 JP18743683A JP18743683A JPH0263305B2 JP H0263305 B2 JPH0263305 B2 JP H0263305B2 JP 18743683 A JP18743683 A JP 18743683A JP 18743683 A JP18743683 A JP 18743683A JP H0263305 B2 JPH0263305 B2 JP H0263305B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- dielectric film
- discharge hole
- gas
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 description 5
- 238000001020 plasma etching Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005293 physical law Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18743683A JPS6079725A (ja) | 1983-10-06 | 1983-10-06 | 被処理物の離脱装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18743683A JPS6079725A (ja) | 1983-10-06 | 1983-10-06 | 被処理物の離脱装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6079725A JPS6079725A (ja) | 1985-05-07 |
| JPH0263305B2 true JPH0263305B2 (enrdf_load_stackoverflow) | 1990-12-27 |
Family
ID=16206023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18743683A Granted JPS6079725A (ja) | 1983-10-06 | 1983-10-06 | 被処理物の離脱装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6079725A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230325A (ja) * | 1985-07-31 | 1987-02-09 | Tokuda Seisakusho Ltd | 半導体処理装置 |
| JP2725594B2 (ja) * | 1994-04-28 | 1998-03-11 | 松下電器産業株式会社 | 気体レーザ装置 |
-
1983
- 1983-10-06 JP JP18743683A patent/JPS6079725A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6079725A (ja) | 1985-05-07 |
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