JPH0263289B2 - - Google Patents

Info

Publication number
JPH0263289B2
JPH0263289B2 JP57089088A JP8908882A JPH0263289B2 JP H0263289 B2 JPH0263289 B2 JP H0263289B2 JP 57089088 A JP57089088 A JP 57089088A JP 8908882 A JP8908882 A JP 8908882A JP H0263289 B2 JPH0263289 B2 JP H0263289B2
Authority
JP
Japan
Prior art keywords
nozzle
inert gas
chemical
valve
pressurized inert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57089088A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58205153A (ja
Inventor
Noriaki Mori
Akira Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP57089088A priority Critical patent/JPS58205153A/ja
Publication of JPS58205153A publication Critical patent/JPS58205153A/ja
Publication of JPH0263289B2 publication Critical patent/JPH0263289B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Coating Apparatus (AREA)
  • Weting (AREA)
  • Nozzles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57089088A 1982-05-25 1982-05-25 薬液散布装置 Granted JPS58205153A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57089088A JPS58205153A (ja) 1982-05-25 1982-05-25 薬液散布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57089088A JPS58205153A (ja) 1982-05-25 1982-05-25 薬液散布装置

Publications (2)

Publication Number Publication Date
JPS58205153A JPS58205153A (ja) 1983-11-30
JPH0263289B2 true JPH0263289B2 (Sortimente) 1990-12-27

Family

ID=13961113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57089088A Granted JPS58205153A (ja) 1982-05-25 1982-05-25 薬液散布装置

Country Status (1)

Country Link
JP (1) JPS58205153A (Sortimente)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60139354A (ja) * 1983-12-28 1985-07-24 Nissei Oobaru Kk 低圧噴霧装置
KR100582837B1 (ko) * 2003-12-23 2006-05-23 동부일렉트로닉스 주식회사 웨이퍼 평탄화 장치 및 방법
JP5887089B2 (ja) * 2011-09-14 2016-03-16 アドバンス電気工業株式会社 液体供給装置
JP6173192B2 (ja) * 2013-12-03 2017-08-02 株式会社ディスコ 液体噴射装置
JP2016172244A (ja) * 2015-03-18 2016-09-29 リンテック株式会社 塗工液供給装置、塗工液供給方法、積層体の製造方法、ガスバリアフィルムの製造方法、積層体、およびガスバリアフィルム

Also Published As

Publication number Publication date
JPS58205153A (ja) 1983-11-30

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