JPH0259634B2 - - Google Patents

Info

Publication number
JPH0259634B2
JPH0259634B2 JP57185855A JP18585582A JPH0259634B2 JP H0259634 B2 JPH0259634 B2 JP H0259634B2 JP 57185855 A JP57185855 A JP 57185855A JP 18585582 A JP18585582 A JP 18585582A JP H0259634 B2 JPH0259634 B2 JP H0259634B2
Authority
JP
Japan
Prior art keywords
layer
film
nicrsi
pattern
strain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57185855A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5975676A (ja
Inventor
Koichiro Sakamoto
Shinichi Mizushima
Shozo Takeno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Toshiba Corp
Original Assignee
Tokyo Sanyo Electric Co Ltd
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Toshiba Corp filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP57185855A priority Critical patent/JPS5975676A/ja
Publication of JPS5975676A publication Critical patent/JPS5975676A/ja
Publication of JPH0259634B2 publication Critical patent/JPH0259634B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/50Devices controlled by mechanical forces, e.g. pressure

Landscapes

  • Measurement Of Force In General (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Pressure Sensors (AREA)
JP57185855A 1982-10-22 1982-10-22 歪センサ Granted JPS5975676A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57185855A JPS5975676A (ja) 1982-10-22 1982-10-22 歪センサ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57185855A JPS5975676A (ja) 1982-10-22 1982-10-22 歪センサ

Publications (2)

Publication Number Publication Date
JPS5975676A JPS5975676A (ja) 1984-04-28
JPH0259634B2 true JPH0259634B2 (enrdf_load_stackoverflow) 1990-12-13

Family

ID=16178053

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57185855A Granted JPS5975676A (ja) 1982-10-22 1982-10-22 歪センサ

Country Status (1)

Country Link
JP (1) JPS5975676A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6440042U (enrdf_load_stackoverflow) * 1987-09-07 1989-03-09
JPH0680847B2 (ja) * 1987-09-08 1994-10-12 日本電気株式会社 電歪効果素子
JPH0887375A (ja) * 1994-09-16 1996-04-02 Fujitsu Ltd ポインティングデバイス
JP2019132790A (ja) * 2018-02-02 2019-08-08 ミネベアミツミ株式会社 ひずみゲージ
JP7402148B2 (ja) 2020-03-24 2023-12-20 ミネベアミツミ株式会社 ひずみゲージ

Also Published As

Publication number Publication date
JPS5975676A (ja) 1984-04-28

Similar Documents

Publication Publication Date Title
US4130855A (en) Passive microcircuit
US4801469A (en) Process for obtaining multiple sheet resistances for thin film hybrid microcircuit resistors
JPH0259634B2 (enrdf_load_stackoverflow)
JP2688446B2 (ja) 多層配線基板およびその製造方法
JPH0331201B2 (enrdf_load_stackoverflow)
US4374159A (en) Fabrication of film circuits having a thick film crossunder and a thin film capacitor
JP3255112B2 (ja) 抵抗内蔵型の配線基板及びその製造方法
JP3759381B2 (ja) 電子回路基板
JPS59144162A (ja) 薄膜回路の製造方法
US5609773A (en) Method for manufacture of multilayer wiring board and the multilayer wiring board
JPS59230101A (ja) 歪センサ
JP4112907B2 (ja) 抵抗素子およびその製造方法
US4539434A (en) Film-type electrical substrate circuit device and method of forming the device
JP2530008B2 (ja) 配線基板の製造方法
JP2002033560A (ja) 電子回路基板の製造方法
JPS6239927B2 (enrdf_load_stackoverflow)
JP2907318B2 (ja) 電極埋設基板及びその製造方法
JPH10135077A (ja) 薄膜キャパシタ
JPS648288B2 (enrdf_load_stackoverflow)
JPH0685100A (ja) 多層モジュ−ル回路基板
JPH0327857B2 (enrdf_load_stackoverflow)
JPH09270329A (ja) 電子部品及びその製造方法
JP4056797B2 (ja) 抵抗素子およびその製造方法
JPH05335488A (ja) 金属薄膜抵抗
JPS63169058A (ja) 薄膜集積回路